KR100226235B1 - Vacuum treatment equipment - Google Patents

Vacuum treatment equipment Download PDF

Info

Publication number
KR100226235B1
KR100226235B1 KR1019930013586A KR930013586A KR100226235B1 KR 100226235 B1 KR100226235 B1 KR 100226235B1 KR 1019930013586 A KR1019930013586 A KR 1019930013586A KR 930013586 A KR930013586 A KR 930013586A KR 100226235 B1 KR100226235 B1 KR 100226235B1
Authority
KR
South Korea
Prior art keywords
treatment equipment
vacuum treatment
vacuum
equipment
treatment
Prior art date
Application number
KR1019930013586A
Other languages
English (en)
Other versions
KR940005974A (ko
Inventor
Tsudomu Hiroki
Original Assignee
Tokyo Electron Ltd
Tel Yamanishi Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Tel Yamanishi Kk filed Critical Tokyo Electron Ltd
Publication of KR940005974A publication Critical patent/KR940005974A/ko
Application granted granted Critical
Publication of KR100226235B1 publication Critical patent/KR100226235B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H1/00—Supports or magazines for piles from which articles are to be separated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H9/00—Registering, e.g. orientating, articles; Devices therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H9/00—Registering, e.g. orientating, articles; Devices therefor
    • B65H9/10—Pusher and like movable registers; Pusher or gripper devices which move articles into registered position
    • B65H9/101—Pusher and like movable registers; Pusher or gripper devices which move articles into registered position acting on the edge of the article
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2511/00—Dimensions; Position; Numbers; Identification; Occurrences
    • B65H2511/50—Occurence
    • B65H2511/51—Presence
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2553/00—Sensing or detecting means
    • B65H2553/40—Sensing or detecting means using optical, e.g. photographic, elements
    • B65H2553/41—Photoelectric detectors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
KR1019930013586A 1992-07-29 1993-07-19 Vacuum treatment equipment KR100226235B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP04222128A JP3139155B2 (ja) 1992-07-29 1992-07-29 真空処理装置
JP92-222128 1992-07-29

Publications (2)

Publication Number Publication Date
KR940005974A KR940005974A (ko) 1994-03-22
KR100226235B1 true KR100226235B1 (en) 1999-10-15

Family

ID=16777609

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930013586A KR100226235B1 (en) 1992-07-29 1993-07-19 Vacuum treatment equipment

Country Status (4)

Country Link
US (1) US5509771A (ko)
JP (1) JP3139155B2 (ko)
KR (1) KR100226235B1 (ko)
TW (1) TW227626B (ko)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2644912B2 (ja) * 1990-08-29 1997-08-25 株式会社日立製作所 真空処理装置及びその運転方法
US7089680B1 (en) 1990-08-29 2006-08-15 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
USRE39756E1 (en) * 1990-08-29 2007-08-07 Hitachi, Ltd. Vacuum processing operating method with wafers, substrates and/or semiconductors
USRE39824E1 (en) * 1990-08-29 2007-09-11 Hitachi, Ltd. Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors
US6473157B2 (en) * 1992-02-07 2002-10-29 Nikon Corporation Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate
US5636960A (en) * 1992-07-29 1997-06-10 Tokyo Electron Limited Apparatus for detecting and aligning a substrate
JP2682468B2 (ja) * 1994-09-13 1997-11-26 日本電気株式会社 半導体装置の製造装置
JPH0936198A (ja) * 1995-07-19 1997-02-07 Hitachi Ltd 真空処理装置およびそれを用いた半導体製造ライン
US6257827B1 (en) * 1997-12-01 2001-07-10 Brooks Automation Inc. Apparatus and method for transporting substrates
US6042623A (en) * 1998-01-12 2000-03-28 Tokyo Electron Limited Two-wafer loadlock wafer processing apparatus and loading and unloading method therefor
US6270306B1 (en) * 1998-01-14 2001-08-07 Applied Materials, Inc. Wafer aligner in center of front end frame of vacuum system
JP3384446B2 (ja) 1999-01-08 2003-03-10 日本電気株式会社 表示パネル製造方法及び表示パネル移載方法
IL128087A (en) * 1999-01-17 2002-04-21 Nova Measuring Instr Ltd Buffer station for a wafer handling system
DE60139801D1 (de) 2000-02-17 2009-10-15 Panasonic Corp Vorrichtung und verfahren zur elektrischen bauteilbestückung
US6478136B2 (en) 2001-01-08 2002-11-12 Nikon Corporation Method and apparatus for automatically transporting and precisely positioning work pieces at processing stations
KR100425860B1 (ko) * 2001-07-30 2004-04-03 엘지.필립스 엘시디 주식회사 스퍼터링 증착장비용 히팅 챔버의 접지장치
US6824343B2 (en) * 2002-02-22 2004-11-30 Applied Materials, Inc. Substrate support
KR100847818B1 (ko) * 2002-06-14 2008-07-23 엘지디스플레이 주식회사 액정표시장치의 공정라인 및 이를 이용한 제조방법
US7207766B2 (en) * 2003-10-20 2007-04-24 Applied Materials, Inc. Load lock chamber for large area substrate processing system
US7547181B2 (en) * 2004-11-15 2009-06-16 Dainippon Screen Mfg. Co., Ltd. Substrate position correcting method and apparatus using either substrate radius or center of rotation correction adjustment sum
JP4849825B2 (ja) * 2005-05-18 2012-01-11 東京エレクトロン株式会社 処理装置、位置合わせ方法、制御プログラムおよびコンピュータ記憶媒体
CN101208791B (zh) * 2005-06-24 2010-12-08 株式会社爱发科 位置修正装置、真空处理装置以及位置修正方法
US20070274809A1 (en) * 2006-05-26 2007-11-29 Hsien-Chang Kao Substrate cassette and transport system thereof
JP4661716B2 (ja) * 2006-07-24 2011-03-30 株式会社日立プラントテクノロジー 基板貼合装置
US20080206020A1 (en) * 2007-02-27 2008-08-28 Smith John M Flat-panel display processing tool with storage bays and multi-axis robot arms
EP2408005A1 (en) * 2009-03-09 2012-01-18 Sharp Kabushiki Kaisha Substrate transporting method
JP5501688B2 (ja) * 2009-07-30 2014-05-28 東京エレクトロン株式会社 基板位置合わせ機構、それを用いた真空予備室および基板処理システム
JP5358366B2 (ja) * 2009-09-14 2013-12-04 東京エレクトロン株式会社 基板処理装置及び方法
US8399809B1 (en) 2010-01-05 2013-03-19 Wd Media, Inc. Load chamber with heater for a disk sputtering system
JP5369233B2 (ja) * 2010-03-19 2013-12-18 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
US8354618B1 (en) 2010-06-30 2013-01-15 Wd Media, Inc. Load chamber with dual heaters
JP5538291B2 (ja) 2011-04-13 2014-07-02 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
JP5550600B2 (ja) * 2011-04-13 2014-07-16 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
KR101703767B1 (ko) * 2011-09-23 2017-02-23 주식회사 원익아이피에스 기판처리시스템, 버퍼모듈 및 로드락모듈
DE102012024619A1 (de) * 2012-12-17 2014-06-18 Heidelberger Druckmaschinen Ag Saugluftanpassung auf Bogenformat
US9673071B2 (en) * 2014-10-23 2017-06-06 Lam Research Corporation Buffer station for thermal control of semiconductor substrates transferred therethrough and method of transferring semiconductor substrates
JP2016086100A (ja) * 2014-10-27 2016-05-19 株式会社ニューフレアテクノロジー 気相成長装置および気相成長方法
GB201913356D0 (en) * 2019-09-16 2019-10-30 Spts Technologies Ltd Wafer processing system

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4412771A (en) * 1981-07-30 1983-11-01 The Perkin-Elmer Corporation Sample transport system
JP3260427B2 (ja) * 1991-09-10 2002-02-25 東京エレクトロン株式会社 真空処理装置及び真空処理装置における基板搬送方法
JPS59201782A (ja) * 1983-04-23 1984-11-15 大日本スクリ−ン製造株式会社 ウエハ等の薄板物搬送装置
US4892455A (en) * 1987-05-21 1990-01-09 Hine Derek L Wafer alignment and transport mechanism
US5215420A (en) * 1991-09-20 1993-06-01 Intevac, Inc. Substrate handling and processing system

Also Published As

Publication number Publication date
KR940005974A (ko) 1994-03-22
JPH0651260A (ja) 1994-02-25
JP3139155B2 (ja) 2001-02-26
US5509771A (en) 1996-04-23
TW227626B (ko) 1994-08-01

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Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
G170 Re-publication after modification of scope of protection [patent]
FPAY Annual fee payment

Payment date: 20120629

Year of fee payment: 14

EXPY Expiration of term