KR100214816B1 - 폴리글리시딜 화합물의 고체 조성물 및 그 제조방법 - Google Patents

폴리글리시딜 화합물의 고체 조성물 및 그 제조방법 Download PDF

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Publication number
KR100214816B1
KR100214816B1 KR1019920017782A KR920017782A KR100214816B1 KR 100214816 B1 KR100214816 B1 KR 100214816B1 KR 1019920017782 A KR1019920017782 A KR 1019920017782A KR 920017782 A KR920017782 A KR 920017782A KR 100214816 B1 KR100214816 B1 KR 100214816B1
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KR
South Korea
Prior art keywords
polyglycidyl
solid
compound
composition
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1019920017782A
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English (en)
Korean (ko)
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KR930008056A (ko
Inventor
꼬띵 쟈끄-알랭
기욤 고띠스 필리쁘
Original Assignee
에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
시바 스페셜티 케미칼스 홀딩 인코포레이티드
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Application filed by 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러, 시바 스페셜티 케미칼스 홀딩 인코포레이티드 filed Critical 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
Publication of KR930008056A publication Critical patent/KR930008056A/ko
Application granted granted Critical
Publication of KR100214816B1 publication Critical patent/KR100214816B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1019920017782A 1991-10-03 1992-09-28 폴리글리시딜 화합물의 고체 조성물 및 그 제조방법 Expired - Fee Related KR100214816B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH292291 1991-10-03
CH91-2/2921 1991-10-03
JP92-142718 1992-06-03
JP92-142716 1992-06-03

Publications (2)

Publication Number Publication Date
KR930008056A KR930008056A (ko) 1993-05-21
KR100214816B1 true KR100214816B1 (ko) 1999-08-02

Family

ID=4244638

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1019920017782A Expired - Fee Related KR100214816B1 (ko) 1991-10-03 1992-09-28 폴리글리시딜 화합물의 고체 조성물 및 그 제조방법
KR1019920018119A Withdrawn KR930008518A (ko) 1991-10-03 1992-10-02 감광성 조성물

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1019920018119A Withdrawn KR930008518A (ko) 1991-10-03 1992-10-02 감광성 조성물

Country Status (6)

Country Link
EP (1) EP0536086A1 (enExample)
JP (1) JPH05255461A (enExample)
KR (2) KR100214816B1 (enExample)
AU (1) AU2618192A (enExample)
CA (1) CA2079652A1 (enExample)
TW (2) TW206284B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101042044B1 (ko) 2003-12-30 2011-06-16 주식회사 케이씨씨 저독성 폴리에스테르계 분체도료 조성물
KR102037500B1 (ko) * 2018-10-08 2019-10-28 국도화학 주식회사 열경화성 수지 조성물 및 이의 경화물

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
JPH10186638A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2001270905A (ja) * 2000-01-21 2001-10-02 Mitsubishi Rayon Co Ltd 耐熱性メタクリル共重合体、その製造方法および光学素子
JP4839525B2 (ja) * 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
KR100503061B1 (ko) * 2002-03-21 2005-07-25 삼성전자주식회사 유기 감광체용 오버코트 형성용 조성물 및 이로부터형성된 오버코트층을 채용한 유기 감광체
US7211368B2 (en) * 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
CA3026158A1 (en) * 2016-06-03 2017-12-07 Basf Se Production of a photocurable formulation for additive manufacturing
WO2019116188A1 (en) * 2017-12-12 2019-06-20 3M Innovative Properties Company Composite film, protective cover for an electronic device, and methods of making the same
CN118319830B (zh) * 2024-04-22 2025-01-28 广州博科化妆品有限公司 一种紧致皮肤抗皱精华液及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
JPS573875A (en) * 1980-06-11 1982-01-09 Tamura Kaken Kk Photopolymerizable ink composition
EP0430992A4 (en) * 1988-08-08 1992-10-07 Desoto, Inc. Photocurable compositions and method of investment casting
US5051334A (en) * 1989-04-21 1991-09-24 E. I. Du Pont De Nemours And Company Solid imaging method using photohardenable compositions containing hollow spheres

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101042044B1 (ko) 2003-12-30 2011-06-16 주식회사 케이씨씨 저독성 폴리에스테르계 분체도료 조성물
KR102037500B1 (ko) * 2018-10-08 2019-10-28 국도화학 주식회사 열경화성 수지 조성물 및 이의 경화물

Also Published As

Publication number Publication date
TW278081B (enExample) 1996-06-11
KR930008056A (ko) 1993-05-21
JPH05255461A (ja) 1993-10-05
AU2618192A (en) 1993-04-08
TW206284B (enExample) 1993-05-21
KR930008518A (ko) 1993-05-21
EP0536086A1 (de) 1993-04-07
CA2079652A1 (en) 1993-04-04

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