TW278081B - - Google Patents

Info

Publication number
TW278081B
TW278081B TW083106762A TW83106762A TW278081B TW 278081 B TW278081 B TW 278081B TW 083106762 A TW083106762 A TW 083106762A TW 83106762 A TW83106762 A TW 83106762A TW 278081 B TW278081 B TW 278081B
Authority
TW
Taiwan
Application number
TW083106762A
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Application granted granted Critical
Publication of TW278081B publication Critical patent/TW278081B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
TW083106762A 1991-10-03 1994-07-23 TW278081B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH292291 1991-10-03

Publications (1)

Publication Number Publication Date
TW278081B true TW278081B (zh) 1996-06-11

Family

ID=4244638

Family Applications (2)

Application Number Title Priority Date Filing Date
TW081107739A TW206284B (zh) 1991-10-03 1992-09-30
TW083106762A TW278081B (zh) 1991-10-03 1994-07-23

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW081107739A TW206284B (zh) 1991-10-03 1992-09-30

Country Status (6)

Country Link
EP (1) EP0536086A1 (zh)
JP (1) JPH05255461A (zh)
KR (2) KR100214816B1 (zh)
AU (1) AU2618192A (zh)
CA (1) CA2079652A1 (zh)
TW (2) TW206284B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
JPH10186638A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2001270905A (ja) * 2000-01-21 2001-10-02 Mitsubishi Rayon Co Ltd 耐熱性メタクリル共重合体、その製造方法および光学素子
JP4839525B2 (ja) * 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
KR100503061B1 (ko) * 2002-03-21 2005-07-25 삼성전자주식회사 유기 감광체용 오버코트 형성용 조성물 및 이로부터형성된 오버코트층을 채용한 유기 감광체
US7211368B2 (en) * 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
KR101042044B1 (ko) 2003-12-30 2011-06-16 주식회사 케이씨씨 저독성 폴리에스테르계 분체도료 조성물
EP3464214B1 (en) * 2016-06-03 2021-02-17 Basf Se Production of a photocurable formulation for additive manufacturing
WO2019116188A1 (en) * 2017-12-12 2019-06-20 3M Innovative Properties Company Composite film, protective cover for an electronic device, and methods of making the same
KR102037500B1 (ko) * 2018-10-08 2019-10-28 국도화학 주식회사 열경화성 수지 조성물 및 이의 경화물

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
JPS573875A (en) * 1980-06-11 1982-01-09 Tamura Kaken Kk Photopolymerizable ink composition
EP0430992A4 (en) * 1988-08-08 1992-10-07 Desoto, Inc. Photocurable compositions and method of investment casting
US5051334A (en) * 1989-04-21 1991-09-24 E. I. Du Pont De Nemours And Company Solid imaging method using photohardenable compositions containing hollow spheres

Also Published As

Publication number Publication date
KR930008056A (ko) 1993-05-21
KR100214816B1 (ko) 1999-08-02
TW206284B (zh) 1993-05-21
CA2079652A1 (en) 1993-04-04
JPH05255461A (ja) 1993-10-05
EP0536086A1 (de) 1993-04-07
AU2618192A (en) 1993-04-08
KR930008518A (ko) 1993-05-21

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