KR100196038B1 - 헬리콘파플라즈마처리방법 및 장치 - Google Patents

헬리콘파플라즈마처리방법 및 장치 Download PDF

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Publication number
KR100196038B1
KR100196038B1 KR1019950012656A KR19950012656A KR100196038B1 KR 100196038 B1 KR100196038 B1 KR 100196038B1 KR 1019950012656 A KR1019950012656 A KR 1019950012656A KR 19950012656 A KR19950012656 A KR 19950012656A KR 100196038 B1 KR100196038 B1 KR 100196038B1
Authority
KR
South Korea
Prior art keywords
magnetic field
substrate
coil
helicon
plasma processing
Prior art date
Application number
KR1019950012656A
Other languages
English (en)
Korean (ko)
Other versions
KR950034507A (ko
Inventor
토모히로 오쿠무라
이찌로 나카야마
Original Assignee
모리시따요오이 찌
마쓰시따덴기산교가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 모리시따요오이 찌, 마쓰시따덴기산교가부시끼가이샤 filed Critical 모리시따요오이 찌
Publication of KR950034507A publication Critical patent/KR950034507A/ko
Application granted granted Critical
Publication of KR100196038B1 publication Critical patent/KR100196038B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
KR1019950012656A 1994-05-23 1995-05-20 헬리콘파플라즈마처리방법 및 장치 KR100196038B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-108416 1994-05-23
JP6108416A JPH07320894A (ja) 1994-05-23 1994-05-23 ヘリコン波プラズマ処理方法及び装置

Publications (2)

Publication Number Publication Date
KR950034507A KR950034507A (ko) 1995-12-28
KR100196038B1 true KR100196038B1 (ko) 1999-06-15

Family

ID=14484215

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950012656A KR100196038B1 (ko) 1994-05-23 1995-05-20 헬리콘파플라즈마처리방법 및 장치

Country Status (3)

Country Link
JP (1) JPH07320894A (zh)
KR (1) KR100196038B1 (zh)
CN (1) CN1121303A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013054960A1 (ko) * 2011-10-14 2013-04-18 한국과학기술원 헬리콘 플라즈마 장치

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4654176B2 (ja) * 1996-02-22 2011-03-16 住友精密工業株式会社 誘導結合プラズマ・リアクタ
JP3868620B2 (ja) * 1998-03-02 2007-01-17 株式会社エフオーアイ プラズマ発生装置
KR100360765B1 (en) * 2002-03-11 2002-11-23 Ans Inc Inductive coupling type plasma generator
KR20140087215A (ko) * 2012-12-28 2014-07-09 주식회사 윈텔 플라즈마 장치 및 기판 처리 장치
CN105755449B (zh) * 2016-05-18 2018-09-25 苏州大学 采用螺旋波等离子体技术制备纳米晶金刚石薄膜的方法
US11037764B2 (en) 2017-05-06 2021-06-15 Applied Materials, Inc. Modular microwave source with local Lorentz force
DE102019111908B4 (de) * 2019-05-08 2021-08-12 Dreebit Gmbh ECR-Ionenquelle und Verfahren zum Betreiben einer ECR-Ionenquelle
CN110545612B (zh) * 2019-09-04 2021-12-28 北京航空航天大学 一种多级电离旋转磁场加速螺旋波等离子体源
CN111779647B (zh) * 2020-07-17 2022-04-01 上海空间推进研究所 适用于空间应用的多放电通道的螺旋波等离子体推力器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013054960A1 (ko) * 2011-10-14 2013-04-18 한국과학기술원 헬리콘 플라즈마 장치

Also Published As

Publication number Publication date
KR950034507A (ko) 1995-12-28
JPH07320894A (ja) 1995-12-08
CN1121303A (zh) 1996-04-24

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