KR100360765B1 - Inductive coupling type plasma generator - Google Patents

Inductive coupling type plasma generator Download PDF

Info

Publication number
KR100360765B1
KR100360765B1 KR1020020012834A KR20020012834A KR100360765B1 KR 100360765 B1 KR100360765 B1 KR 100360765B1 KR 1020020012834 A KR1020020012834 A KR 1020020012834A KR 20020012834 A KR20020012834 A KR 20020012834A KR 100360765 B1 KR100360765 B1 KR 100360765B1
Authority
KR
South Korea
Prior art keywords
coil
inductive coupling
impedance matching
plasma generator
coupling type
Prior art date
Application number
KR1020020012834A
Other languages
Korean (ko)
Inventor
Kyung Bin Bae
Dong Soo Kim
Original Assignee
Ans Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ans Inc filed Critical Ans Inc
Priority to KR1020020012834A priority Critical patent/KR100360765B1/en
Application granted granted Critical
Publication of KR100360765B1 publication Critical patent/KR100360765B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: An inductive coupling type plasma generator is provided to generate plasma with high uniformity to process a large-sized area by connecting plural circular or rectangular coils, serially or in parallel and forming the opposite current flows on each coil. CONSTITUTION: An antenna(1) is formed by connecting an inner coil(11) and an outer coil(12) on a concentric circle, serially or in parallel. The RF power of 13.56MHz is supplied to the inner coil(11) and the outer coil(12) through an impedance matching box(3). Each powered ends(11a,12a) of the inner and outer coils(11,12) is connected with the impedance matching box(3) through the first conductive line(5). Each ground ends(11b,12b) of the inner and outer coils(11,12) is connected with the impedance matching box(3) through the second conductive line(6). A variable condenser(4) is installed at a ground portion.
KR1020020012834A 2002-03-11 2002-03-11 Inductive coupling type plasma generator KR100360765B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020020012834A KR100360765B1 (en) 2002-03-11 2002-03-11 Inductive coupling type plasma generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020020012834A KR100360765B1 (en) 2002-03-11 2002-03-11 Inductive coupling type plasma generator

Publications (1)

Publication Number Publication Date
KR100360765B1 true KR100360765B1 (en) 2002-11-23

Family

ID=37490539

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020012834A KR100360765B1 (en) 2002-03-11 2002-03-11 Inductive coupling type plasma generator

Country Status (1)

Country Link
KR (1) KR100360765B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100554651B1 (en) * 2003-08-26 2006-02-24 어댑티브프라즈마테크놀로지 주식회사 Plasma source having increased plasma density and plasma chamber using the same
KR20190104093A (en) * 2018-02-28 2019-09-06 주식회사 인포비온 An antenna structure for a high density linear ICP source

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950034507A (en) * 1994-05-23 1995-12-28 모리시타 요이찌 Helicon plasma processing method and device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950034507A (en) * 1994-05-23 1995-12-28 모리시타 요이찌 Helicon plasma processing method and device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100554651B1 (en) * 2003-08-26 2006-02-24 어댑티브프라즈마테크놀로지 주식회사 Plasma source having increased plasma density and plasma chamber using the same
KR20190104093A (en) * 2018-02-28 2019-09-06 주식회사 인포비온 An antenna structure for a high density linear ICP source
KR102340365B1 (en) * 2018-02-28 2021-12-16 주식회사 인포비온 An antenna structure for a high density linear ICP source

Similar Documents

Publication Publication Date Title
US7298091B2 (en) Matching network for RF plasma source
KR102024443B1 (en) Wireless power transfer through a metal object
KR100513163B1 (en) Icp antenna and plasma generating apparatus using the same
US7100532B2 (en) Plasma production device and method and RF driver circuit with adjustable duty cycle
CN104704678B (en) The method for designing of impedance inverter circuit
WO2003090309A3 (en) Crossed-field radio antenna
CA2523070A1 (en) Antenna device
WO2003032434B1 (en) Plasma production device and method and rf driver circuit
ATE213869T1 (en) LOW INDUCTIVE, LARGE AREA COIL FOR AN INDUCTIVELY COUPLED PLASMA SOURCE
WO2016160681A1 (en) Wireless power transfer using multiple coil arrays
US9437399B2 (en) Plasma equipment
JP2002519861A5 (en)
CN104350664A (en) System for wireless distribution of power
CN101904048A (en) Antennas for wireless power applications
CN101990724A (en) Power splitter
WO2007044248B1 (en) Low-voltage inductively coupled source for plasma processing
US8165531B2 (en) Electromagnetic wave-potential communication system
JP2018515057A (en) Wireless electric field / magnetic field power transmission system, transmitter and receiver
JP2004509429A5 (en)
CN104979914A (en) Electric field coupled wireless power transmission system
CN102282724A (en) Inductively coupled band selectable and tunable antenna
Sharma et al. Compact ambient RF energy harvesting CPW Fed Antenna for WLAN
CN102906938A (en) Antenna having a broadband power supply structural body, and a power supply method
US10819152B2 (en) Wireless power transfer systems and components thereof
KR100360765B1 (en) Inductive coupling type plasma generator

Legal Events

Date Code Title Description
A201 Request for examination
A302 Request for accelerated examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20120905

Year of fee payment: 11

FPAY Annual fee payment

Payment date: 20130912

Year of fee payment: 12

FPAY Annual fee payment

Payment date: 20140903

Year of fee payment: 13

FPAY Annual fee payment

Payment date: 20151001

Year of fee payment: 14

FPAY Annual fee payment

Payment date: 20160927

Year of fee payment: 15

LAPS Lapse due to unpaid annual fee