JPWO2024185060A1 - - Google Patents
Info
- Publication number
- JPWO2024185060A1 JPWO2024185060A1 JP2025504980A JP2025504980A JPWO2024185060A1 JP WO2024185060 A1 JPWO2024185060 A1 JP WO2024185060A1 JP 2025504980 A JP2025504980 A JP 2025504980A JP 2025504980 A JP2025504980 A JP 2025504980A JP WO2024185060 A1 JPWO2024185060 A1 JP WO2024185060A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/008746 WO2024185060A1 (ja) | 2023-03-08 | 2023-03-08 | 感光性樹脂組成物、感光性樹脂フィルム、多層プリント配線板及び半導体パッケージ、並びに多層プリント配線板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024185060A1 true JPWO2024185060A1 (https=) | 2024-09-12 |
| JPWO2024185060A5 JPWO2024185060A5 (https=) | 2025-11-20 |
Family
ID=92674326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025504980A Pending JPWO2024185060A1 (https=) | 2023-03-08 | 2023-03-08 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2024185060A1 (https=) |
| KR (1) | KR20250151361A (https=) |
| CN (1) | CN119234184A (https=) |
| WO (1) | WO2024185060A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121343052B (zh) * | 2025-12-19 | 2026-03-20 | 湖南初源新材料股份有限公司 | 一种碱可溶性树脂及其制备方法、感光干膜抗蚀剂 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0745194B2 (ja) * | 1988-10-26 | 1995-05-17 | 松下電工株式会社 | 光硬化性樹脂および三次元形状の形成方法 |
| JP3290296B2 (ja) | 1994-05-13 | 2002-06-10 | 太陽インキ製造株式会社 | 多層プリント配線板及びその製造方法 |
| JP5217069B2 (ja) * | 2001-08-23 | 2013-06-19 | 東レ株式会社 | 感光性セラミックス組成物及びセラミックス基板 |
| JP2008107511A (ja) * | 2006-10-25 | 2008-05-08 | Kaneka Corp | 硬化性組成物 |
| JP5441542B2 (ja) * | 2009-07-22 | 2014-03-12 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜、層間絶縁膜、有機ｅｌ表示装置、及び液晶表示装置 |
| JP2011048195A (ja) * | 2009-08-27 | 2011-03-10 | Asahi Glass Co Ltd | 光学素子隔壁形成用感光性組成物、これを用いたブラックマトリックスおよびその製造方法、並びにカラーフィルタオンアレイの製造方法 |
| JP2011075786A (ja) * | 2009-09-30 | 2011-04-14 | Sekisui Chem Co Ltd | 感光性組成物 |
| JP5539429B2 (ja) * | 2012-03-19 | 2014-07-02 | 富士フイルム株式会社 | 着色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置 |
| CN105467752A (zh) * | 2014-06-23 | 2016-04-06 | 太阳油墨（苏州）有限公司 | 用于制造印刷电路板的光固化性热固化性树脂组合物、干膜、固化物、及印刷电路板 |
| JP7018168B2 (ja) | 2015-12-22 | 2022-02-10 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法 |
| JP6701324B2 (ja) * | 2016-04-06 | 2020-05-27 | 富士フイルム株式会社 | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 |
| WO2020241596A1 (ja) * | 2019-05-31 | 2020-12-03 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂フィルム、多層プリント配線板及び半導体パッケージ、並びに多層プリント配線板の製造方法 |
| JP7354664B2 (ja) * | 2019-08-14 | 2023-10-03 | 株式会社レゾナック | 感光性樹脂組成物、感光性樹脂フィルム、多層プリント配線板及び半導体パッケージ、並びに多層プリント配線板の製造方法 |
| JPWO2022265030A1 (https=) * | 2021-06-18 | 2022-12-22 |
-
2023
- 2023-03-08 KR KR1020257021925A patent/KR20250151361A/ko active Pending
- 2023-03-08 WO PCT/JP2023/008746 patent/WO2024185060A1/ja not_active Ceased
- 2023-03-08 JP JP2025504980A patent/JPWO2024185060A1/ja active Pending
- 2023-03-08 CN CN202380037457.7A patent/CN119234184A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN119234184A (zh) | 2024-12-31 |
| KR20250151361A (ko) | 2025-10-21 |
| WO2024185060A1 (ja) | 2024-09-12 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250520 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20260203 |