JPWO2022265030A1 - - Google Patents
Info
- Publication number
- JPWO2022265030A1 JPWO2022265030A1 JP2023530365A JP2023530365A JPWO2022265030A1 JP WO2022265030 A1 JPWO2022265030 A1 JP WO2022265030A1 JP 2023530365 A JP2023530365 A JP 2023530365A JP 2023530365 A JP2023530365 A JP 2023530365A JP WO2022265030 A1 JPWO2022265030 A1 JP WO2022265030A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021101336 | 2021-06-18 | ||
| PCT/JP2022/023875 WO2022265030A1 (ja) | 2021-06-18 | 2022-06-15 | 永久膜の製造方法、積層体の製造方法、及び、デバイスの製造方法、並びに、永久膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022265030A1 true JPWO2022265030A1 (https=) | 2022-12-22 |
| JPWO2022265030A5 JPWO2022265030A5 (https=) | 2024-03-21 |
Family
ID=84527565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023530365A Abandoned JPWO2022265030A1 (https=) | 2021-06-18 | 2022-06-15 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022265030A1 (https=) |
| TW (1) | TW202311304A (https=) |
| WO (1) | WO2022265030A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20250151361A (ko) * | 2023-03-08 | 2025-10-21 | 가부시끼가이샤 레조낙 | 감광성 수지 조성물, 감광성 수지 필름, 다층 프린트 배선판 및 반도체 패키지, 및 다층 프린트 배선판의 제조 방법 |
| TWI886465B (zh) * | 2023-04-12 | 2025-06-11 | 奇美實業股份有限公司 | 感光性樹脂組成物、硬化膜圖案及其製作方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013115170A (ja) * | 2011-11-28 | 2013-06-10 | Hitachi Chemical Co Ltd | プリント配線板及びその製造方法並びに感光性樹脂組成物 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014204023A (ja) * | 2013-04-08 | 2014-10-27 | 日立化成株式会社 | 導体配線を有する構造体の製造方法、その方法により製造された導体配線を有する構造体、熱硬化性樹脂組成物、樹脂フィルム、感光性樹脂組成物及びドライフィルムレジスト |
| TWI625232B (zh) * | 2016-02-26 | 2018-06-01 | 富士軟片股份有限公司 | 積層體、積層體的製造方法、半導體元件以及半導體元件的製造方法 |
-
2022
- 2022-06-15 JP JP2023530365A patent/JPWO2022265030A1/ja not_active Abandoned
- 2022-06-15 WO PCT/JP2022/023875 patent/WO2022265030A1/ja not_active Ceased
- 2022-06-16 TW TW111122448A patent/TW202311304A/zh unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013115170A (ja) * | 2011-11-28 | 2013-06-10 | Hitachi Chemical Co Ltd | プリント配線板及びその製造方法並びに感光性樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202311304A (zh) | 2023-03-16 |
| WO2022265030A1 (ja) | 2022-12-22 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231211 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250306 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20260217 |
|
| A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20260402 |