JPWO2024157336A5 - - Google Patents

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Publication number
JPWO2024157336A5
JPWO2024157336A5 JP2024572554A JP2024572554A JPWO2024157336A5 JP WO2024157336 A5 JPWO2024157336 A5 JP WO2024157336A5 JP 2024572554 A JP2024572554 A JP 2024572554A JP 2024572554 A JP2024572554 A JP 2024572554A JP WO2024157336 A5 JPWO2024157336 A5 JP WO2024157336A5
Authority
JP
Japan
Prior art keywords
sample piece
stage
wafer
base
observation surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024572554A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024157336A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2023/001972 external-priority patent/WO2024157336A1/ja
Publication of JPWO2024157336A1 publication Critical patent/JPWO2024157336A1/ja
Publication of JPWO2024157336A5 publication Critical patent/JPWO2024157336A5/ja
Pending legal-status Critical Current

Links

JP2024572554A 2023-01-23 2023-01-23 Pending JPWO2024157336A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/001972 WO2024157336A1 (ja) 2023-01-23 2023-01-23 荷電粒子ビーム装置及び試料片の作製・観察方法

Publications (2)

Publication Number Publication Date
JPWO2024157336A1 JPWO2024157336A1 (https=) 2024-08-02
JPWO2024157336A5 true JPWO2024157336A5 (https=) 2025-09-16

Family

ID=91970056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024572554A Pending JPWO2024157336A1 (https=) 2023-01-23 2023-01-23

Country Status (2)

Country Link
JP (1) JPWO2024157336A1 (https=)
WO (1) WO2024157336A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH087121B2 (ja) * 1990-07-18 1996-01-29 セイコー電子工業株式会社 集束荷電ビーム加工方法
JP3805547B2 (ja) * 1999-01-21 2006-08-02 株式会社日立製作所 試料作製装置
EP1780764A1 (en) * 2005-11-01 2007-05-02 FEI Company Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating a sample in such an apparatus
JP5612493B2 (ja) * 2010-03-18 2014-10-22 株式会社日立ハイテクサイエンス 複合荷電粒子ビーム装置
WO2021130992A1 (ja) * 2019-12-26 2021-07-01 株式会社日立ハイテク 解析システム、ラメラの検査方法および荷電粒子線装置

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