JPWO2023277053A1 - - Google Patents

Info

Publication number
JPWO2023277053A1
JPWO2023277053A1 JP2023532009A JP2023532009A JPWO2023277053A1 JP WO2023277053 A1 JPWO2023277053 A1 JP WO2023277053A1 JP 2023532009 A JP2023532009 A JP 2023532009A JP 2023532009 A JP2023532009 A JP 2023532009A JP WO2023277053 A1 JPWO2023277053 A1 JP WO2023277053A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023532009A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023277053A1 publication Critical patent/JPWO2023277053A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2023532009A 2021-06-30 2022-06-29 Pending JPWO2023277053A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021108582 2021-06-30
PCT/JP2022/025920 WO2023277053A1 (ja) 2021-06-30 2022-06-29 フレキソ印刷版原版およびフレキソ印刷版の製造方法

Publications (1)

Publication Number Publication Date
JPWO2023277053A1 true JPWO2023277053A1 (https=) 2023-01-05

Family

ID=84690239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023532009A Pending JPWO2023277053A1 (https=) 2021-06-30 2022-06-29

Country Status (5)

Country Link
US (1) US20240126173A1 (https=)
EP (1) EP4364947A4 (https=)
JP (1) JPWO2023277053A1 (https=)
CN (1) CN117616335A (https=)
WO (1) WO2023277053A1 (https=)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008520003A (ja) * 2004-11-12 2008-06-12 マクダーミッド プリンティング ソリューションズ， エルエルシー 感光性印刷スリーブの熱処理方法
JP2013073180A (ja) * 2011-09-29 2013-04-22 Tokai Rubber Ind Ltd 剥離現像用フレキソ印刷版原版
WO2014021322A1 (ja) * 2012-07-31 2014-02-06 東レ株式会社 感光性樹脂組成物および感光性樹脂印刷版原版
WO2017038970A1 (ja) * 2015-09-03 2017-03-09 東レ株式会社 感光性樹脂印刷版原版および印刷版の製造方法
WO2017170573A1 (ja) * 2016-04-01 2017-10-05 旭化成株式会社 フレキソ印刷版用感光性樹脂構成体、及びフレキソ印刷版
WO2020122001A1 (ja) * 2018-12-10 2020-06-18 旭化成株式会社 フレキソ印刷原版及びフレキソ印刷版の製造方法
WO2021039263A1 (ja) * 2019-08-23 2021-03-04 東洋紡株式会社 フレキソ印刷原版

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5710961B2 (ja) 2010-12-24 2015-04-30 住友理工株式会社 フレキソ印刷版原版
JP7229332B2 (ja) * 2019-02-27 2023-02-27 旭化成株式会社 フレキソ印刷原版及びフレキソ印刷版の製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008520003A (ja) * 2004-11-12 2008-06-12 マクダーミッド プリンティング ソリューションズ， エルエルシー 感光性印刷スリーブの熱処理方法
JP2013073180A (ja) * 2011-09-29 2013-04-22 Tokai Rubber Ind Ltd 剥離現像用フレキソ印刷版原版
WO2014021322A1 (ja) * 2012-07-31 2014-02-06 東レ株式会社 感光性樹脂組成物および感光性樹脂印刷版原版
WO2017038970A1 (ja) * 2015-09-03 2017-03-09 東レ株式会社 感光性樹脂印刷版原版および印刷版の製造方法
WO2017170573A1 (ja) * 2016-04-01 2017-10-05 旭化成株式会社 フレキソ印刷版用感光性樹脂構成体、及びフレキソ印刷版
WO2020122001A1 (ja) * 2018-12-10 2020-06-18 旭化成株式会社 フレキソ印刷原版及びフレキソ印刷版の製造方法
WO2021039263A1 (ja) * 2019-08-23 2021-03-04 東洋紡株式会社 フレキソ印刷原版

Also Published As

Publication number Publication date
WO2023277053A1 (ja) 2023-01-05
CN117616335A (zh) 2024-02-27
US20240126173A1 (en) 2024-04-18
EP4364947A4 (en) 2024-12-04
EP4364947A1 (en) 2024-05-08

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