JPWO2023238299A5 - - Google Patents
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- Publication number
- JPWO2023238299A5 JPWO2023238299A5 JP2024526131A JP2024526131A JPWO2023238299A5 JP WO2023238299 A5 JPWO2023238299 A5 JP WO2023238299A5 JP 2024526131 A JP2024526131 A JP 2024526131A JP 2024526131 A JP2024526131 A JP 2024526131A JP WO2023238299 A5 JPWO2023238299 A5 JP WO2023238299A5
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- alkali
- photosensitive resin
- composition according
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 claims description 15
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 8
- -1 acrylate compound Chemical class 0.000 claims description 4
- 239000011230 binding agent Substances 0.000 claims description 4
- 239000000178 monomer Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims 9
- 229920005989 resin Polymers 0.000 claims 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims 8
- 238000000034 method Methods 0.000 claims 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- 125000006353 oxyethylene group Chemical group 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 4
- 239000001294 propane Substances 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000007747 plating Methods 0.000 claims 2
- 150000003440 styrenes Chemical class 0.000 claims 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/023189 WO2023238299A1 (ja) | 2022-06-08 | 2022-06-08 | アルカリ可溶性樹脂、感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023238299A1 JPWO2023238299A1 (https=) | 2023-12-14 |
| JPWO2023238299A5 true JPWO2023238299A5 (https=) | 2024-08-30 |
Family
ID=89117775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024526131A Pending JPWO2023238299A1 (https=) | 2022-06-08 | 2022-06-08 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2023238299A1 (https=) |
| KR (1) | KR20250021467A (https=) |
| CN (1) | CN118475880A (https=) |
| TW (1) | TW202406943A (https=) |
| WO (1) | WO2023238299A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120040387B (zh) * | 2025-04-23 | 2025-09-09 | 湖南初源新材料股份有限公司 | 一种二环氧烷氧基蒽光敏剂、光固化树脂组合物和感光干膜及应用 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007078889A (ja) * | 2005-09-12 | 2007-03-29 | Fujifilm Corp | 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法 |
| JP4924230B2 (ja) | 2007-06-21 | 2012-04-25 | 日立化成工業株式会社 | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP5777461B2 (ja) | 2011-09-14 | 2015-09-09 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
| JP7333735B2 (ja) * | 2019-09-19 | 2023-08-25 | 旭化成株式会社 | 低誘電感光性樹脂組成物、及びその硬化物 |
| CN116209571A (zh) * | 2020-08-07 | 2023-06-02 | 株式会社力森诺科 | 感光性树脂组合物、感光性元件、抗蚀剂图案的形成方法及印刷线路板的制造方法 |
| WO2022054599A1 (ja) * | 2020-09-14 | 2022-03-17 | 富士フイルム株式会社 | 感光性転写材料、樹脂パターンの製造方法、エッチング方法、及び、電子デバイスの製造方法 |
-
2022
- 2022-06-08 CN CN202280086725.XA patent/CN118475880A/zh active Pending
- 2022-06-08 WO PCT/JP2022/023189 patent/WO2023238299A1/ja not_active Ceased
- 2022-06-08 KR KR1020247041830A patent/KR20250021467A/ko active Pending
- 2022-06-08 JP JP2024526131A patent/JPWO2023238299A1/ja active Pending
-
2023
- 2023-06-02 TW TW112120665A patent/TW202406943A/zh unknown
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