JPWO2023210116A5 - - Google Patents

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Publication number
JPWO2023210116A5
JPWO2023210116A5 JP2024517855A JP2024517855A JPWO2023210116A5 JP WO2023210116 A5 JPWO2023210116 A5 JP WO2023210116A5 JP 2024517855 A JP2024517855 A JP 2024517855A JP 2024517855 A JP2024517855 A JP 2024517855A JP WO2023210116 A5 JPWO2023210116 A5 JP WO2023210116A5
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JP
Japan
Prior art keywords
light
optical
measurement
interference
light source
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JP2024517855A
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English (en)
Japanese (ja)
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JPWO2023210116A1 (https=
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Priority claimed from PCT/JP2023/005270 external-priority patent/WO2023210116A1/ja
Publication of JPWO2023210116A1 publication Critical patent/JPWO2023210116A1/ja
Publication of JPWO2023210116A5 publication Critical patent/JPWO2023210116A5/ja
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JP2024517855A 2022-04-27 2023-02-15 Pending JPWO2023210116A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022073302 2022-04-27
PCT/JP2023/005270 WO2023210116A1 (ja) 2022-04-27 2023-02-15 光干渉計測装置

Publications (2)

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JPWO2023210116A1 JPWO2023210116A1 (https=) 2023-11-02
JPWO2023210116A5 true JPWO2023210116A5 (https=) 2025-01-16

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JP2024517855A Pending JPWO2023210116A1 (https=) 2022-04-27 2023-02-15

Country Status (4)

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US (1) US20250035427A1 (https=)
JP (1) JPWO2023210116A1 (https=)
CN (1) CN118922710A (https=)
WO (1) WO2023210116A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2024209942A1 (https=) * 2023-04-06 2024-10-10

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10207186C1 (de) * 2002-02-21 2003-04-17 Alexander Knuettel Niederkohärenz-interferometrisches Gerät zur lichtoptischen Abtastung eines Objektes
JP4038560B2 (ja) * 2003-05-13 2008-01-30 国立大学法人 筑波大学 時間シアリング光コヒーレンストモグラフィー装置
JP5060678B2 (ja) * 2008-05-08 2012-10-31 株式会社キーエンス 光学式変位計
JP2011095197A (ja) * 2009-11-02 2011-05-12 Naoyuki Furuyama 厚み測定方法及び厚み測定装置
JP4916573B2 (ja) * 2010-01-28 2012-04-11 パナソニック株式会社 光干渉計測方法および光干渉計測装置
JP2011257160A (ja) * 2010-06-04 2011-12-22 Canon Inc 光干渉断層撮像装置、光干渉断層撮像方法、およびプログラム
JP5724133B2 (ja) * 2011-01-25 2015-05-27 国立大学法人東京農工大学 構造測定方法および構造測定装置
JP2013029317A (ja) * 2011-07-26 2013-02-07 Hitachi High-Technologies Corp 光断層画像測定装置および光断層画像測定システム
JP5984351B2 (ja) * 2011-09-14 2016-09-06 キヤノン株式会社 計測装置
EP2806246B1 (en) * 2013-05-24 2019-11-20 Attocube Systems AG Dual laser interferometer
JP2015137996A (ja) * 2014-01-24 2015-07-30 株式会社東京精密 計測システム、ファブリーペロー共振器及び計測方法
EP3213690B1 (en) * 2014-10-27 2020-02-26 FUJIFILM Corporation Light penetration depth evaluation method, performance test method using evaluation method, and optical tomography apparatus
CN104729424B (zh) * 2015-03-09 2017-10-20 南京信息工程大学 基于自混合干涉的共焦点激光显微镜及其扫描方法
JP2017049117A (ja) * 2015-09-02 2017-03-09 株式会社東京精密 寸法測定装置及び参照光路長走査装置
US10228389B2 (en) * 2015-12-02 2019-03-12 Bruker Nano, Inc. Method and apparatus for infrared scattering scanning near-field optical microscopy with background suppression
KR101746693B1 (ko) * 2015-12-15 2017-06-14 한국과학기술원 다중 두 파장 레이저 간섭계를 이용한 절대 길이 측정 장치
CA3014324A1 (en) * 2016-02-12 2017-08-17 The General Hospital Corporation Apparatus and methods for high-speed and long depth range imaging using optical coherence tomography
JP2017142192A (ja) * 2016-02-12 2017-08-17 株式会社トーメーコーポレーション 光干渉断層計
JP2017181300A (ja) * 2016-03-30 2017-10-05 国立大学法人名古屋大学 農作物観測方法、農作物観測装置および農作物の生産方法
US10753801B2 (en) * 2016-12-07 2020-08-25 UNIVERSITé LAVAL Methods for performing dual-comb interferometry using a frequency offset relation
JP6887644B2 (ja) * 2017-09-11 2021-06-16 株式会社東京精密 校正装置及び校正方法
EP3657203B1 (de) * 2018-11-22 2026-04-01 Hexagon Innovation Hub GmbH Elektrooptischer entfernungsmesser und entfernungsmessverfahren
JP2022101264A (ja) * 2020-12-24 2022-07-06 株式会社トプコン 光干渉測定装置
JP6925550B1 (ja) * 2021-01-26 2021-08-25 株式会社Xtia 光コム発生装置
CN113587844B (zh) * 2021-07-27 2022-05-27 中国科学院长春光学精密机械与物理研究所 移相干涉测量系统及测量方法

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