JPWO2023189586A1 - - Google Patents
Info
- Publication number
- JPWO2023189586A1 JPWO2023189586A1 JP2024511746A JP2024511746A JPWO2023189586A1 JP WO2023189586 A1 JPWO2023189586 A1 JP WO2023189586A1 JP 2024511746 A JP2024511746 A JP 2024511746A JP 2024511746 A JP2024511746 A JP 2024511746A JP WO2023189586 A1 JPWO2023189586 A1 JP WO2023189586A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022053997 | 2022-03-29 | ||
| PCT/JP2023/010026 WO2023189586A1 (ja) | 2022-03-29 | 2023-03-15 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023189586A1 true JPWO2023189586A1 (enrdf_load_stackoverflow) | 2023-10-05 |
Family
ID=88201547
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024511746A Pending JPWO2023189586A1 (enrdf_load_stackoverflow) | 2022-03-29 | 2023-03-15 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023189586A1 (enrdf_load_stackoverflow) |
| TW (1) | TW202347030A (enrdf_load_stackoverflow) |
| WO (1) | WO2023189586A1 (enrdf_load_stackoverflow) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6029744A (ja) * | 1983-07-28 | 1985-02-15 | Fujitsu Ltd | パタ−ン形成方法 |
| JPS61170735A (ja) * | 1985-01-25 | 1986-08-01 | Toray Ind Inc | ポリ（フルオロアルキルα−クロロアクリラ−ト）ないしそのコポリマの製造法 |
| JP2003021903A (ja) * | 2001-07-05 | 2003-01-24 | Mitsubishi Electric Corp | 感光性樹脂組成物およびこれを用いたマイクロデバイスの製造方法 |
| US20210173309A1 (en) * | 2017-09-04 | 2021-06-10 | Fujifilm Corporation | Method of forming reversed pattern and method of manufacturing electronic device |
| JP7579516B2 (ja) * | 2018-12-27 | 2024-11-08 | 三菱瓦斯化学株式会社 | 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法 |
| JP7238454B2 (ja) * | 2019-02-19 | 2023-03-14 | 日本ゼオン株式会社 | レジストパターン形成方法 |
| TW202120462A (zh) * | 2019-08-09 | 2021-06-01 | 日商三菱瓦斯化學股份有限公司 | 化合物、聚合物、組成物、膜形成用組成物、圖型形成方法、絕緣膜之形成方法及化合物之製造方法，以及含有碘之乙烯基聚合物及其乙醯化衍生物之製造方法 |
| IL310073A (en) * | 2021-07-14 | 2024-03-01 | Fujifilm Corp | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device |
| JPWO2023286764A1 (enrdf_load_stackoverflow) * | 2021-07-14 | 2023-01-19 | ||
| IL310053A (en) * | 2021-07-14 | 2024-03-01 | Fujifilm Corp | A method for creating a template and a method for manufacturing an electronic device |
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2023
- 2023-03-15 WO PCT/JP2023/010026 patent/WO2023189586A1/ja active Application Filing
- 2023-03-15 JP JP2024511746A patent/JPWO2023189586A1/ja active Pending
- 2023-03-24 TW TW112111246A patent/TW202347030A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202347030A (zh) | 2023-12-01 |
| WO2023189586A1 (ja) | 2023-10-05 |