JPWO2023182094A1 - - Google Patents
Info
- Publication number
- JPWO2023182094A1 JPWO2023182094A1 JP2024510060A JP2024510060A JPWO2023182094A1 JP WO2023182094 A1 JPWO2023182094 A1 JP WO2023182094A1 JP 2024510060 A JP2024510060 A JP 2024510060A JP 2024510060 A JP2024510060 A JP 2024510060A JP WO2023182094 A1 JPWO2023182094 A1 JP WO2023182094A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022050471 | 2022-03-25 | ||
| PCT/JP2023/010043 WO2023182094A1 (ja) | 2022-03-25 | 2023-03-15 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、レジストパターン形成方法、電子デバイスの製造方法、電子デバイス |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023182094A1 true JPWO2023182094A1 (enrdf_load_stackoverflow) | 2023-09-28 |
Family
ID=88101476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024510060A Pending JPWO2023182094A1 (enrdf_load_stackoverflow) | 2022-03-25 | 2023-03-15 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023182094A1 (enrdf_load_stackoverflow) |
| TW (1) | TW202349116A (enrdf_load_stackoverflow) |
| WO (1) | WO2023182094A1 (enrdf_load_stackoverflow) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5789623B2 (ja) * | 2012-03-29 | 2015-10-07 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜及びパターン形成方法 |
| US20210173309A1 (en) * | 2017-09-04 | 2021-06-10 | Fujifilm Corporation | Method of forming reversed pattern and method of manufacturing electronic device |
| CN112400139B (zh) * | 2018-07-11 | 2024-04-23 | 富士胶片株式会社 | 药液、药液收容体 |
| WO2020040034A1 (ja) * | 2018-08-20 | 2020-02-27 | 富士フイルム株式会社 | 薬液収容体 |
| IL295048A (en) * | 2020-01-31 | 2022-09-01 | Fujifilm Corp | Positive tone resist composition, resist film, pattern forming method, and method for manufacturing electronic device |
| IL310073A (en) * | 2021-07-14 | 2024-03-01 | Fujifilm Corp | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device |
| JPWO2023286764A1 (enrdf_load_stackoverflow) * | 2021-07-14 | 2023-01-19 | ||
| IL310053A (en) * | 2021-07-14 | 2024-03-01 | Fujifilm Corp | A method for creating a template and a method for manufacturing an electronic device |
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2023
- 2023-03-15 JP JP2024510060A patent/JPWO2023182094A1/ja active Pending
- 2023-03-15 WO PCT/JP2023/010043 patent/WO2023182094A1/ja active Application Filing
- 2023-03-24 TW TW112111236A patent/TW202349116A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202349116A (zh) | 2023-12-16 |
| WO2023182094A1 (ja) | 2023-09-28 |