JPWO2023176172A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2023176172A5 JPWO2023176172A5 JP2024507555A JP2024507555A JPWO2023176172A5 JP WO2023176172 A5 JPWO2023176172 A5 JP WO2023176172A5 JP 2024507555 A JP2024507555 A JP 2024507555A JP 2024507555 A JP2024507555 A JP 2024507555A JP WO2023176172 A5 JPWO2023176172 A5 JP WO2023176172A5
- Authority
- JP
- Japan
- Prior art keywords
- alcohol
- polyimide resin
- group
- resin precursor
- bond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920001721 polyimide Polymers 0.000 claims description 25
- 239000009719 polyimide resin Substances 0.000 claims description 25
- 239000002243 precursor Substances 0.000 claims description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- -1 diamine compound Chemical class 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011342 resin composition Substances 0.000 claims description 6
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 239000003505 polymerization initiator Substances 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 125000000962 organic group Chemical group 0.000 claims 3
- 150000001298 alcohols Chemical class 0.000 claims 2
- 239000007795 chemical reaction product Substances 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 125000005462 imide group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Substances C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 150000003536 tetrazoles Chemical class 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- VOJRRQSAFQFFQU-UHFFFAOYSA-N 2-(3-triethoxysilylpropylcarbamoyl)benzoic acid Chemical compound CCO[Si](OCC)(OCC)CCCNC(=O)C1=CC=CC=C1C(O)=O VOJRRQSAFQFFQU-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- XZGLNCKSNVGDNX-UHFFFAOYSA-N 5-methyl-2h-tetrazole Chemical compound CC=1N=NNN=1 XZGLNCKSNVGDNX-UHFFFAOYSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- SEEVRZDUPHZSOX-WPWMEQJKSA-N [(e)-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(\C)=N\OC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-WPWMEQJKSA-N 0.000 description 1
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- USPWKWBDZOARPV-UHFFFAOYSA-N pyrazolidine Chemical compound C1CNNC1 USPWKWBDZOARPV-UHFFFAOYSA-N 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022038988 | 2022-03-14 | ||
| PCT/JP2023/002856 WO2023176172A1 (ja) | 2022-03-14 | 2023-01-30 | ポリイミド樹脂前駆体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023176172A1 JPWO2023176172A1 (https=) | 2023-09-21 |
| JPWO2023176172A5 true JPWO2023176172A5 (https=) | 2024-12-03 |
Family
ID=88022777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024507555A Pending JPWO2023176172A1 (https=) | 2022-03-14 | 2023-01-30 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250189891A1 (https=) |
| JP (1) | JPWO2023176172A1 (https=) |
| KR (1) | KR20240158986A (https=) |
| CN (1) | CN118900872A (https=) |
| TW (1) | TWI870779B (https=) |
| WO (1) | WO2023176172A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121432805B (zh) * | 2025-12-30 | 2026-04-10 | 浙江奥首材料科技有限公司 | 高粘附性的负性光敏树脂组合物及制法与应用 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61132544A (ja) * | 1984-11-30 | 1986-06-20 | Nitto Electric Ind Co Ltd | 樹脂被覆光学ガラスフアイバの製造方法 |
| JPH0680776A (ja) * | 1992-09-02 | 1994-03-22 | Asahi Chem Ind Co Ltd | ポリイミド前駆体及び組成物 |
| JPH06214390A (ja) * | 1992-10-22 | 1994-08-05 | Sumitomo Bakelite Co Ltd | ネガ型感光性樹脂組成物およびそのパターン形成方法 |
| JPH0822124A (ja) * | 1994-07-11 | 1996-01-23 | Sumitomo Bakelite Co Ltd | 感光性樹脂組成物及びそのパターン形成方法 |
| JP2001330950A (ja) * | 2000-05-18 | 2001-11-30 | Toray Ind Inc | 感光性重合体組成物 |
| JP2008015060A (ja) * | 2006-07-04 | 2008-01-24 | Asahi Kasei Electronics Co Ltd | 感光性ポリアミド酸エステル組成物 |
| CN107000421A (zh) | 2014-09-25 | 2017-08-01 | 巴斯夫欧洲公司 | 用于真空绝热元件的复合元件的制造方法 |
| JP7003771B2 (ja) * | 2017-03-28 | 2022-01-21 | 東レ株式会社 | 感光性樹脂組成物、感光性シート、ならびにそれらの硬化膜およびその製造方法 |
| JP6789900B2 (ja) | 2017-09-01 | 2020-11-25 | Ntn株式会社 | 減速装置 |
-
2023
- 2023-01-30 CN CN202380027322.2A patent/CN118900872A/zh active Pending
- 2023-01-30 JP JP2024507555A patent/JPWO2023176172A1/ja active Pending
- 2023-01-30 US US18/843,134 patent/US20250189891A1/en active Pending
- 2023-01-30 KR KR1020247033804A patent/KR20240158986A/ko active Pending
- 2023-01-30 WO PCT/JP2023/002856 patent/WO2023176172A1/ja not_active Ceased
- 2023-02-10 TW TW112104793A patent/TWI870779B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4642860B2 (ja) | フルオロアルキルスルホンの光酸発生部が置換された新規の単量体およびその重合体 | |
| JP2021120762A5 (https=) | ||
| JP2005500421A5 (https=) | ||
| WO2013011822A2 (ja) | トリアルコキシシリルアルキル基を有するオニウム塩 | |
| JPWO2023176172A5 (https=) | ||
| WO2021117586A1 (ja) | 感光性絶縁膜形成組成物 | |
| WO2023106108A1 (ja) | 感光性樹脂組成物 | |
| JPWO2020080207A1 (ja) | 感光性絶縁膜組成物 | |
| JP7327410B2 (ja) | ポリアミック酸エステル樹脂組成物 | |
| CN118302485A (zh) | 树脂组合物 | |
| TWI866078B (zh) | 聚醯亞胺前驅體、負型感光性樹脂組合物、及使用其之硬化浮凸圖案之製造方法 | |
| JP2776597B2 (ja) | 四級塩化方法 | |
| JP7444239B2 (ja) | 感光性絶縁膜形成組成物 | |
| JP7533717B2 (ja) | 感光性絶縁膜組成物 | |
| JP3494261B2 (ja) | Ｎ−アリルウレタン系重合体およびその製造方法 | |
| JP7332076B1 (ja) | 絶縁膜形成用感光性樹脂組成物 | |
| TW202449024A (zh) | 負型感光性樹脂組合物、以及使用其之硬化浮凸圖案之製造方法及硬化膜 | |
| WO2023176259A1 (ja) | 絶縁膜形成用感光性樹脂組成物 | |
| TW200306458A (en) | New acid generator and thin film composition containing the same | |
| JP7451969B2 (ja) | 樹脂組成物、硬化物の製造方法、硬化物、カバーコート層、表面保護膜及び電子部品 | |
| KR102541140B1 (ko) | 신규한 옥심에스테르 카바졸 유도체 화합물 | |
| KR20210111690A (ko) | 신규한 옥심에스테르 카바졸 유도체 화합물 | |
| JP2009137901A (ja) | 第四級アンモニウム塩 | |
| JPH04308578A (ja) | １−〔２−（メタクリロイルオキシ）エチル〕−２−アルキルイミダゾール化合物 | |
| JP7852394B2 (ja) | 感光性樹脂組成物、硬化物、パターン硬化物の製造方法、及び電子部品 |