JPWO2023145805A5 - - Google Patents

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Publication number
JPWO2023145805A5
JPWO2023145805A5 JP2023576968A JP2023576968A JPWO2023145805A5 JP WO2023145805 A5 JPWO2023145805 A5 JP WO2023145805A5 JP 2023576968 A JP2023576968 A JP 2023576968A JP 2023576968 A JP2023576968 A JP 2023576968A JP WO2023145805 A5 JPWO2023145805 A5 JP WO2023145805A5
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JP
Japan
Prior art keywords
doping concentration
concentration peak
peak
peaks
semiconductor device
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JP2023576968A
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Japanese (ja)
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JP7687453B2 (ja
JPWO2023145805A1 (https=
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Priority claimed from PCT/JP2023/002394 external-priority patent/WO2023145805A1/ja
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Publication of JPWO2023145805A5 publication Critical patent/JPWO2023145805A5/ja
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JP2023576968A 2022-01-28 2023-01-26 半導体装置および製造方法 Active JP7687453B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022011904 2022-01-28
JP2022011904 2022-01-28
PCT/JP2023/002394 WO2023145805A1 (ja) 2022-01-28 2023-01-26 半導体装置および製造方法

Publications (3)

Publication Number Publication Date
JPWO2023145805A1 JPWO2023145805A1 (https=) 2023-08-03
JPWO2023145805A5 true JPWO2023145805A5 (https=) 2024-03-29
JP7687453B2 JP7687453B2 (ja) 2025-06-03

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JP2023576968A Active JP7687453B2 (ja) 2022-01-28 2023-01-26 半導体装置および製造方法

Country Status (4)

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US (1) US20240128320A1 (https=)
JP (1) JP7687453B2 (https=)
CN (1) CN117561610A (https=)
WO (1) WO2023145805A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024098458A (ja) * 2023-01-10 2024-07-23 富士電機株式会社 半導体装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107710417B (zh) 2015-06-16 2021-06-11 三菱电机株式会社 半导体装置的制造方法
JP6477897B2 (ja) 2015-09-16 2019-03-06 富士電機株式会社 半導体装置および半導体装置の製造方法
CN112204710B (zh) 2018-12-28 2024-07-09 富士电机株式会社 半导体装置及制造方法
JP7173312B2 (ja) 2019-05-16 2022-11-16 富士電機株式会社 半導体装置および半導体装置の製造方法
WO2021075330A1 (ja) 2019-10-17 2021-04-22 富士電機株式会社 半導体装置および半導体装置の製造方法
DE112021000103T5 (de) 2020-04-01 2022-06-30 Fuji Electric Co., Ltd. Halbleitervorrichtung und herstellungsverfahren einer halbleitervorrichtung

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