JPWO2023145238A1 - - Google Patents
Info
- Publication number
- JPWO2023145238A1 JPWO2023145238A1 JP2023576659A JP2023576659A JPWO2023145238A1 JP WO2023145238 A1 JPWO2023145238 A1 JP WO2023145238A1 JP 2023576659 A JP2023576659 A JP 2023576659A JP 2023576659 A JP2023576659 A JP 2023576659A JP WO2023145238 A1 JPWO2023145238 A1 JP WO2023145238A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/18—Investigating the presence of flaws defects or foreign matter
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
- H01J35/153—Spot position control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/16—Vessels; Containers; Shields associated therewith
- H01J35/18—Windows
- H01J35/186—Windows used as targets or X-ray converters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/03—Investigating materials by wave or particle radiation by transmission
- G01N2223/04—Investigating materials by wave or particle radiation by transmission and measuring absorption
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/052—Investigating materials by wave or particle radiation by diffraction, scatter or reflection reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/071—Investigating materials by wave or particle radiation secondary emission combination of measurements, at least 1 secondary emission
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/20—Sources of radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/20—Sources of radiation
- G01N2223/204—Sources of radiation source created from radiated target
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/32—Accessories, mechanical or electrical features adjustments of elements during operation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/643—Specific applications or type of materials object on conveyor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/652—Specific applications or type of materials impurities, foreign matter, trace amounts
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Toxicology (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Engineering & Computer Science (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022013653 | 2022-01-31 | ||
| PCT/JP2022/043908 WO2023145238A1 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023145238A1 true JPWO2023145238A1 (ja) | 2023-08-03 |
| JPWO2023145238A5 JPWO2023145238A5 (ja) | 2024-09-30 |
Family
ID=87471017
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023576659A Pending JPWO2023145238A1 (ja) | 2022-01-31 | 2022-11-29 | |
| JP2023576658A Pending JPWO2023145237A1 (ja) | 2022-01-31 | 2022-11-29 | |
| JP2023576656A Pending JPWO2023145235A1 (ja) | 2022-01-31 | 2022-11-29 | |
| JP2023001301A Pending JP2023111866A (ja) | 2022-01-31 | 2023-01-06 | 検査装置および検査方法 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023576658A Pending JPWO2023145237A1 (ja) | 2022-01-31 | 2022-11-29 | |
| JP2023576656A Pending JPWO2023145235A1 (ja) | 2022-01-31 | 2022-11-29 | |
| JP2023001301A Pending JP2023111866A (ja) | 2022-01-31 | 2023-01-06 | 検査装置および検査方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (5) | US11977038B2 (ja) |
| JP (4) | JPWO2023145238A1 (ja) |
| KR (5) | KR20240141192A (ja) |
| CN (3) | CN118661094A (ja) |
| TW (5) | TWI846289B (ja) |
| WO (5) | WO2023145101A1 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023145101A1 (ja) * | 2022-01-31 | 2023-08-03 | キヤノンアネルバ株式会社 | 検査装置および検査方法 |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05346411A (ja) * | 1992-04-16 | 1993-12-27 | Rigaku Denki Kogyo Kk | 蛍光ｘ線分析装置 |
| WO1995023963A1 (en) * | 1994-03-02 | 1995-09-08 | Philips Electronics N.V. | X-ray spectrometer with a grazing take-off angle |
| JP3165615B2 (ja) * | 1995-03-17 | 2001-05-14 | 財団法人国際超電導産業技術研究センター | 表面元素分析方法及び装置 |
| KR100233312B1 (ko) | 1995-08-09 | 1999-12-01 | 야마모토 카즈모토 | 전반사 형광 x선 분석 장치 및 방법 |
| US5742658A (en) | 1996-05-23 | 1998-04-21 | Advanced Micro Devices, Inc. | Apparatus and method for determining the elemental compositions and relative locations of particles on the surface of a semiconductor wafer |
| JPH09318565A (ja) * | 1996-05-24 | 1997-12-12 | Rigaku Ind Co | Ｘ線分析方法および装置 |
| US6005915A (en) | 1997-11-07 | 1999-12-21 | Advanced Micro Devices, Inc. | Apparatus and method for measuring the roughness of a target material surface based upon the scattering of incident X-ray photons |
| JP2000055841A (ja) * | 1998-08-13 | 2000-02-25 | Fujitsu Ltd | Ｘ線分析方法 |
| DE19934987B4 (de) | 1999-07-26 | 2004-11-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Röntgenanode und ihre Verwendung |
| US6829327B1 (en) * | 2000-09-22 | 2004-12-07 | X-Ray Optical Systems, Inc. | Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic |
| JP3998556B2 (ja) * | 2002-10-17 | 2007-10-31 | 株式会社東研 | 高分解能ｘ線顕微検査装置 |
| JP2005292077A (ja) * | 2004-04-05 | 2005-10-20 | Fuji Electric Holdings Co Ltd | Ｘ線顕微鏡装置 |
| US7916834B2 (en) * | 2007-02-12 | 2011-03-29 | Thermo Niton Analyzers Llc | Small spot X-ray fluorescence (XRF) analyzer |
| JP2007212468A (ja) * | 2007-03-16 | 2007-08-23 | Tohken Co Ltd | 高分解機能ｘ線顕微検査装置 |
| JP5489412B2 (ja) | 2008-03-26 | 2014-05-14 | 株式会社マーストーケンソリューション | 蛍光ｘ線分析機能付き高分解能ｘ線顕微装置 |
| JP4914514B2 (ja) | 2010-07-02 | 2012-04-11 | 株式会社リガク | 蛍光ｘ線分析装置および方法 |
| JP5887760B2 (ja) * | 2011-08-24 | 2016-03-16 | 富士通株式会社 | 半導体装置の検査方法及び半導体装置の製造方法 |
| US20140067316A1 (en) | 2012-08-30 | 2014-03-06 | Kabushiki Kaisha Toshiba | Measuring apparatus, detector deviation monitoring method and measuring method |
| JP6026936B2 (ja) | 2013-03-28 | 2016-11-16 | 株式会社日立ハイテクサイエンス | 異物検出装置 |
| US9551677B2 (en) * | 2014-01-21 | 2017-01-24 | Bruker Jv Israel Ltd. | Angle calibration for grazing-incidence X-ray fluorescence (GIXRF) |
| US9594036B2 (en) * | 2014-02-28 | 2017-03-14 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
| US10514345B2 (en) * | 2014-10-14 | 2019-12-24 | Rigaku Corporation | X-ray thin film inspection device |
| DE112015006104B4 (de) * | 2015-03-25 | 2022-05-19 | Hitachi High-Tech Corporation | Elektronenmikroskop |
| CN108401442B (zh) * | 2015-06-30 | 2021-01-15 | 伊利诺斯工具制品有限公司 | 联机x射线测量设备和方法 |
| US10295486B2 (en) * | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
| JP6630365B2 (ja) * | 2015-12-15 | 2020-01-15 | 株式会社堀場製作所 | Ｘ線管、及び、ｘ線分析装置 |
| CN105758345B (zh) * | 2016-04-22 | 2018-06-05 | 武汉科技大学 | 一种在线测量带钢镀层厚度的x射线荧光成像装置 |
| CN206020314U (zh) * | 2016-09-09 | 2017-03-15 | 广州市怡文环境科技股份有限公司 | 一种全反射x射线荧光分析系统 |
| JP6867224B2 (ja) * | 2017-04-28 | 2021-04-28 | 浜松ホトニクス株式会社 | Ｘ線管及びｘ線発生装置 |
| US10895541B2 (en) | 2018-01-06 | 2021-01-19 | Kla-Tencor Corporation | Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy |
| JP6601854B1 (ja) | 2018-06-21 | 2019-11-06 | 株式会社リガク | 蛍光ｘ線分析システム |
| WO2020084890A1 (ja) | 2018-10-25 | 2020-04-30 | 株式会社堀場製作所 | Ｘ線分析装置及びｘ線発生ユニット |
| CN113877059A (zh) | 2020-07-03 | 2022-01-04 | 何浩明 | 具有调整机构以使贴片单元贴合人体的衣物结构 |
| CN114486971A (zh) | 2022-01-25 | 2022-05-13 | 深圳市埃芯半导体科技有限公司 | 多源设计的x射线分析系统和方法 |
| WO2023145101A1 (ja) * | 2022-01-31 | 2023-08-03 | キヤノンアネルバ株式会社 | 検査装置および検査方法 |
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2022
- 2022-03-31 WO PCT/JP2022/016709 patent/WO2023145101A1/ja active Application Filing
- 2022-03-31 CN CN202280090523.2A patent/CN118661094A/zh active Pending
- 2022-03-31 KR KR1020247028367A patent/KR20240141192A/ko unknown
- 2022-11-29 JP JP2023576659A patent/JPWO2023145238A1/ja active Pending
- 2022-11-29 WO PCT/JP2022/043908 patent/WO2023145238A1/ja active Application Filing
- 2022-11-29 KR KR1020247028350A patent/KR20240141191A/ko unknown
- 2022-11-29 KR KR1020247027603A patent/KR20240136411A/ko unknown
- 2022-11-29 CN CN202280090524.7A patent/CN118679379A/zh active Pending
- 2022-11-29 JP JP2023576658A patent/JPWO2023145237A1/ja active Pending
- 2022-11-29 CN CN202280090521.3A patent/CN118661093A/zh active Pending
- 2022-11-29 KR KR1020247027476A patent/KR20240136405A/ko unknown
- 2022-11-29 WO PCT/JP2022/043906 patent/WO2023145236A1/ja active Application Filing
- 2022-11-29 WO PCT/JP2022/043907 patent/WO2023145237A1/ja active Application Filing
- 2022-11-29 JP JP2023576656A patent/JPWO2023145235A1/ja active Pending
- 2022-11-29 WO PCT/JP2022/043905 patent/WO2023145235A1/ja active Application Filing
- 2022-11-29 KR KR1020247028368A patent/KR20240135667A/ko unknown
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2023
- 2023-01-06 JP JP2023001301A patent/JP2023111866A/ja active Pending
- 2023-01-19 TW TW112102600A patent/TWI846289B/zh active
- 2023-01-30 TW TW112103028A patent/TWI845135B/zh active
- 2023-01-30 TW TW112103027A patent/TW202338340A/zh unknown
- 2023-01-30 TW TW112103029A patent/TW202338863A/zh unknown
- 2023-01-30 TW TW112103030A patent/TWI845136B/zh active
- 2023-07-11 US US18/350,221 patent/US11977038B2/en active Active
- 2023-07-11 US US18/350,054 patent/US11927554B2/en active Active
- 2023-07-11 US US18/350,093 patent/US11921059B2/en active Active
- 2023-07-11 US US18/350,361 patent/US20230349846A1/en active Pending
- 2023-07-11 US US18/350,255 patent/US11971370B2/en active Active
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