JPWO2023074480A5 - - Google Patents
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- Publication number
- JPWO2023074480A5 JPWO2023074480A5 JP2023556354A JP2023556354A JPWO2023074480A5 JP WO2023074480 A5 JPWO2023074480 A5 JP WO2023074480A5 JP 2023556354 A JP2023556354 A JP 2023556354A JP 2023556354 A JP2023556354 A JP 2023556354A JP WO2023074480 A5 JPWO2023074480 A5 JP WO2023074480A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- plasma
- detector
- sample
- detection result
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 32
- 238000001514 detection method Methods 0.000 claims 22
- 238000004458 analytical method Methods 0.000 claims 6
- 238000001819 mass spectrum Methods 0.000 claims 6
- 230000001360 synchronised effect Effects 0.000 claims 5
- 230000003287 optical effect Effects 0.000 claims 3
- 239000006227 byproduct Substances 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 2
- 238000000295 emission spectrum Methods 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 238000005259 measurement Methods 0.000 claims 2
- 238000004611 spectroscopical analysis Methods 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- 230000004888 barrier function Effects 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 238000009616 inductively coupled plasma Methods 0.000 claims 1
- 238000012806 monitoring device Methods 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 238000004886 process control Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024205736A JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021178175 | 2021-10-29 | ||
| JP2021178175 | 2021-10-29 | ||
| PCT/JP2022/038848 WO2023074480A1 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024205736A Division JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023074480A1 JPWO2023074480A1 (https=) | 2023-05-04 |
| JPWO2023074480A5 true JPWO2023074480A5 (https=) | 2024-06-10 |
| JP7599755B2 JP7599755B2 (ja) | 2024-12-16 |
Family
ID=86157780
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556354A Active JP7599755B2 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
| JP2024205736A Pending JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024205736A Pending JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20250006476A1 (https=) |
| JP (2) | JP7599755B2 (https=) |
| KR (1) | KR20240088888A (https=) |
| WO (1) | WO2023074480A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240339309A1 (en) * | 2023-04-10 | 2024-10-10 | Tokyo Electron Limited | Advanced OES Characterization |
| KR20250064334A (ko) * | 2023-11-02 | 2025-05-09 | 피에스케이 주식회사 | 기록매체에 저장된 프로그램 및 기판 처리 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5495107A (en) * | 1994-04-06 | 1996-02-27 | Thermo Jarrell Ash Corporation | Analysis |
| JPH0992200A (ja) * | 1995-09-27 | 1997-04-04 | Hitachi Ltd | プラズマイオン源質量分析装置 |
| TWI888050B (zh) * | 2019-03-25 | 2025-06-21 | 日商亞多納富有限公司 | 製程系統 |
-
2022
- 2022-10-19 KR KR1020247012577A patent/KR20240088888A/ko active Pending
- 2022-10-19 JP JP2023556354A patent/JP7599755B2/ja active Active
- 2022-10-19 WO PCT/JP2022/038848 patent/WO2023074480A1/ja not_active Ceased
- 2022-10-19 US US18/704,959 patent/US20250006476A1/en active Pending
-
2024
- 2024-11-26 JP JP2024205736A patent/JP2025026477A/ja active Pending
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