JP7599755B2 - ガス分析装置および制御方法 - Google Patents
ガス分析装置および制御方法 Download PDFInfo
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- JP7599755B2 JP7599755B2 JP2023556354A JP2023556354A JP7599755B2 JP 7599755 B2 JP7599755 B2 JP 7599755B2 JP 2023556354 A JP2023556354 A JP 2023556354A JP 2023556354 A JP2023556354 A JP 2023556354A JP 7599755 B2 JP7599755 B2 JP 7599755B2
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Images
Classifications
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- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32834—Exhausting
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
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- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32963—End-point detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
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- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/335—Cleaning
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024205736A JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021178175 | 2021-10-29 | ||
| JP2021178175 | 2021-10-29 | ||
| PCT/JP2022/038848 WO2023074480A1 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024205736A Division JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023074480A1 JPWO2023074480A1 (https=) | 2023-05-04 |
| JPWO2023074480A5 JPWO2023074480A5 (https=) | 2024-06-10 |
| JP7599755B2 true JP7599755B2 (ja) | 2024-12-16 |
Family
ID=86157780
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556354A Active JP7599755B2 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
| JP2024205736A Pending JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024205736A Pending JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20250006476A1 (https=) |
| JP (2) | JP7599755B2 (https=) |
| KR (1) | KR20240088888A (https=) |
| WO (1) | WO2023074480A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240339309A1 (en) * | 2023-04-10 | 2024-10-10 | Tokyo Electron Limited | Advanced OES Characterization |
| KR20250064334A (ko) * | 2023-11-02 | 2025-05-09 | 피에스케이 주식회사 | 기록매체에 저장된 프로그램 및 기판 처리 방법 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020196452A1 (ja) | 2019-03-25 | 2020-10-01 | アトナープ株式会社 | ガス分析装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5495107A (en) * | 1994-04-06 | 1996-02-27 | Thermo Jarrell Ash Corporation | Analysis |
| JPH0992200A (ja) * | 1995-09-27 | 1997-04-04 | Hitachi Ltd | プラズマイオン源質量分析装置 |
-
2022
- 2022-10-19 KR KR1020247012577A patent/KR20240088888A/ko active Pending
- 2022-10-19 JP JP2023556354A patent/JP7599755B2/ja active Active
- 2022-10-19 WO PCT/JP2022/038848 patent/WO2023074480A1/ja not_active Ceased
- 2022-10-19 US US18/704,959 patent/US20250006476A1/en active Pending
-
2024
- 2024-11-26 JP JP2024205736A patent/JP2025026477A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020196452A1 (ja) | 2019-03-25 | 2020-10-01 | アトナープ株式会社 | ガス分析装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20250006476A1 (en) | 2025-01-02 |
| JP2025026477A (ja) | 2025-02-21 |
| JPWO2023074480A1 (https=) | 2023-05-04 |
| KR20240088888A (ko) | 2024-06-20 |
| WO2023074480A1 (ja) | 2023-05-04 |
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