JP2025026477A5 - - Google Patents
Info
- Publication number
- JP2025026477A5 JP2025026477A5 JP2024205736A JP2024205736A JP2025026477A5 JP 2025026477 A5 JP2025026477 A5 JP 2025026477A5 JP 2024205736 A JP2024205736 A JP 2024205736A JP 2024205736 A JP2024205736 A JP 2024205736A JP 2025026477 A5 JP2025026477 A5 JP 2025026477A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- sample
- plasma
- detector
- sample chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021178175 | 2021-10-29 | ||
| JP2021178175 | 2021-10-29 | ||
| PCT/JP2022/038848 WO2023074480A1 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
| JP2023556354A JP7599755B2 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556354A Division JP7599755B2 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025026477A JP2025026477A (ja) | 2025-02-21 |
| JP2025026477A5 true JP2025026477A5 (https=) | 2025-09-05 |
Family
ID=86157780
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556354A Active JP7599755B2 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
| JP2024205736A Pending JP2025026477A (ja) | 2021-10-29 | 2024-11-26 | ガス分析装置および制御方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556354A Active JP7599755B2 (ja) | 2021-10-29 | 2022-10-19 | ガス分析装置および制御方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20250006476A1 (https=) |
| JP (2) | JP7599755B2 (https=) |
| KR (1) | KR20240088888A (https=) |
| WO (1) | WO2023074480A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240339309A1 (en) * | 2023-04-10 | 2024-10-10 | Tokyo Electron Limited | Advanced OES Characterization |
| KR20250064334A (ko) * | 2023-11-02 | 2025-05-09 | 피에스케이 주식회사 | 기록매체에 저장된 프로그램 및 기판 처리 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5495107A (en) * | 1994-04-06 | 1996-02-27 | Thermo Jarrell Ash Corporation | Analysis |
| JPH0992200A (ja) * | 1995-09-27 | 1997-04-04 | Hitachi Ltd | プラズマイオン源質量分析装置 |
| TWI888050B (zh) * | 2019-03-25 | 2025-06-21 | 日商亞多納富有限公司 | 製程系統 |
-
2022
- 2022-10-19 KR KR1020247012577A patent/KR20240088888A/ko active Pending
- 2022-10-19 JP JP2023556354A patent/JP7599755B2/ja active Active
- 2022-10-19 WO PCT/JP2022/038848 patent/WO2023074480A1/ja not_active Ceased
- 2022-10-19 US US18/704,959 patent/US20250006476A1/en active Pending
-
2024
- 2024-11-26 JP JP2024205736A patent/JP2025026477A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2025026477A5 (https=) | ||
| JP2021007108A5 (https=) | ||
| TWI579888B (zh) | 質譜儀、其使用方法、及氣體混合物的質譜分析方法 | |
| KR101629253B1 (ko) | 광방출 스펙트럼의 정규화 방법 및 장치 | |
| TWI791524B (zh) | 用於製造電子裝置的設備、用於製造半導體裝置的設備以及估計在半導體處理腔室中的氣體濃度之方法 | |
| JP5987968B2 (ja) | 放電イオン化電流検出器及びその調整方法 | |
| WO2015066547A1 (en) | Spatially resolved emission spectrospy in plasma processing | |
| JP2003086574A (ja) | 半導体処理装置のガス分析方法およびその装置 | |
| JP2008508511A (ja) | コロナ放電イオン化エレメントを備えたイオン移動度分光器 | |
| US7101458B2 (en) | Plasma processing method and apparatus | |
| JP2025026477A (ja) | ガス分析装置および制御方法 | |
| JP6219760B2 (ja) | Icp発光分光分析装置 | |
| JPWO2023074480A5 (https=) | ||
| CN102184831B (zh) | 一种发射光谱诊断低气压等离子体炬空间分布特性的方法 | |
| CN102203898B (zh) | 在处理系统化学分析中使用的电子束激励器 | |
| US7701578B1 (en) | Planar micro-discharge gas detector | |
| JP6505167B2 (ja) | 質量分析装置及び質量分析方法 | |
| US7989761B2 (en) | Gas analyzing method and gas analyzing apparatus | |
| CN114585906B (zh) | 易于调节的光学发射光谱仪 | |
| CN116783481B (zh) | 气体分析装置和控制方法 | |
| JP3709378B2 (ja) | プラズマ処理装置 | |
| CN117007185B (zh) | 一种用于空心阴极内场光谱的测量装置及方法 | |
| CN104246494A (zh) | 具有放电电离电流检测器的分析装置 | |
| KR101364645B1 (ko) | 플라즈마 검출장치, 이를 구비하는 유도결합플라즈마 질량분석기 및 플라즈마와 이온신호의 상관관계 분석방법 | |
| CN111426739A (zh) | 一种定量测量自由基的质谱装置及方法 |