JPWO2023037980A1 - - Google Patents
Info
- Publication number
- JPWO2023037980A1 JPWO2023037980A1 JP2023546920A JP2023546920A JPWO2023037980A1 JP WO2023037980 A1 JPWO2023037980 A1 JP WO2023037980A1 JP 2023546920 A JP2023546920 A JP 2023546920A JP 2023546920 A JP2023546920 A JP 2023546920A JP WO2023037980 A1 JPWO2023037980 A1 JP WO2023037980A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021145749 | 2021-09-07 | ||
| PCT/JP2022/033127 WO2023037980A1 (ja) | 2021-09-07 | 2022-09-02 | 多層反射膜付き基板、反射型マスクブランク、反射型マスク、及び半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023037980A1 true JPWO2023037980A1 (https=) | 2023-03-16 |
| JPWO2023037980A5 JPWO2023037980A5 (https=) | 2025-07-14 |
Family
ID=85507564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023546920A Pending JPWO2023037980A1 (https=) | 2021-09-07 | 2022-09-02 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250370324A1 (https=) |
| JP (1) | JPWO2023037980A1 (https=) |
| KR (1) | KR20240055724A (https=) |
| TW (1) | TW202321815A (https=) |
| WO (1) | WO2023037980A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025027982A (ja) * | 2023-08-16 | 2025-02-28 | 信越化学工業株式会社 | 反射型マスクブランク、及び反射型マスクの製造方法 |
| WO2025142825A1 (ja) * | 2023-12-27 | 2025-07-03 | Hoya株式会社 | 反射型マスクブランク、反射型マスク、及び半導体装置の製造方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2723955B2 (ja) | 1989-03-16 | 1998-03-09 | キヤノン株式会社 | 軟ｘ線・真空紫外線用多層膜反射鏡 |
| JP3097778B2 (ja) | 1992-01-23 | 2000-10-10 | 日本電信電話株式会社 | 多層膜分光反射鏡 |
| JPH09230098A (ja) | 1996-02-21 | 1997-09-05 | Nippon Telegr & Teleph Corp <Ntt> | 多層膜ｘ線反射鏡 |
| JP4692984B2 (ja) * | 2004-09-24 | 2011-06-01 | Ｈｏｙａ株式会社 | 反射型マスクブランク、反射型マスク及び多層膜反射鏡並びにこれらの製造方法 |
| JP2006173446A (ja) * | 2004-12-17 | 2006-06-29 | Nikon Corp | 極端紫外線用の光学素子及びこれを用いた投影露光装置 |
| JP6044213B2 (ja) * | 2012-09-13 | 2016-12-14 | 旭硝子株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランクおよびその製造方法、ならびに該マスクブランク用の反射層付基板およびその製造方法 |
| JP7379027B2 (ja) * | 2019-09-04 | 2023-11-14 | Hoya株式会社 | 多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法 |
| KR20210089406A (ko) | 2020-01-08 | 2021-07-16 | 주식회사 에스앤에스텍 | 극자외선용 반사형 블랭크 마스크 및 포토마스크 |
-
2022
- 2022-09-02 JP JP2023546920A patent/JPWO2023037980A1/ja active Pending
- 2022-09-02 WO PCT/JP2022/033127 patent/WO2023037980A1/ja not_active Ceased
- 2022-09-02 US US18/682,747 patent/US20250370324A1/en active Pending
- 2022-09-02 KR KR1020247003753A patent/KR20240055724A/ko active Pending
- 2022-09-05 TW TW111133520A patent/TW202321815A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240055724A (ko) | 2024-04-29 |
| US20250370324A1 (en) | 2025-12-04 |
| WO2023037980A1 (ja) | 2023-03-16 |
| TW202321815A (zh) | 2023-06-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250703 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250703 |