JPWO2023008355A5 - - Google Patents
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- Publication number
- JPWO2023008355A5 JPWO2023008355A5 JP2023538507A JP2023538507A JPWO2023008355A5 JP WO2023008355 A5 JPWO2023008355 A5 JP WO2023008355A5 JP 2023538507 A JP2023538507 A JP 2023538507A JP 2023538507 A JP2023538507 A JP 2023538507A JP WO2023008355 A5 JPWO2023008355 A5 JP WO2023008355A5
- Authority
- JP
- Japan
- Prior art keywords
- resist
- composition according
- film composition
- auxiliary film
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021125373 | 2021-07-30 | ||
| JP2021147669 | 2021-09-10 | ||
| PCT/JP2022/028577 WO2023008355A1 (ja) | 2021-07-30 | 2022-07-25 | レジスト補助膜組成物、及び該組成物を用いたパターンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023008355A1 JPWO2023008355A1 (https=) | 2023-02-02 |
| JPWO2023008355A5 true JPWO2023008355A5 (https=) | 2025-06-20 |
Family
ID=85086923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023538507A Pending JPWO2023008355A1 (https=) | 2021-07-30 | 2022-07-25 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240369925A1 (https=) |
| JP (1) | JPWO2023008355A1 (https=) |
| KR (1) | KR20240039091A (https=) |
| TW (1) | TW202313734A (https=) |
| WO (1) | WO2023008355A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026009861A1 (ja) * | 2024-07-05 | 2026-01-08 | 三菱瓦斯化学株式会社 | 半導体製造用組成物及び膜形成方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5693691A (en) | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
| US5919599A (en) | 1997-09-30 | 1999-07-06 | Brewer Science, Inc. | Thermosetting anti-reflective coatings at deep ultraviolet |
| JP3928278B2 (ja) | 1998-11-16 | 2007-06-13 | Ｊｓｒ株式会社 | 反射防止膜形成組成物 |
| JP4288776B2 (ja) | 1999-08-03 | 2009-07-01 | Ｊｓｒ株式会社 | 反射防止膜形成組成物 |
| TW591341B (en) * | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| US20040067437A1 (en) * | 2002-10-06 | 2004-04-08 | Shipley Company, L.L.C. | Coating compositions for use with an overcoated photoresist |
| JP4388429B2 (ja) | 2004-02-04 | 2009-12-24 | 信越化学工業株式会社 | レジスト下層膜材料ならびにパターン形成方法 |
| TWI340296B (en) * | 2005-03-20 | 2011-04-11 | Rohm & Haas Elect Mat | Coating compositions for use with an overcoated photoresist |
| EP1742108B1 (en) * | 2005-07-05 | 2015-10-28 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| JP5125825B2 (ja) | 2008-07-07 | 2013-01-23 | Ｊｓｒ株式会社 | 多層レジストプロセス用下層膜形成組成物 |
| JP6497143B2 (ja) * | 2015-03-13 | 2019-04-10 | Jsr株式会社 | レジスト下層膜形成用組成物及び該組成物を用いたパターン形成方法 |
| TWI662370B (zh) * | 2015-11-30 | 2019-06-11 | Rohm And Haas Electronic Materials Korea Ltd. | 與外塗佈光致抗蝕劑一起使用之塗料組合物 |
| TWI733069B (zh) * | 2017-12-31 | 2021-07-11 | 美商羅門哈斯電子材料有限公司 | 單體、聚合物及包含其的微影組合物 |
| US11567409B2 (en) * | 2020-04-17 | 2023-01-31 | Rohm And Haas Electronic Materials Korea Ltd. | Polymers, underlayer coating compositions comprising the same, and patterning methods |
-
2022
- 2022-07-25 US US18/291,760 patent/US20240369925A1/en active Pending
- 2022-07-25 WO PCT/JP2022/028577 patent/WO2023008355A1/ja not_active Ceased
- 2022-07-25 JP JP2023538507A patent/JPWO2023008355A1/ja active Pending
- 2022-07-25 KR KR1020237042750A patent/KR20240039091A/ko active Pending
- 2022-07-29 TW TW111128488A patent/TW202313734A/zh unknown
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