JPWO2023008354A5 - - Google Patents
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- Publication number
- JPWO2023008354A5 JPWO2023008354A5 JP2023538506A JP2023538506A JPWO2023008354A5 JP WO2023008354 A5 JPWO2023008354 A5 JP WO2023008354A5 JP 2023538506 A JP2023538506 A JP 2023538506A JP 2023538506 A JP2023538506 A JP 2023538506A JP WO2023008354 A5 JPWO2023008354 A5 JP WO2023008354A5
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- composition according
- group
- solvent
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021125370 | 2021-07-30 | ||
| JP2021147668 | 2021-09-10 | ||
| PCT/JP2022/028576 WO2023008354A1 (ja) | 2021-07-30 | 2022-07-25 | レジスト組成物、及びそれを用いたレジスト膜形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023008354A1 JPWO2023008354A1 (https=) | 2023-02-02 |
| JPWO2023008354A5 true JPWO2023008354A5 (https=) | 2025-06-20 |
Family
ID=85086928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023538506A Pending JPWO2023008354A1 (https=) | 2021-07-30 | 2022-07-25 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240369924A1 (https=) |
| JP (1) | JPWO2023008354A1 (https=) |
| KR (1) | KR20240037877A (https=) |
| TW (1) | TW202313877A (https=) |
| WO (1) | WO2023008354A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2024209754A1 (https=) * | 2023-04-04 | 2024-10-10 | ||
| WO2025121051A1 (ja) * | 2023-12-06 | 2025-06-12 | Jsr株式会社 | 感放射線性組成物及びパターン形成方法 |
| WO2025205520A1 (ja) * | 2024-03-29 | 2025-10-02 | 三菱瓦斯化学株式会社 | 溶媒およびこれを用いた半導体製造用組成物 |
| WO2026009861A1 (ja) * | 2024-07-05 | 2026-01-08 | 三菱瓦斯化学株式会社 | 半導体製造用組成物及び膜形成方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62123444A (ja) * | 1985-08-07 | 1987-06-04 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
| JP3262450B2 (ja) * | 1994-04-13 | 2002-03-04 | 富士写真フイルム株式会社 | ネガ型感光性平版印刷版の製造方法 |
| JPH07301917A (ja) * | 1994-04-28 | 1995-11-14 | Tokuyama Sekiyu Kagaku Kk | ポジ型感放射線性樹脂組成物 |
| JPH11109633A (ja) * | 1997-06-24 | 1999-04-23 | Hitachi Chem Co Ltd | ポジ型感光性樹脂組成物およびレジスト像の製造法 |
| JP2000335127A (ja) * | 1999-05-26 | 2000-12-05 | Toray Ind Inc | 直描型平版印刷版原版 |
| JP3895224B2 (ja) | 2001-12-03 | 2007-03-22 | 東京応化工業株式会社 | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| US8088548B2 (en) * | 2007-10-23 | 2012-01-03 | Az Electronic Materials Usa Corp. | Bottom antireflective coating compositions |
| TWI733069B (zh) * | 2017-12-31 | 2021-07-11 | 美商羅門哈斯電子材料有限公司 | 單體、聚合物及包含其的微影組合物 |
| KR102611586B1 (ko) * | 2018-09-14 | 2023-12-07 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
| JPWO2021172132A1 (https=) * | 2020-02-26 | 2021-09-02 |
-
2022
- 2022-07-25 WO PCT/JP2022/028576 patent/WO2023008354A1/ja not_active Ceased
- 2022-07-25 US US18/291,740 patent/US20240369924A1/en active Pending
- 2022-07-25 KR KR1020237042748A patent/KR20240037877A/ko active Pending
- 2022-07-25 JP JP2023538506A patent/JPWO2023008354A1/ja active Pending
- 2022-07-29 TW TW111128547A patent/TW202313877A/zh unknown
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