JPWO2023002928A1 - - Google Patents
Info
- Publication number
- JPWO2023002928A1 JPWO2023002928A1 JP2023536725A JP2023536725A JPWO2023002928A1 JP WO2023002928 A1 JPWO2023002928 A1 JP WO2023002928A1 JP 2023536725 A JP2023536725 A JP 2023536725A JP 2023536725 A JP2023536725 A JP 2023536725A JP WO2023002928 A1 JPWO2023002928 A1 JP WO2023002928A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D165/00—Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/148—Side-chains having aromatic units
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/40—Polymerisation processes
- C08G2261/42—Non-organometallic coupling reactions, e.g. Gilch-type or Wessling-Zimmermann type
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021119825 | 2021-07-20 | ||
PCT/JP2022/027788 WO2023002928A1 (ja) | 2021-07-20 | 2022-07-15 | 半導体用膜形成材料、半導体用部材形成材料、半導体用工程部材形成材料、下層膜形成材料、下層膜及び半導体デバイス |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023002928A1 true JPWO2023002928A1 (ja) | 2023-01-26 |
Family
ID=84979279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023536725A Pending JPWO2023002928A1 (ja) | 2021-07-20 | 2022-07-15 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP4375750A1 (ja) |
JP (1) | JPWO2023002928A1 (ja) |
KR (1) | KR20240035990A (ja) |
CN (1) | CN117616337A (ja) |
TW (1) | TW202311263A (ja) |
WO (1) | WO2023002928A1 (ja) |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
NL1016815C2 (nl) | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
JP3860170B2 (ja) | 2001-06-11 | 2006-12-20 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 組み合わされた構造を有するオキシムエステルの光開始剤 |
KR101032582B1 (ko) | 2002-12-03 | 2011-05-06 | 시바 홀딩 인크 | 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제 |
JP4565824B2 (ja) | 2003-09-24 | 2010-10-20 | 株式会社Adeka | 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤 |
WO2006018973A1 (ja) | 2004-08-20 | 2006-02-23 | Asahi Denka Co., Ltd. | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
JP3798008B2 (ja) | 2004-12-03 | 2006-07-19 | 旭電化工業株式会社 | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
JP4818458B2 (ja) | 2009-11-27 | 2011-11-16 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
CN106132929B (zh) | 2014-04-04 | 2020-06-19 | 株式会社艾迪科 | 肟酯化合物和含有该化合物的光聚合引发剂 |
JP6697183B2 (ja) | 2016-06-28 | 2020-05-20 | Dic株式会社 | オキサジン化合物、組成物及び硬化物 |
JP2018140972A (ja) | 2017-02-28 | 2018-09-13 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | ビニル誘導体、およびこれの使用 |
JP6726142B2 (ja) * | 2017-08-28 | 2020-07-22 | 信越化学工業株式会社 | 有機膜形成用組成物、半導体装置製造用基板、有機膜の形成方法、パターン形成方法、及び重合体 |
US20200142309A1 (en) | 2018-11-02 | 2020-05-07 | Rohm And Haas Electronic Materials Llc | Aromatic underlayer |
JP7161451B2 (ja) * | 2019-07-05 | 2022-10-26 | 信越化学工業株式会社 | 有機膜形成用組成物、半導体装置製造用基板、有機膜の形成方法、及びパターン形成方法 |
-
2022
- 2022-07-15 WO PCT/JP2022/027788 patent/WO2023002928A1/ja active Application Filing
- 2022-07-15 KR KR1020247000069A patent/KR20240035990A/ko unknown
- 2022-07-15 EP EP22845862.6A patent/EP4375750A1/en active Pending
- 2022-07-15 JP JP2023536725A patent/JPWO2023002928A1/ja active Pending
- 2022-07-15 CN CN202280048352.7A patent/CN117616337A/zh active Pending
- 2022-07-18 TW TW111126866A patent/TW202311263A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2023002928A1 (ja) | 2023-01-26 |
CN117616337A (zh) | 2024-02-27 |
EP4375750A1 (en) | 2024-05-29 |
TW202311263A (zh) | 2023-03-16 |
KR20240035990A (ko) | 2024-03-19 |