JPWO2022215690A5 - - Google Patents

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Publication number
JPWO2022215690A5
JPWO2022215690A5 JP2023513020A JP2023513020A JPWO2022215690A5 JP WO2022215690 A5 JPWO2022215690 A5 JP WO2022215690A5 JP 2023513020 A JP2023513020 A JP 2023513020A JP 2023513020 A JP2023513020 A JP 2023513020A JP WO2022215690 A5 JPWO2022215690 A5 JP WO2022215690A5
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JP
Japan
Prior art keywords
exposure
substrate
exposure pattern
unit
light modulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023513020A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022215690A1 (zh
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2022/017093 external-priority patent/WO2022215690A1/ja
Publication of JPWO2022215690A1 publication Critical patent/JPWO2022215690A1/ja
Publication of JPWO2022215690A5 publication Critical patent/JPWO2022215690A5/ja
Pending legal-status Critical Current

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JP2023513020A 2021-04-09 2022-04-05 Pending JPWO2022215690A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021066818 2021-04-09
PCT/JP2022/017093 WO2022215690A1 (ja) 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Publications (2)

Publication Number Publication Date
JPWO2022215690A1 JPWO2022215690A1 (zh) 2022-10-13
JPWO2022215690A5 true JPWO2022215690A5 (zh) 2024-01-17

Family

ID=83546189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023513020A Pending JPWO2022215690A1 (zh) 2021-04-09 2022-04-05

Country Status (5)

Country Link
JP (1) JPWO2022215690A1 (zh)
KR (1) KR20230150879A (zh)
CN (1) CN117083572A (zh)
TW (1) TW202305513A (zh)
WO (1) WO2022215690A1 (zh)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置
JP3593642B2 (ja) * 1996-08-29 2004-11-24 富士通株式会社 露光方法及び露光装置
US7459247B2 (en) * 2004-12-27 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007108559A (ja) 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法
US8431328B2 (en) * 2007-02-22 2013-04-30 Nikon Corporation Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus

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