JPWO2022186312A5 - - Google Patents
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- Publication number
- JPWO2022186312A5 JPWO2022186312A5 JP2023503936A JP2023503936A JPWO2022186312A5 JP WO2022186312 A5 JPWO2022186312 A5 JP WO2022186312A5 JP 2023503936 A JP2023503936 A JP 2023503936A JP 2023503936 A JP2023503936 A JP 2023503936A JP WO2022186312 A5 JPWO2022186312 A5 JP WO2022186312A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- dihydroxynaphthalene
- compound
- linking group
- polyvalent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000005647 linker group Chemical group 0.000 claims 44
- 150000001875 compounds Chemical class 0.000 claims 27
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 24
- 230000001681 protective effect Effects 0.000 claims 22
- 239000003795 chemical substances by application Substances 0.000 claims 21
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 19
- 229910052757 nitrogen Inorganic materials 0.000 claims 18
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 18
- 125000001931 aliphatic group Chemical group 0.000 claims 16
- 125000004432 carbon atom Chemical group C* 0.000 claims 16
- 229920003986 novolac Polymers 0.000 claims 16
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 claims 15
- 239000004065 semiconductor Substances 0.000 claims 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 12
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims 12
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 10
- 239000002904 solvent Substances 0.000 claims 8
- 229940079877 pyrogallol Drugs 0.000 claims 7
- 239000002253 acid Substances 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000001039 wet etching Methods 0.000 claims 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims 4
- 150000001412 amines Chemical group 0.000 claims 4
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 claims 4
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical group OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 claims 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims 4
- 238000001312 dry etching Methods 0.000 claims 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 claims 4
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 claims 4
- XOOMNEFVDUTJPP-UHFFFAOYSA-N naphthalene-1,3-diol Chemical compound C1=CC=CC2=CC(O)=CC(O)=C21 XOOMNEFVDUTJPP-UHFFFAOYSA-N 0.000 claims 4
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 claims 4
- ZUVBIBLYOCVYJU-UHFFFAOYSA-N naphthalene-1,7-diol Chemical compound C1=CC=C(O)C2=CC(O)=CC=C21 ZUVBIBLYOCVYJU-UHFFFAOYSA-N 0.000 claims 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 claims 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 claims 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 claims 2
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 claims 2
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 claims 2
- KMRIWYPVRWEWRG-UHFFFAOYSA-N 2-(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(P2(=O)C3=CC=CC=C3C3=CC=CC=C3O2)=C1 KMRIWYPVRWEWRG-UHFFFAOYSA-N 0.000 claims 2
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 claims 2
- RXNYJUSEXLAVNQ-UHFFFAOYSA-N 4,4'-Dihydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1 RXNYJUSEXLAVNQ-UHFFFAOYSA-N 0.000 claims 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims 2
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 claims 2
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 claims 2
- CJLPIPXJJJUBIV-UHFFFAOYSA-N 4-[3-(4-hydroxyphenoxy)phenoxy]phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=CC(OC=2C=CC(O)=CC=2)=C1 CJLPIPXJJJUBIV-UHFFFAOYSA-N 0.000 claims 2
- RLSMYIFSFZLJQZ-UHFFFAOYSA-N 4-[4-(4-hydroxyphenoxy)phenoxy]phenol Chemical compound C1=CC(O)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(O)C=C1 RLSMYIFSFZLJQZ-UHFFFAOYSA-N 0.000 claims 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 2
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 claims 2
- 150000008065 acid anhydrides Chemical class 0.000 claims 2
- 150000001408 amides Chemical class 0.000 claims 2
- 125000005577 anthracene group Chemical group 0.000 claims 2
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 claims 2
- OENHRRVNRZBNNS-UHFFFAOYSA-N naphthalene-1,8-diol Chemical compound C1=CC(O)=C2C(O)=CC=CC2=C1 OENHRRVNRZBNNS-UHFFFAOYSA-N 0.000 claims 2
- JRNGUTKWMSBIBF-UHFFFAOYSA-N naphthalene-2,3-diol Chemical compound C1=CC=C2C=C(O)C(O)=CC2=C1 JRNGUTKWMSBIBF-UHFFFAOYSA-N 0.000 claims 2
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 claims 2
- DFQICHCWIIJABH-UHFFFAOYSA-N naphthalene-2,7-diol Chemical compound C1=CC(O)=CC2=CC(O)=CC=C21 DFQICHCWIIJABH-UHFFFAOYSA-N 0.000 claims 2
- 125000001624 naphthyl group Chemical group 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- 150000003573 thiols Chemical class 0.000 claims 2
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 claims 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 150000002460 imidazoles Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 150000003003 phosphines Chemical class 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021034570 | 2021-03-04 | ||
| PCT/JP2022/009008 WO2022186312A1 (ja) | 2021-03-04 | 2022-03-03 | 保護膜形成組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022186312A1 JPWO2022186312A1 (https=) | 2022-09-09 |
| JPWO2022186312A5 true JPWO2022186312A5 (https=) | 2025-03-03 |
Family
ID=83155358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023503936A Pending JPWO2022186312A1 (https=) | 2021-03-04 | 2022-03-03 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240168385A1 (https=) |
| JP (1) | JPWO2022186312A1 (https=) |
| KR (1) | KR20230152684A (https=) |
| CN (1) | CN117043678A (https=) |
| TW (1) | TW202302689A (https=) |
| WO (1) | WO2022186312A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022034831A1 (ja) * | 2020-08-14 | 2022-02-17 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成用組成物、下層膜及びパターン形成方法 |
| KR102859280B1 (ko) * | 2023-12-20 | 2025-09-16 | 에스케이머티리얼즈퍼포먼스 주식회사 | 반사방지막용 유기 조성물 및 이를 포함하는 반사방지막 |
| CN117603251B (zh) * | 2024-01-23 | 2024-03-26 | 铜陵安德科铭电子材料科技有限公司 | 一种高效制备high-k有机金属前驱体的方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101010634A (zh) * | 2004-09-03 | 2007-08-01 | 日产化学工业株式会社 | 含聚酰胺酸的形成下层防反射膜的组合物 |
| WO2011040340A1 (ja) * | 2009-09-29 | 2011-04-07 | Jsr株式会社 | パターン形成方法及びレジスト下層膜形成用組成物 |
| JP5644339B2 (ja) * | 2010-10-01 | 2014-12-24 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びパターン形成方法 |
| EP2641926A4 (en) * | 2010-11-15 | 2017-01-04 | Nissan Chemical Industries, Ltd. | Polyfunctional epoxy compound |
| KR102058760B1 (ko) * | 2011-10-10 | 2019-12-23 | 브레우어 사이언스 인코포레이션 | 리소그래피 처리를 위한 스핀-온 탄소 조성물 |
| JP7486919B2 (ja) * | 2016-05-02 | 2024-05-20 | 日産化学株式会社 | 特定の架橋剤を含む保護膜形成組成物及びそれを用いたパターン形成方法 |
| WO2018052130A1 (ja) * | 2016-09-16 | 2018-03-22 | 日産化学工業株式会社 | 保護膜形成組成物 |
| US11674051B2 (en) * | 2017-09-13 | 2023-06-13 | Nissan Chemical Corporation | Stepped substrate coating composition containing compound having curable functional group |
| KR102067586B1 (ko) | 2018-04-26 | 2020-01-17 | 광주과학기술원 | 이물질 검출 시스템 및 그것의 동작 방법 |
-
2022
- 2022-03-03 TW TW111107651A patent/TW202302689A/zh unknown
- 2022-03-03 US US18/279,766 patent/US20240168385A1/en active Pending
- 2022-03-03 CN CN202280018524.6A patent/CN117043678A/zh active Pending
- 2022-03-03 WO PCT/JP2022/009008 patent/WO2022186312A1/ja not_active Ceased
- 2022-03-03 JP JP2023503936A patent/JPWO2022186312A1/ja active Pending
- 2022-03-03 KR KR1020237029527A patent/KR20230152684A/ko active Pending
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