JPWO2022186192A1 - - Google Patents

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Publication number
JPWO2022186192A1
JPWO2022186192A1 JP2023503858A JP2023503858A JPWO2022186192A1 JP WO2022186192 A1 JPWO2022186192 A1 JP WO2022186192A1 JP 2023503858 A JP2023503858 A JP 2023503858A JP 2023503858 A JP2023503858 A JP 2023503858A JP WO2022186192 A1 JPWO2022186192 A1 JP WO2022186192A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023503858A
Other languages
Japanese (ja)
Other versions
JPWO2022186192A5 (https=
JP7584620B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2022186192A1 publication Critical patent/JPWO2022186192A1/ja
Publication of JPWO2022186192A5 publication Critical patent/JPWO2022186192A5/ja
Application granted granted Critical
Publication of JP7584620B2 publication Critical patent/JP7584620B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01Manufacture or treatment
    • H10D48/021Manufacture or treatment of two-electrode devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/01Manufacture or treatment
    • H10D64/011Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/50PIN diodes 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP2023503858A 2021-03-02 2022-03-01 半導体素子の製造方法 Active JP7584620B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021032617 2021-03-02
JP2021032617 2021-03-02
PCT/JP2022/008577 WO2022186192A1 (ja) 2021-03-02 2022-03-01 半導体素子、電力変換装置および半導体素子の製造方法

Publications (3)

Publication Number Publication Date
JPWO2022186192A1 true JPWO2022186192A1 (https=) 2022-09-09
JPWO2022186192A5 JPWO2022186192A5 (https=) 2023-09-27
JP7584620B2 JP7584620B2 (ja) 2024-11-15

Family

ID=83154753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023503858A Active JP7584620B2 (ja) 2021-03-02 2022-03-01 半導体素子の製造方法

Country Status (3)

Country Link
JP (1) JP7584620B2 (https=)
CN (1) CN116888708A (https=)
WO (1) WO2022186192A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7708018B2 (ja) * 2022-07-01 2025-07-15 株式会社デンソー 半導体装置
JP2024134749A (ja) * 2023-03-22 2024-10-04 三菱電機株式会社 半導体装置、電力変換装置および半導体装置の製造方法
WO2025004877A1 (ja) * 2023-06-27 2025-01-02 三菱電機株式会社 半導体装置、電力変換装置および半導体装置の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001177096A (ja) * 1999-12-14 2001-06-29 Fuji Electric Co Ltd 縦型半導体装置の製造方法および縦型半導体装置
JP2010251719A (ja) * 2009-03-23 2010-11-04 Fuji Electric Systems Co Ltd 半導体装置の製造方法
JP2011219828A (ja) * 2010-04-12 2011-11-04 Mitsubishi Electric Corp 半導体装置および半導体装置の製造方法
JP2017059636A (ja) * 2015-09-15 2017-03-23 三菱電機株式会社 半導体装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001177096A (ja) * 1999-12-14 2001-06-29 Fuji Electric Co Ltd 縦型半導体装置の製造方法および縦型半導体装置
JP2010251719A (ja) * 2009-03-23 2010-11-04 Fuji Electric Systems Co Ltd 半導体装置の製造方法
JP2011219828A (ja) * 2010-04-12 2011-11-04 Mitsubishi Electric Corp 半導体装置および半導体装置の製造方法
JP2017059636A (ja) * 2015-09-15 2017-03-23 三菱電機株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
WO2022186192A1 (ja) 2022-09-09
CN116888708A (zh) 2023-10-13
JP7584620B2 (ja) 2024-11-15

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