JPWO2022150208A5 - - Google Patents
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- Publication number
- JPWO2022150208A5 JPWO2022150208A5 JP2023540840A JP2023540840A JPWO2022150208A5 JP WO2022150208 A5 JPWO2022150208 A5 JP WO2022150208A5 JP 2023540840 A JP2023540840 A JP 2023540840A JP 2023540840 A JP2023540840 A JP 2023540840A JP WO2022150208 A5 JPWO2022150208 A5 JP WO2022150208A5
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- measurement
- sample
- deflectors
- metrology
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/142,783 | 2021-01-06 | ||
| US17/142,783 US11300524B1 (en) | 2021-01-06 | 2021-01-06 | Pupil-plane beam scanning for metrology |
| PCT/US2021/065259 WO2022150208A1 (en) | 2021-01-06 | 2021-12-28 | Pupil-plane beam scanning for metrology |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2024502439A JP2024502439A (ja) | 2024-01-19 |
| JP2024502439A5 JP2024502439A5 (https=) | 2024-10-01 |
| JPWO2022150208A5 true JPWO2022150208A5 (https=) | 2024-10-01 |
| JP7675828B2 JP7675828B2 (ja) | 2025-05-13 |
Family
ID=81123778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023540840A Active JP7675828B2 (ja) | 2021-01-06 | 2021-12-28 | 計測のための瞳面ビーム走査 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11300524B1 (https=) |
| EP (1) | EP4251979A4 (https=) |
| JP (1) | JP7675828B2 (https=) |
| KR (1) | KR102802345B1 (https=) |
| CN (1) | CN116724225B (https=) |
| TW (1) | TWI880059B (https=) |
| WO (1) | WO2022150208A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11899375B2 (en) | 2020-11-20 | 2024-02-13 | Kla Corporation | Massive overlay metrology sampling with multiple measurement columns |
| US11841621B2 (en) * | 2021-10-29 | 2023-12-12 | KLA Corporation CA | Moiré scatterometry overlay |
| US12032300B2 (en) | 2022-02-14 | 2024-07-09 | Kla Corporation | Imaging overlay with mutually coherent oblique illumination |
| US12422363B2 (en) | 2022-03-30 | 2025-09-23 | Kla Corporation | Scanning scatterometry overlay metrology |
| US12487190B2 (en) | 2022-03-30 | 2025-12-02 | Kla Corporation | System and method for isolation of specific fourier pupil frequency in overlay metrology |
| WO2023248459A1 (ja) * | 2022-06-24 | 2023-12-28 | 株式会社ニコン | 顕微鏡装置およびデータ生成方法 |
| CN119404140A (zh) * | 2022-08-22 | 2025-02-07 | Asml荷兰有限公司 | 量测系统和方法 |
| KR20240076443A (ko) | 2022-11-18 | 2024-05-30 | 삼성전자주식회사 | 퓨필 이미지 계측 장치 및 방법 |
| US12235588B2 (en) | 2023-02-16 | 2025-02-25 | Kla Corporation | Scanning overlay metrology with high signal to noise ratio |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4786027B2 (ja) | 2000-12-08 | 2011-10-05 | オリンパス株式会社 | 光学系及び光学装置 |
| US6882417B2 (en) * | 2002-03-21 | 2005-04-19 | Applied Materials, Inc. | Method and system for detecting defects |
| US7053999B2 (en) | 2002-03-21 | 2006-05-30 | Applied Materials, Inc. | Method and system for detecting defects |
| JP4535260B2 (ja) * | 2004-10-19 | 2010-09-01 | 株式会社ニコン | 照明光学装置、露光装置、および露光方法 |
| DE102012009836A1 (de) * | 2012-05-16 | 2013-11-21 | Carl Zeiss Microscopy Gmbh | Lichtmikroskop und Verfahren zur Bildaufnahme mit einem Lichtmikroskop |
| US9091650B2 (en) * | 2012-11-27 | 2015-07-28 | Kla-Tencor Corporation | Apodization for pupil imaging scatterometry |
| DE102013015933A1 (de) | 2013-09-19 | 2015-03-19 | Carl Zeiss Microscopy Gmbh | Hochauflösende Scanning-Mikroskopie |
| US9546962B2 (en) * | 2014-02-12 | 2017-01-17 | Kla-Tencor Corporation | Multi-spot scanning collection optics |
| DE102014005880A1 (de) | 2014-04-17 | 2015-11-05 | Carl Zeiss Ag | Lichtrastermikroskop mit vereinfachter Optik, insbesondere mit veränderlicher Pupillenlage |
| US10976249B1 (en) * | 2014-05-12 | 2021-04-13 | Kla-Tencor Corporation | Reflective pupil relay system |
| JP2016038302A (ja) * | 2014-08-08 | 2016-03-22 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
| US10072921B2 (en) * | 2014-12-05 | 2018-09-11 | Kla-Tencor Corporation | Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element |
| US10101676B2 (en) * | 2015-09-23 | 2018-10-16 | KLA—Tencor Corporation | Spectroscopic beam profile overlay metrology |
| US10527830B2 (en) * | 2016-08-12 | 2020-01-07 | Kla-Tencor Corporation | Off-axis reflective afocal optical relay |
| WO2018046278A1 (en) * | 2016-09-06 | 2018-03-15 | Asml Holding N.V. | Method and device for focusing in an inspection system |
| US10401738B2 (en) * | 2017-08-02 | 2019-09-03 | Kla-Tencor Corporation | Overlay metrology using multiple parameter configurations |
| US11067389B2 (en) * | 2018-03-13 | 2021-07-20 | Kla Corporation | Overlay metrology system and method |
| CN112740109B (zh) | 2018-09-19 | 2024-04-30 | Asml荷兰有限公司 | 用于位置量测的量测传感器 |
| US11118903B2 (en) * | 2018-10-17 | 2021-09-14 | Kla Corporation | Efficient illumination shaping for scatterometry overlay |
| CN109211874A (zh) * | 2018-11-13 | 2019-01-15 | 北京理工大学 | 后置分光瞳激光共焦拉曼光谱测试方法及装置 |
-
2021
- 2021-01-06 US US17/142,783 patent/US11300524B1/en active Active
- 2021-12-28 KR KR1020237021665A patent/KR102802345B1/ko active Active
- 2021-12-28 CN CN202180086043.4A patent/CN116724225B/zh active Active
- 2021-12-28 EP EP21918085.8A patent/EP4251979A4/en active Pending
- 2021-12-28 JP JP2023540840A patent/JP7675828B2/ja active Active
- 2021-12-28 WO PCT/US2021/065259 patent/WO2022150208A1/en not_active Ceased
-
2022
- 2022-01-05 TW TW111100345A patent/TWI880059B/zh active
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