JPWO2022138151A1 - - Google Patents

Info

Publication number
JPWO2022138151A1
JPWO2022138151A1 JP2022572096A JP2022572096A JPWO2022138151A1 JP WO2022138151 A1 JPWO2022138151 A1 JP WO2022138151A1 JP 2022572096 A JP2022572096 A JP 2022572096A JP 2022572096 A JP2022572096 A JP 2022572096A JP WO2022138151 A1 JPWO2022138151 A1 JP WO2022138151A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2022572096A
Other languages
Japanese (ja)
Other versions
JPWO2022138151A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022138151A1 publication Critical patent/JPWO2022138151A1/ja
Publication of JPWO2022138151A5 publication Critical patent/JPWO2022138151A5/ja
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/20—Electrolytic after-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacture Of Motors, Generators (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
JP2022572096A 2020-12-23 2021-12-08 Abandoned JPWO2022138151A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020213613 2020-12-23
PCT/JP2021/045023 WO2022138151A1 (ja) 2020-12-23 2021-12-08 金属充填微細構造体及び金属充填微細構造体の製造方法

Publications (2)

Publication Number Publication Date
JPWO2022138151A1 true JPWO2022138151A1 (https=) 2022-06-30
JPWO2022138151A5 JPWO2022138151A5 (https=) 2023-09-12

Family

ID=82159620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022572096A Abandoned JPWO2022138151A1 (https=) 2020-12-23 2021-12-08

Country Status (4)

Country Link
JP (1) JPWO2022138151A1 (https=)
CN (1) CN116670337A (https=)
TW (1) TW202235689A (https=)
WO (1) WO2022138151A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7220796B2 (ja) * 2019-08-16 2023-02-10 富士フイルム株式会社 構造体の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002004083A (ja) * 2000-04-18 2002-01-09 Shinko Electric Ind Co Ltd ヴィアフィリング方法
JP2008021739A (ja) * 2006-07-11 2008-01-31 Shinko Electric Ind Co Ltd 基板の製造方法
JP2008214679A (ja) * 2007-03-01 2008-09-18 Shinko Electric Ind Co Ltd スルーホールの充填方法
JP2012124253A (ja) * 2010-12-07 2012-06-28 Canon Inc 貫通電極基板及びその製造方法
JP2016072449A (ja) * 2014-09-30 2016-05-09 大日本印刷株式会社 導電材充填貫通電極基板及びその製造方法
JP2019147988A (ja) * 2018-02-27 2019-09-05 富士フイルム株式会社 金属膜、構造体、複合材料、金属膜の製造方法、構造体の製造方法、および複合材料の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002004083A (ja) * 2000-04-18 2002-01-09 Shinko Electric Ind Co Ltd ヴィアフィリング方法
JP2008021739A (ja) * 2006-07-11 2008-01-31 Shinko Electric Ind Co Ltd 基板の製造方法
JP2008214679A (ja) * 2007-03-01 2008-09-18 Shinko Electric Ind Co Ltd スルーホールの充填方法
JP2012124253A (ja) * 2010-12-07 2012-06-28 Canon Inc 貫通電極基板及びその製造方法
JP2016072449A (ja) * 2014-09-30 2016-05-09 大日本印刷株式会社 導電材充填貫通電極基板及びその製造方法
JP2019147988A (ja) * 2018-02-27 2019-09-05 富士フイルム株式会社 金属膜、構造体、複合材料、金属膜の製造方法、構造体の製造方法、および複合材料の製造方法

Also Published As

Publication number Publication date
TW202235689A (zh) 2022-09-16
WO2022138151A1 (ja) 2022-06-30
CN116670337A (zh) 2023-08-29

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