JPWO2022113460A1 - - Google Patents

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Publication number
JPWO2022113460A1
JPWO2022113460A1 JP2021571756A JP2021571756A JPWO2022113460A1 JP WO2022113460 A1 JPWO2022113460 A1 JP WO2022113460A1 JP 2021571756 A JP2021571756 A JP 2021571756A JP 2021571756 A JP2021571756 A JP 2021571756A JP WO2022113460 A1 JPWO2022113460 A1 JP WO2022113460A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021571756A
Other versions
JP7022874B1 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=81073867&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPWO2022113460(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed filed Critical
Priority claimed from PCT/JP2021/032101 external-priority patent/WO2022113460A1/ja
Application granted granted Critical
Publication of JP7022874B1 publication Critical patent/JP7022874B1/ja
Publication of JPWO2022113460A1 publication Critical patent/JPWO2022113460A1/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP2021571756A 2020-11-27 2021-09-01 多結晶シリコンロッド、多結晶シリコンロッドの製造方法および多結晶シリコンの熱処理方法 Active JP7022874B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020197601 2020-11-27
JP2020197601 2020-11-27
PCT/JP2021/032101 WO2022113460A1 (ja) 2020-11-27 2021-09-01 多結晶シリコンロッド、多結晶シリコンロッドの製造方法および多結晶シリコンの熱処理方法

Publications (2)

Publication Number Publication Date
JP7022874B1 JP7022874B1 (ja) 2022-02-18
JPWO2022113460A1 true JPWO2022113460A1 (ja) 2022-06-02

Family

ID=81073867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021571756A Active JP7022874B1 (ja) 2020-11-27 2021-09-01 多結晶シリコンロッド、多結晶シリコンロッドの製造方法および多結晶シリコンの熱処理方法

Country Status (5)

Country Link
US (1) US20240010502A1 (ja)
JP (1) JP7022874B1 (ja)
KR (1) KR20230110743A (ja)
CN (1) CN116490461A (ja)
DE (1) DE112021006172T5 (ja)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5189817A (ja) * 1974-12-26 1976-08-06
KR100470858B1 (ko) * 1996-05-21 2005-05-16 가부시끼가이샤 도꾸야마 다결정실리콘로드및그제조방법
WO1997044277A1 (fr) 1996-05-21 1997-11-27 Tokuyama Corporation Barreau de silicium polycristallin et son procede de preparation
JP5339945B2 (ja) * 2009-02-04 2013-11-13 株式会社トクヤマ 多結晶シリコンの製法
EP2703526A4 (en) * 2012-03-23 2014-12-31 Shinetsu Quartz Prod SILICONE CONTAINER FOR BREEDING A SILICON CRYSTAL AND MANUFACTURING METHOD THEREFOR
DE102013206436A1 (de) * 2013-04-11 2014-10-16 Wacker Chemie Ag Reinigung von CVD-Produktionsräumen
JP6418778B2 (ja) * 2014-05-07 2018-11-07 信越化学工業株式会社 多結晶シリコン棒、多結晶シリコン棒の製造方法、および、単結晶シリコン
WO2017221952A1 (ja) * 2016-06-23 2017-12-28 三菱マテリアル株式会社 多結晶シリコンロッド及びその製造方法
JP7047688B2 (ja) * 2018-09-19 2022-04-05 三菱マテリアル株式会社 多結晶シリコンロッドの製造方法

Also Published As

Publication number Publication date
KR20230110743A (ko) 2023-07-25
CN116490461A (zh) 2023-07-25
JP7022874B1 (ja) 2022-02-18
US20240010502A1 (en) 2024-01-11
DE112021006172T5 (de) 2023-10-05

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