JPWO2022049911A1 - - Google Patents
Info
- Publication number
- JPWO2022049911A1 JPWO2022049911A1 JP2022546918A JP2022546918A JPWO2022049911A1 JP WO2022049911 A1 JPWO2022049911 A1 JP WO2022049911A1 JP 2022546918 A JP2022546918 A JP 2022546918A JP 2022546918 A JP2022546918 A JP 2022546918A JP WO2022049911 A1 JPWO2022049911 A1 JP WO2022049911A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020147165 | 2020-09-01 | ||
| PCT/JP2021/027008 WO2022049911A1 (ja) | 2020-09-01 | 2021-07-19 | 感放射線性樹脂組成物及びパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022049911A1 true JPWO2022049911A1 (zh) | 2022-03-10 |
Family
ID=80491937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022546918A Pending JPWO2022049911A1 (zh) | 2020-09-01 | 2021-07-19 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2022049911A1 (zh) |
| WO (1) | WO2022049911A1 (zh) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61180245A (ja) * | 1985-02-06 | 1986-08-12 | Canon Inc | Ｐｓ版 |
| JPH07114178A (ja) * | 1993-08-21 | 1995-05-02 | Konica Corp | 感光性平版印刷版及び製版方法 |
| JP4444722B2 (ja) * | 2004-04-16 | 2010-03-31 | Ｊｓｒ株式会社 | フッ素含有シクロデキストリン誘導体、ポリロタキサンおよび感放射線性樹脂組成物 |
| KR101248826B1 (ko) * | 2004-11-01 | 2013-03-29 | 닛산 가가쿠 고교 가부시키 가이샤 | 시클로덱스트린 화합물을 함유하는 리소그라피용 하층막 형성 조성물 |
| JP5213436B2 (ja) * | 2007-04-27 | 2013-06-19 | 富士フイルム株式会社 | 感光性樹脂組成物、感光性樹脂転写フイルム及びフォトスペーサーの製造方法、並びに液晶表示装置用基板及び液晶表示装置 |
| JP5615373B2 (ja) * | 2010-09-14 | 2014-10-29 | 国立大学法人大阪大学 | 分子認識に基づいた物質材料の選択的接着法および自己組織化法 |
| CN106795279B (zh) * | 2014-09-02 | 2019-05-07 | 学校法人关西大学 | 超支化聚合物及其制造方法、以及组合物 |
| CN109071730B (zh) * | 2016-03-18 | 2021-09-03 | 国立大学法人大阪大学 | 高分子材料及其制造方法、以及聚合性单体组合物 |
| WO2018207934A1 (ja) * | 2017-05-11 | 2018-11-15 | 国立大学法人大阪大学 | 重合用組成物及びその重合体並びに重合体の製造方法 |
| JP7155471B2 (ja) * | 2018-04-09 | 2022-10-19 | サムソン エレクトロ－メカニックス カンパニーリミテッド． | ポジ型感光性組成物、及び、感光性組成物の製造方法 |
| JP2019204719A (ja) * | 2018-05-24 | 2019-11-28 | 株式会社豊田自動織機 | 自己修復性負極 |
| JP7472917B2 (ja) * | 2020-01-20 | 2024-04-23 | Jsr株式会社 | パターン形成方法、感放射線性組成物及び包摂化合物 |
-
2021
- 2021-07-19 JP JP2022546918A patent/JPWO2022049911A1/ja active Pending
- 2021-07-19 WO PCT/JP2021/027008 patent/WO2022049911A1/ja active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022049911A1 (ja) | 2022-03-10 |