JPWO2022030651A5 - - Google Patents

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JPWO2022030651A5
JPWO2022030651A5 JP2022541771A JP2022541771A JPWO2022030651A5 JP WO2022030651 A5 JPWO2022030651 A5 JP WO2022030651A5 JP 2022541771 A JP2022541771 A JP 2022541771A JP 2022541771 A JP2022541771 A JP 2022541771A JP WO2022030651 A5 JPWO2022030651 A5 JP WO2022030651A5
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JP
Japan
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JP2022541771A
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English (en)
Japanese (ja)
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JP7823290B2 (ja
JPWO2022030651A1 (https=
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Priority claimed from PCT/JP2021/029578 external-priority patent/WO2022030651A1/ja
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JP2022541771A 2020-08-07 2021-08-10 半導体素子および半導体装置 Active JP7823290B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020134996 2020-08-07
JP2020134996 2020-08-07
PCT/JP2021/029578 WO2022030651A1 (ja) 2020-08-07 2021-08-10 半導体素子および半導体装置

Publications (3)

Publication Number Publication Date
JPWO2022030651A1 JPWO2022030651A1 (https=) 2022-02-10
JPWO2022030651A5 true JPWO2022030651A5 (https=) 2023-04-25
JP7823290B2 JP7823290B2 (ja) 2026-03-04

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ID=80117487

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JP2022541771A Active JP7823290B2 (ja) 2020-08-07 2021-08-10 半導体素子および半導体装置

Country Status (5)

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US (1) US20230290888A1 (https=)
JP (1) JP7823290B2 (https=)
CN (1) CN116114061A (https=)
TW (1) TWI907475B (https=)
WO (1) WO2022030651A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023144454A (ja) * 2022-03-28 2023-10-11 株式会社 日立パワーデバイス 半導体装置、半導体装置および電力変換装置
TWI878836B (zh) * 2022-04-27 2025-04-01 日商村田製作所股份有限公司 半導體裝置
US20250098199A1 (en) * 2023-09-20 2025-03-20 Wolfspeed, Inc. Corrosion Resistant Metal Structures for Wide Bandgap Semiconductor Devices

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6259138B1 (en) * 1998-12-18 2001-07-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having multilayered gate electrode and impurity regions overlapping therewith
JP4645406B2 (ja) * 2005-10-13 2011-03-09 富士電機システムズ株式会社 半導体装置
JP3862737B1 (ja) * 2005-10-18 2006-12-27 栄樹 津島 クラッド材およびその製造方法、クラッド材の成型方法、クラッド材を用いた放熱基板
JP4976688B2 (ja) * 2005-12-15 2012-07-18 富士電機株式会社 ヒートスプレッダと金属板との接合方法
KR20120032258A (ko) * 2010-09-28 2012-04-05 삼성엘이디 주식회사 질화갈륨계 반도체소자 및 그 제조방법
CN103078040B (zh) * 2011-08-22 2016-12-21 Lg伊诺特有限公司 发光器件封装件和光装置
KR102290801B1 (ko) * 2013-06-21 2021-08-17 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제작 방법
JP6330220B2 (ja) * 2014-03-27 2018-05-30 株式会社Joled 表示装置、電子機器および基板
EP2942804B1 (en) * 2014-05-08 2017-07-12 Flosfia Inc. Crystalline multilayer structure and semiconductor device
JP6652342B2 (ja) * 2014-08-08 2020-02-19 株式会社半導体エネルギー研究所 半導体装置
JP2017157661A (ja) * 2016-03-01 2017-09-07 出光興産株式会社 半導体装置
TWI831755B (zh) * 2017-11-15 2024-02-11 日商Flosfia股份有限公司 p型氧化物半導體膜及其形成方法
US10573585B2 (en) * 2018-03-19 2020-02-25 Texas Instruments Incorporated Power converter having a conductive clip
JP2020004861A (ja) * 2018-06-28 2020-01-09 堺ディスプレイプロダクト株式会社 薄膜トランジスタ、表示装置及び薄膜トランジスタの製造方法
JP7139862B2 (ja) * 2018-10-15 2022-09-21 株式会社デンソー 半導体装置
JP7315137B2 (ja) * 2018-12-26 2023-07-26 株式会社Flosfia 結晶性酸化物膜

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