JPWO2021193911A1 - - Google Patents
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- Publication number
- JPWO2021193911A1 JPWO2021193911A1 JP2022510731A JP2022510731A JPWO2021193911A1 JP WO2021193911 A1 JPWO2021193911 A1 JP WO2021193911A1 JP 2022510731 A JP2022510731 A JP 2022510731A JP 2022510731 A JP2022510731 A JP 2022510731A JP WO2021193911 A1 JPWO2021193911 A1 JP WO2021193911A1
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/12—Powdering or granulating
- C08J3/128—Polymer particles coated by inorganic and non-macromolecular organic compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/14—Methyl esters, e.g. methyl (meth)acrylate
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/36—Amides or imides
- C08F22/40—Imides, e.g. cyclic imides
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
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- C—CHEMISTRY; METALLURGY
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
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- C—CHEMISTRY; METALLURGY
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- C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
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- C08L71/123—Polyphenylene oxides not modified by chemical after-treatment
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
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- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
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- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
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- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
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- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
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JP2001220691A (ja) | 2000-02-03 | 2001-08-14 | Okuno Chem Ind Co Ltd | 導電性微粒子 |
JP4661282B2 (ja) | 2005-03-14 | 2011-03-30 | 住友ベークライト株式会社 | ポリアミド酸微粒子及びポリイミド微粒子の製造方法 |
JP5103598B2 (ja) | 2007-03-13 | 2012-12-19 | 地方独立行政法人大阪府立産業技術総合研究所 | 機能性ポリイミド微粒子の製造方法 |
JP5101623B2 (ja) * | 2007-09-11 | 2012-12-19 | 新日鉄住金化学株式会社 | 導体層の形成方法、回路基板の製造方法、導電性微粒子の製造方法および導体層形成用組成物 |
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WO2011158783A1 (ja) * | 2010-06-16 | 2011-12-22 | ソニーケミカル&インフォメーションデバイス株式会社 | 導電粒子、その製造方法及び異方性導電接着剤 |
JP5619675B2 (ja) * | 2010-08-16 | 2014-11-05 | 株式会社日本触媒 | 導電性微粒子および異方性導電材料 |
JP2012193325A (ja) * | 2011-03-18 | 2012-10-11 | Mitsubishi Paper Mills Ltd | ポリビスマレイミド架橋微粒子およびその製造方法 |
JP5737278B2 (ja) * | 2011-12-21 | 2015-06-17 | 日立化成株式会社 | 回路接続材料、接続体、及び接続体を製造する方法 |
JP2014001289A (ja) * | 2012-06-18 | 2014-01-09 | Nippon Steel & Sumikin Chemical Co Ltd | 半導体封止用樹脂組成物 |
JP6266973B2 (ja) * | 2012-12-28 | 2018-01-24 | 積水化学工業株式会社 | 有機無機ハイブリッド粒子、導電性粒子、導電材料及び接続構造体 |
JP2015135878A (ja) * | 2014-01-16 | 2015-07-27 | デクセリアルズ株式会社 | 接続体、接続体の製造方法、接続方法、異方性導電接着剤 |
JP6293554B2 (ja) * | 2014-03-31 | 2018-03-14 | 株式会社タムラ製作所 | 異方性導電性ペーストおよびそれを用いたプリント配線基板の製造方法 |
JP6523860B2 (ja) * | 2014-08-07 | 2019-06-05 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
JP6737572B2 (ja) * | 2014-08-14 | 2020-08-12 | 積水化学工業株式会社 | 基材粒子、導電性粒子、導電材料及び接続構造体 |
JP6661969B2 (ja) * | 2014-10-28 | 2020-03-11 | デクセリアルズ株式会社 | 異方性導電フィルム及び接続構造体 |
WO2017051842A1 (ja) * | 2015-09-24 | 2017-03-30 | 積水化学工業株式会社 | 導電性粒子、導電材料、および接続構造体 |
JP6734161B2 (ja) * | 2015-09-25 | 2020-08-05 | 積水化学工業株式会社 | 導電性粒子、導電フィルム、接続構造体及び接続構造体の製造方法 |
JP6623092B2 (ja) * | 2016-03-22 | 2019-12-18 | 株式会社巴川製紙所 | 熱硬化性接着シートおよびその製造方法 |
JP7141819B2 (ja) * | 2016-09-16 | 2022-09-26 | 株式会社日本触媒 | コアシェル粒子 |
JP2018119023A (ja) * | 2017-01-23 | 2018-08-02 | 国立大学法人大阪大学 | 導電性組成物及び半導体装置 |
WO2018230470A1 (ja) * | 2017-06-12 | 2018-12-20 | 積水化学工業株式会社 | 樹脂粒子、導電性粒子、導電材料、接着剤、接続構造体及び液晶表示素子 |
CN111886264B (zh) * | 2018-03-28 | 2023-11-03 | 松下知识产权经营株式会社 | 树脂组合物、和使用其的预浸料、带树脂的膜、带树脂的金属箔、覆金属箔层压板及布线板 |
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EP4130062A1 (en) | 2023-02-08 |
US20230106977A1 (en) | 2023-04-06 |
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