JPWO2021117816A1 - - Google Patents

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Publication number
JPWO2021117816A1
JPWO2021117816A1 JP2021564031A JP2021564031A JPWO2021117816A1 JP WO2021117816 A1 JPWO2021117816 A1 JP WO2021117816A1 JP 2021564031 A JP2021564031 A JP 2021564031A JP 2021564031 A JP2021564031 A JP 2021564031A JP WO2021117816 A1 JPWO2021117816 A1 JP WO2021117816A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021564031A
Other versions
JP7292420B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2021117816A1 publication Critical patent/JPWO2021117816A1/ja
Application granted granted Critical
Publication of JP7292420B2 publication Critical patent/JP7292420B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2021564031A 2019-12-13 2020-12-10 ペリクルのデマウント方法、及び、ペリクルのデマウント前処理装置 Active JP7292420B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019225699 2019-12-13
JP2019225699 2019-12-13
PCT/JP2020/046071 WO2021117816A1 (ja) 2019-12-13 2020-12-10 ペリクルのデマウント方法、及び、ペリクルのデマウント前処理装置

Publications (2)

Publication Number Publication Date
JPWO2021117816A1 true JPWO2021117816A1 (ja) 2021-06-17
JP7292420B2 JP7292420B2 (ja) 2023-06-16

Family

ID=76329900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021564031A Active JP7292420B2 (ja) 2019-12-13 2020-12-10 ペリクルのデマウント方法、及び、ペリクルのデマウント前処理装置

Country Status (6)

Country Link
US (1) US20220365422A1 (ja)
JP (1) JP7292420B2 (ja)
KR (1) KR20220079639A (ja)
CN (1) CN114641725A (ja)
TW (1) TW202136897A (ja)
WO (1) WO2021117816A1 (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04237055A (ja) * 1991-01-21 1992-08-25 Mitsui Petrochem Ind Ltd ペリクル構造体
JPH07120931A (ja) * 1993-10-21 1995-05-12 Shin Etsu Chem Co Ltd ペリクル
JP2007304491A (ja) * 2006-05-15 2007-11-22 Shin Etsu Chem Co Ltd ペリクルおよびペリクル剥離装置
JP2011095453A (ja) * 2009-10-29 2011-05-12 Shin-Etsu Chemical Co Ltd ペリクル剥離用冶具および剥離方法
JP2016206527A (ja) * 2015-04-27 2016-12-08 三井化学株式会社 ペリクルのデマウント方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5432855B2 (ja) * 2010-08-04 2014-03-05 信越化学工業株式会社 ペリクルの製造方法および装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04237055A (ja) * 1991-01-21 1992-08-25 Mitsui Petrochem Ind Ltd ペリクル構造体
JPH07120931A (ja) * 1993-10-21 1995-05-12 Shin Etsu Chem Co Ltd ペリクル
JP2007304491A (ja) * 2006-05-15 2007-11-22 Shin Etsu Chem Co Ltd ペリクルおよびペリクル剥離装置
JP2011095453A (ja) * 2009-10-29 2011-05-12 Shin-Etsu Chemical Co Ltd ペリクル剥離用冶具および剥離方法
JP2016206527A (ja) * 2015-04-27 2016-12-08 三井化学株式会社 ペリクルのデマウント方法

Also Published As

Publication number Publication date
CN114641725A (zh) 2022-06-17
TW202136897A (zh) 2021-10-01
KR20220079639A (ko) 2022-06-13
US20220365422A1 (en) 2022-11-17
JP7292420B2 (ja) 2023-06-16
WO2021117816A1 (ja) 2021-06-17

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