JPWO2021059890A1 - - Google Patents

Info

Publication number
JPWO2021059890A1
JPWO2021059890A1 JP2021548729A JP2021548729A JPWO2021059890A1 JP WO2021059890 A1 JPWO2021059890 A1 JP WO2021059890A1 JP 2021548729 A JP2021548729 A JP 2021548729A JP 2021548729 A JP2021548729 A JP 2021548729A JP WO2021059890 A1 JPWO2021059890 A1 JP WO2021059890A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021548729A
Other versions
JPWO2021059890A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021059890A1 publication Critical patent/JPWO2021059890A1/ja
Publication of JPWO2021059890A5 publication Critical patent/JPWO2021059890A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2021548729A 2019-09-25 2020-09-01 Pending JPWO2021059890A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019173996 2019-09-25
PCT/JP2020/033040 WO2021059890A1 (ja) 2019-09-25 2020-09-01 マスクブランク、位相シフトマスク及び半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021059890A1 true JPWO2021059890A1 (ja) 2021-04-01
JPWO2021059890A5 JPWO2021059890A5 (ja) 2022-04-04

Family

ID=75166612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021548729A Pending JPWO2021059890A1 (ja) 2019-09-25 2020-09-01

Country Status (6)

Country Link
US (1) US20220342294A1 (ja)
JP (1) JPWO2021059890A1 (ja)
KR (1) KR20220066884A (ja)
CN (1) CN114521245A (ja)
TW (1) TW202125093A (ja)
WO (1) WO2021059890A1 (ja)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066369A (ja) * 1998-08-25 2000-03-03 Murata Mfg Co Ltd 位相シフトマスクの作製方法
JP2000231183A (ja) * 1999-02-10 2000-08-22 Semiconductor Leading Edge Technologies Inc パターン形成方法及び位相シフトマスク
JP2002156739A (ja) * 2000-11-21 2002-05-31 Toppan Printing Co Ltd 位相シフトマスクブランク及び位相シフトマスク
JP2002258458A (ja) * 2000-12-26 2002-09-11 Hoya Corp ハーフトーン型位相シフトマスク及びマスクブランク
JP2002318449A (ja) * 2001-03-21 2002-10-31 Internatl Business Mach Corp <Ibm> 位相シフト・マスク
JP2012073326A (ja) * 2010-09-28 2012-04-12 Toppan Printing Co Ltd フォトマスク、フォトマスクブランク及びフォトマスクの製造方法
JP2015143816A (ja) * 2013-12-26 2015-08-06 Hoya株式会社 フォトマスクの製造方法、フォトマスク及びパターン転写方法
JP2018194829A (ja) * 2017-05-18 2018-12-06 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
JP2019144444A (ja) * 2018-02-22 2019-08-29 Hoya株式会社 マスクブランク、位相シフトマスク及び半導体デバイスの製造方法
JP2020052195A (ja) * 2018-09-26 2020-04-02 信越化学工業株式会社 位相シフト型フォトマスクブランク及び位相シフト型フォトマスク

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5134386A (ja) * 1974-09-18 1976-03-24 Nippon Denki Sylvania Kk
JP3422054B2 (ja) 1993-11-01 2003-06-30 凸版印刷株式会社 光学マスクおよびその製造方法
JP4419464B2 (ja) * 2003-07-22 2010-02-24 凸版印刷株式会社 ハーフトーン型位相シフトマスクの製造方法
US20070121090A1 (en) * 2005-11-30 2007-05-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4881633B2 (ja) 2006-03-10 2012-02-22 凸版印刷株式会社 クロムレス位相シフトマスク用フォトマスクブランク、クロムレス位相シフトマスク、及びクロムレス位相シフトマスクの製造方法
WO2016147518A1 (ja) * 2015-03-19 2016-09-22 Hoya株式会社 マスクブランク、転写用マスク、転写用マスクの製造方法および半導体デバイスの製造方法
KR20180041042A (ko) * 2016-10-13 2018-04-23 주식회사 에스앤에스텍 위상반전 블랭크 마스크 및 포토마스크
JP2018072543A (ja) * 2016-10-28 2018-05-10 凸版印刷株式会社 フォトマスクブランク、フォトマスク及びフォトマスクの製造方法
US11022875B2 (en) * 2018-02-27 2021-06-01 Hoya Corporation Mask blank, phase shift mask, and method of manufacturing semiconductor device
US11314161B2 (en) * 2018-03-14 2022-04-26 Hoya Corporation Mask blank, phase shift mask, and method of manufacturing semiconductor device
WO2020066590A1 (ja) * 2018-09-25 2020-04-02 Hoya株式会社 マスクブランク、転写用マスクおよび半導体デバイスの製造方法
CN112740106A (zh) * 2018-09-27 2021-04-30 Hoya株式会社 掩模坯料、转印用掩模及半导体器件的制造方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066369A (ja) * 1998-08-25 2000-03-03 Murata Mfg Co Ltd 位相シフトマスクの作製方法
JP2000231183A (ja) * 1999-02-10 2000-08-22 Semiconductor Leading Edge Technologies Inc パターン形成方法及び位相シフトマスク
JP2002156739A (ja) * 2000-11-21 2002-05-31 Toppan Printing Co Ltd 位相シフトマスクブランク及び位相シフトマスク
JP2002258458A (ja) * 2000-12-26 2002-09-11 Hoya Corp ハーフトーン型位相シフトマスク及びマスクブランク
JP2002318449A (ja) * 2001-03-21 2002-10-31 Internatl Business Mach Corp <Ibm> 位相シフト・マスク
JP2012073326A (ja) * 2010-09-28 2012-04-12 Toppan Printing Co Ltd フォトマスク、フォトマスクブランク及びフォトマスクの製造方法
JP2015143816A (ja) * 2013-12-26 2015-08-06 Hoya株式会社 フォトマスクの製造方法、フォトマスク及びパターン転写方法
JP2018194829A (ja) * 2017-05-18 2018-12-06 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
JP2019144444A (ja) * 2018-02-22 2019-08-29 Hoya株式会社 マスクブランク、位相シフトマスク及び半導体デバイスの製造方法
JP2020052195A (ja) * 2018-09-26 2020-04-02 信越化学工業株式会社 位相シフト型フォトマスクブランク及び位相シフト型フォトマスク

Also Published As

Publication number Publication date
TW202125093A (zh) 2021-07-01
KR20220066884A (ko) 2022-05-24
US20220342294A1 (en) 2022-10-27
CN114521245A (zh) 2022-05-20
WO2021059890A1 (ja) 2021-04-01

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