JPWO2021049563A5 - - Google Patents

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Publication number
JPWO2021049563A5
JPWO2021049563A5 JP2021545584A JP2021545584A JPWO2021049563A5 JP WO2021049563 A5 JPWO2021049563 A5 JP WO2021049563A5 JP 2021545584 A JP2021545584 A JP 2021545584A JP 2021545584 A JP2021545584 A JP 2021545584A JP WO2021049563 A5 JPWO2021049563 A5 JP WO2021049563A5
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JP
Japan
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general formula
bonded
skeleton
ring structure
nitrogen atom
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JP2021545584A
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English (en)
Japanese (ja)
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JPWO2021049563A1 (https=
JP7626457B2 (ja
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Priority claimed from PCT/JP2020/034262 external-priority patent/WO2021049563A1/ja
Publication of JPWO2021049563A1 publication Critical patent/JPWO2021049563A1/ja
Publication of JPWO2021049563A5 publication Critical patent/JPWO2021049563A5/ja
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JP2021545584A 2019-09-10 2020-09-10 光塩基発生剤、化合物、光反応性組成物及び反応生成物 Active JP7626457B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019164946 2019-09-10
JP2019164946 2019-09-10
PCT/JP2020/034262 WO2021049563A1 (ja) 2019-09-10 2020-09-10 光塩基発生剤、化合物、光反応性組成物及び反応生成物

Publications (3)

Publication Number Publication Date
JPWO2021049563A1 JPWO2021049563A1 (https=) 2021-03-18
JPWO2021049563A5 true JPWO2021049563A5 (https=) 2022-06-30
JP7626457B2 JP7626457B2 (ja) 2025-02-04

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JP2021545584A Active JP7626457B2 (ja) 2019-09-10 2020-09-10 光塩基発生剤、化合物、光反応性組成物及び反応生成物

Country Status (3)

Country Link
US (1) US11873354B2 (https=)
JP (1) JP7626457B2 (https=)
WO (1) WO2021049563A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4067453B1 (en) * 2019-12-26 2026-03-25 Tokyo University of Science Foundation Photobase generator, compound, photoreactive composition, and reaction product
CN120936613A (zh) * 2023-02-28 2025-11-11 维也纳科技大学 光碱

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IN177137B (https=) * 1992-12-11 1996-11-16 Hoechst India
JP5071803B2 (ja) * 2007-09-03 2012-11-14 学校法人東京理科大学 感光性樹脂組成物
KR101552371B1 (ko) * 2008-03-31 2015-09-10 다이니폰 인사츠 가부시키가이샤 염기 발생제, 감광성 수지 조성물, 당해 감광성 수지 조성물을 포함하는 패턴 형성용 재료, 당해 감광성 수지 조성물을 사용한 패턴 형성 방법 및 물품
US8288591B2 (en) * 2008-11-20 2012-10-16 Designer Molecules, Inc. Curing agents for epoxy resins
US20130012620A1 (en) * 2010-03-17 2013-01-10 Designer Molecules, Inc. Curing agents for epoxy resins
JP5617564B2 (ja) * 2010-11-26 2014-11-05 和光純薬工業株式会社 感光性樹脂組成物
JP2012211276A (ja) * 2011-03-31 2012-11-01 Dainippon Printing Co Ltd 塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたレリーフパターンの製造方法並びに物品
JP5974446B2 (ja) * 2011-10-14 2016-08-23 大日本印刷株式会社 感光性樹脂組成物及び粘接着シート
JP2014198403A (ja) * 2013-03-29 2014-10-23 大日本印刷株式会社 繊維強化樹脂成形品の製造方法、繊維強化樹脂成形材料、及び繊維強化樹脂成形材料用硬化性樹脂組成物
KR102266013B1 (ko) * 2013-06-28 2021-06-18 후지필름 와코 준야꾸 가부시키가이샤 염기 발생제, 이 염기 발생제를 함유하는 염기 반응성 조성물 및 염기 발생 방법
JP6484056B2 (ja) * 2014-03-25 2019-03-13 東京応化工業株式会社 パターン形成方法
JP6966764B2 (ja) * 2017-02-17 2021-11-17 学校法人東京理科大学 樹脂組成物、化合物及び光重合開始剤
JP2019189539A (ja) * 2018-04-20 2019-10-31 太陽ホールディングス株式会社 熱塩基発生剤、硬化性組成物、および、硬化物
WO2019216321A1 (ja) * 2018-05-07 2019-11-14 学校法人東京理科大学 光反応性組成物、反応生成物及び反応生成物の製造方法
WO2019216322A1 (ja) * 2018-05-07 2019-11-14 学校法人東京理科大学 硬化性組成物、化合物、塩基変換増殖剤及び硬化物

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