JPWO2021038349A1 - - Google Patents

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Publication number
JPWO2021038349A1
JPWO2021038349A1 JP2021542302A JP2021542302A JPWO2021038349A1 JP WO2021038349 A1 JPWO2021038349 A1 JP WO2021038349A1 JP 2021542302 A JP2021542302 A JP 2021542302A JP 2021542302 A JP2021542302 A JP 2021542302A JP WO2021038349 A1 JPWO2021038349 A1 JP WO2021038349A1
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JP
Japan
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Application number
JP2021542302A
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Japanese (ja)
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JPWO2021038349A5 (https=
JP7621953B2 (ja
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Publication of JPWO2021038349A5 publication Critical patent/JPWO2021038349A5/ja
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Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/45Differential amplifiers
    • H03F3/45071Differential amplifiers with semiconductor devices only
    • H03F3/45076Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier
    • H03F3/45179Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier using MOSFET transistors as the active amplifying circuit
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K5/00Manipulating of pulses not covered by one of the other main groups of this subclass
    • H03K5/01Shaping pulses
    • H03K5/08Shaping pulses by limiting; by thresholding; by slicing, i.e. combined limiting and thresholding
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K5/00Manipulating of pulses not covered by one of the other main groups of this subclass
    • H03K5/22Circuits having more than one input and one output for comparing pulses or pulse trains with each other according to input signal characteristics, e.g. slope, integral
    • H03K5/24Circuits having more than one input and one output for comparing pulses or pulse trains with each other according to input signal characteristics, e.g. slope, integral the characteristic being amplitude
    • H03K5/2472Circuits having more than one input and one output for comparing pulses or pulse trains with each other according to input signal characteristics, e.g. slope, integral the characteristic being amplitude using field effect transistors
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/45Differential amplifiers
    • H03F3/45071Differential amplifiers with semiconductor devices only
    • H03F3/45076Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier
    • H03F3/45179Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier using MOSFET transistors as the active amplifying circuit
    • H03F3/45183Long tailed pairs
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/45Differential amplifiers
    • H03F3/45071Differential amplifiers with semiconductor devices only
    • H03F3/45076Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier
    • H03F3/45179Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier using MOSFET transistors as the active amplifying circuit
    • H03F3/45183Long tailed pairs
    • H03F3/45188Non-folded cascode stages
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/45Differential amplifiers
    • H03F3/45071Differential amplifiers with semiconductor devices only
    • H03F3/45076Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier
    • H03F3/45475Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier using IC blocks as the active amplifying circuit
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6729Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H10D30/6733Multi-gate TFTs
    • H10D30/6734Multi-gate TFTs having gate electrodes arranged on both top and bottom sides of the channel, e.g. dual-gate TFTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6757Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D87/00Integrated devices comprising both bulk components and either SOI or SOS components on the same substrate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D88/00Three-dimensional [3D] integrated devices
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02JELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J7/00Circuit arrangements for charging or discharging batteries or for supplying loads from batteries
    • H02J7/60Circuit arrangements for charging or discharging batteries or for supplying loads from batteries including safety or protection arrangements
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2203/00Indexing scheme relating to amplifiers with only discharge tubes or only semiconductor devices as amplifying elements covered by H03F3/00
    • H03F2203/45Indexing scheme relating to differential amplifiers
    • H03F2203/45362Indexing scheme relating to differential amplifiers the AAC comprising multiple transistors parallel coupled at their gates and drains only, e.g. in a cascode dif amp, only those forming the composite common source transistor
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2203/00Indexing scheme relating to amplifiers with only discharge tubes or only semiconductor devices as amplifying elements covered by H03F3/00
    • H03F2203/45Indexing scheme relating to differential amplifiers
    • H03F2203/45512Indexing scheme relating to differential amplifiers the FBC comprising one or more capacitors, not being switched capacitors, and being coupled between the LC and the IC
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/201Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates the substrates comprising an insulating layer on a semiconductor body, e.g. SOI
    • H10D86/215Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates the substrates comprising an insulating layer on a semiconductor body, e.g. SOI comprising FinFETs

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Thin Film Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP2021542302A 2019-08-23 2020-08-11 半導体装置の動作方法 Active JP7621953B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2019152676 2019-08-23
JP2019152676 2019-08-23
JP2019223352 2019-12-11
JP2019223352 2019-12-11
JP2020005724 2020-01-17
JP2020005724 2020-01-17
PCT/IB2020/057528 WO2021038349A1 (ja) 2019-08-23 2020-08-11 半導体装置及び半導体装置の動作方法

Publications (3)

Publication Number Publication Date
JPWO2021038349A1 true JPWO2021038349A1 (https=) 2021-03-04
JPWO2021038349A5 JPWO2021038349A5 (https=) 2023-08-10
JP7621953B2 JP7621953B2 (ja) 2025-01-27

Family

ID=74683577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021542302A Active JP7621953B2 (ja) 2019-08-23 2020-08-11 半導体装置の動作方法

Country Status (5)

Country Link
US (1) US11799430B2 (https=)
JP (1) JP7621953B2 (https=)
KR (1) KR20220051188A (https=)
CN (1) CN114303315A (https=)
WO (1) WO2021038349A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7554673B2 (ja) * 2018-12-20 2024-09-20 株式会社半導体エネルギー研究所 半導体装置
JP7653968B2 (ja) * 2020-02-21 2025-03-31 株式会社半導体エネルギー研究所 半導体装置、蓄電装置、電池制御回路、電子部品、車両、および電子機器
US20230146313A1 (en) * 2020-03-30 2023-05-11 Sanyo Electric Co., Ltd. Battery pack for electric bicycle and electric bicycle equipped with battery pack
US11653441B2 (en) * 2020-11-12 2023-05-16 STMicroelectronics (Alps) SAS Printed circuit board
US20230147329A1 (en) * 2021-11-08 2023-05-11 International Business Machines Corporation Single Process Double Gate and Variable Threshold Voltage MOSFET
WO2025083533A1 (ja) * 2023-10-20 2025-04-24 株式会社半導体エネルギー研究所 半導体装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62269512A (ja) * 1986-05-19 1987-11-24 Nippon Telegr & Teleph Corp <Ntt> 電圧比較器
JPH08125504A (ja) * 1994-10-28 1996-05-17 Sony Corp コンパレータ及び差動増幅器
JP2003142598A (ja) * 2001-11-01 2003-05-16 Hitachi Ltd 半導体集積回路装置
US6750704B1 (en) * 2003-01-09 2004-06-15 Motorola, Inc. Offset compensated differential amplifier
JP2006352607A (ja) * 2005-06-17 2006-12-28 Renesas Technology Corp 差動増幅器およびアナログデジタルコンバータ
JP2010147992A (ja) * 2008-12-22 2010-07-01 Toshiba Corp 増幅回路及びa/d変換器
JP2017192124A (ja) * 2016-02-10 2017-10-19 株式会社半導体エネルギー研究所 半導体装置、電子部品、および電子機器
JP2018011294A (ja) * 2016-06-30 2018-01-18 株式会社半導体エネルギー研究所 半導体装置、および半導体装置の動作方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4922204B2 (ja) 2007-02-19 2012-04-25 株式会社東芝 信号検出回路
JP2009071653A (ja) 2007-09-14 2009-04-02 Yamaha Corp コンパレータ
JP2010050590A (ja) * 2008-08-20 2010-03-04 Kanagawa Univ コンパレータ回路
WO2010082239A1 (ja) * 2009-01-13 2010-07-22 パナソニック株式会社 比較器およびa/d変換器
CN102282739B (zh) 2009-01-14 2014-05-07 三美电机株式会社 保护监视电路、电池组、二次电池监视电路以及保护电路
JP6906978B2 (ja) 2016-02-25 2021-07-21 株式会社半導体エネルギー研究所 半導体装置、半導体ウェハ、および電子機器
US10236875B2 (en) 2016-04-15 2019-03-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for operating the semiconductor device
WO2020174303A1 (ja) 2019-02-26 2020-09-03 株式会社半導体エネルギー研究所 半導体装置及び半導体装置の動作方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62269512A (ja) * 1986-05-19 1987-11-24 Nippon Telegr & Teleph Corp <Ntt> 電圧比較器
JPH08125504A (ja) * 1994-10-28 1996-05-17 Sony Corp コンパレータ及び差動増幅器
JP2003142598A (ja) * 2001-11-01 2003-05-16 Hitachi Ltd 半導体集積回路装置
US6750704B1 (en) * 2003-01-09 2004-06-15 Motorola, Inc. Offset compensated differential amplifier
JP2006352607A (ja) * 2005-06-17 2006-12-28 Renesas Technology Corp 差動増幅器およびアナログデジタルコンバータ
JP2010147992A (ja) * 2008-12-22 2010-07-01 Toshiba Corp 増幅回路及びa/d変換器
JP2017192124A (ja) * 2016-02-10 2017-10-19 株式会社半導体エネルギー研究所 半導体装置、電子部品、および電子機器
JP2018011294A (ja) * 2016-06-30 2018-01-18 株式会社半導体エネルギー研究所 半導体装置、および半導体装置の動作方法

Also Published As

Publication number Publication date
CN114303315A (zh) 2022-04-08
WO2021038349A1 (ja) 2021-03-04
KR20220051188A (ko) 2022-04-26
US20220294402A1 (en) 2022-09-15
JP7621953B2 (ja) 2025-01-27
US11799430B2 (en) 2023-10-24

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