JPWO2020262674A1 - - Google Patents
Info
- Publication number
- JPWO2020262674A1 JPWO2020262674A1 JP2021528283A JP2021528283A JPWO2020262674A1 JP WO2020262674 A1 JPWO2020262674 A1 JP WO2020262674A1 JP 2021528283 A JP2021528283 A JP 2021528283A JP 2021528283 A JP2021528283 A JP 2021528283A JP WO2020262674 A1 JPWO2020262674 A1 JP WO2020262674A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019122425 | 2019-06-28 | ||
| JP2019122425 | 2019-06-28 | ||
| PCT/JP2020/025391 WO2020262674A1 (ja) | 2019-06-28 | 2020-06-26 | ミラー装着部材、これを使用した位置計測用ミラー、および露光装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020262674A1 true JPWO2020262674A1 (US20030157376A1-20030821-M00001.png) | 2020-12-30 |
| JPWO2020262674A5 JPWO2020262674A5 (US20030157376A1-20030821-M00001.png) | 2022-03-11 |
| JP7261298B2 JP7261298B2 (ja) | 2023-04-19 |
Family
ID=74061283
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021528283A Active JP7261298B2 (ja) | 2019-06-28 | 2020-06-26 | ミラー装着部材、これを使用した位置計測用ミラー、および露光装置 |
Country Status (6)
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022145470A1 (ja) * | 2020-12-28 | 2022-07-07 | 京セラ株式会社 | 構造体、これを使用した位置計測用ミラーおよび露光装置 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0373906U (US20030157376A1-20030821-M00001.png) * | 1989-11-22 | 1991-07-25 | ||
| JP2002182103A (ja) * | 2000-12-14 | 2002-06-26 | Alps Electric Co Ltd | 樹脂成形光学部品及びそれを備えた光ピックアップ装置 |
| JP2002277782A (ja) * | 2001-03-16 | 2002-09-25 | Sharp Corp | 光学部品の取付構造 |
| JP2004163491A (ja) * | 2002-11-11 | 2004-06-10 | Nippon Sheet Glass Co Ltd | 光学素子及びその製造方法 |
| JP2004177331A (ja) * | 2002-11-28 | 2004-06-24 | Taiheiyo Cement Corp | 位置測定用ミラーおよびミラー用部材 |
| JP2004309733A (ja) * | 2003-04-04 | 2004-11-04 | Seiko Epson Corp | 凹部付き基材の製造方法、凹部付き基材、マイクロレンズ用凹部付き基材、マイクロレンズ基板、透過型スクリーンおよびリア型プロジェクタ |
| JP2008124219A (ja) * | 2006-11-10 | 2008-05-29 | Canon Inc | 液浸露光装置 |
| JP2008191592A (ja) * | 2007-02-07 | 2008-08-21 | Hitachi Ltd | 光学部材 |
| CN105589170A (zh) * | 2016-01-28 | 2016-05-18 | 中国华能集团清洁能源技术研究院有限公司 | 一种桁架式线性菲涅尔太阳能反射镜框架 |
| JP2018004956A (ja) * | 2016-07-01 | 2018-01-11 | 恵和株式会社 | 光学ユニット及び光学ユニットの製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3795869B2 (ja) * | 2003-02-18 | 2006-07-12 | 株式会社東芝 | 光モジュール |
| JP2012203371A (ja) * | 2011-03-28 | 2012-10-22 | Nippon Shokubai Co Ltd | 金属膜を用いた光導波路のミラー部の製造方法、及び光導波路 |
| JP6301067B2 (ja) * | 2013-04-26 | 2018-03-28 | 富士通コンポーネント株式会社 | 光学部材、光モジュール |
| CN105652393B (zh) * | 2016-03-18 | 2018-01-05 | 武汉华工正源光子技术有限公司 | 基于光学基座的单纤双向器件的封装结构及封装方法 |
| KR102354871B1 (ko) * | 2016-12-21 | 2022-01-21 | 니치아 카가쿠 고교 가부시키가이샤 | 발광 장치의 제조 방법 |
-
2020
- 2020-06-26 WO PCT/JP2020/025391 patent/WO2020262674A1/ja active Application Filing
- 2020-06-26 CN CN202080043907.XA patent/CN113994267B/zh active Active
- 2020-06-26 US US17/621,962 patent/US20220269040A1/en active Pending
- 2020-06-26 JP JP2021528283A patent/JP7261298B2/ja active Active
- 2020-06-26 EP EP20831467.4A patent/EP3992716A4/en not_active Withdrawn
- 2020-06-26 KR KR1020217041608A patent/KR20220011153A/ko not_active Application Discontinuation
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0373906U (US20030157376A1-20030821-M00001.png) * | 1989-11-22 | 1991-07-25 | ||
| JP2002182103A (ja) * | 2000-12-14 | 2002-06-26 | Alps Electric Co Ltd | 樹脂成形光学部品及びそれを備えた光ピックアップ装置 |
| JP2002277782A (ja) * | 2001-03-16 | 2002-09-25 | Sharp Corp | 光学部品の取付構造 |
| JP2004163491A (ja) * | 2002-11-11 | 2004-06-10 | Nippon Sheet Glass Co Ltd | 光学素子及びその製造方法 |
| JP2004177331A (ja) * | 2002-11-28 | 2004-06-24 | Taiheiyo Cement Corp | 位置測定用ミラーおよびミラー用部材 |
| JP2004309733A (ja) * | 2003-04-04 | 2004-11-04 | Seiko Epson Corp | 凹部付き基材の製造方法、凹部付き基材、マイクロレンズ用凹部付き基材、マイクロレンズ基板、透過型スクリーンおよびリア型プロジェクタ |
| JP2008124219A (ja) * | 2006-11-10 | 2008-05-29 | Canon Inc | 液浸露光装置 |
| JP2008191592A (ja) * | 2007-02-07 | 2008-08-21 | Hitachi Ltd | 光学部材 |
| CN105589170A (zh) * | 2016-01-28 | 2016-05-18 | 中国华能集团清洁能源技术研究院有限公司 | 一种桁架式线性菲涅尔太阳能反射镜框架 |
| JP2018004956A (ja) * | 2016-07-01 | 2018-01-11 | 恵和株式会社 | 光学ユニット及び光学ユニットの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7261298B2 (ja) | 2023-04-19 |
| KR20220011153A (ko) | 2022-01-27 |
| US20220269040A1 (en) | 2022-08-25 |
| WO2020262674A1 (ja) | 2020-12-30 |
| CN113994267A (zh) | 2022-01-28 |
| EP3992716A1 (en) | 2022-05-04 |
| CN113994267B (zh) | 2024-01-19 |
| EP3992716A4 (en) | 2023-08-09 |
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