JPWO2020261574A5 - - Google Patents
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- Publication number
- JPWO2020261574A5 JPWO2020261574A5 JP2021527309A JP2021527309A JPWO2020261574A5 JP WO2020261574 A5 JPWO2020261574 A5 JP WO2020261574A5 JP 2021527309 A JP2021527309 A JP 2021527309A JP 2021527309 A JP2021527309 A JP 2021527309A JP WO2020261574 A5 JPWO2020261574 A5 JP WO2020261574A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor film
- outer peripheral
- peak
- center point
- peak intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 15
- 230000002093 peripheral effect Effects 0.000 claims 11
- 239000013078 crystal Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 claims 2
- 238000005259 measurement Methods 0.000 claims 2
- 238000002441 X-ray diffraction Methods 0.000 claims 1
- 229910052800 carbon group element Inorganic materials 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000002019 doping agent Substances 0.000 claims 1
- 239000006104 solid solution Substances 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/025963 WO2020261574A1 (ja) | 2019-06-28 | 2019-06-28 | 半導体膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020261574A1 JPWO2020261574A1 (https=) | 2020-12-30 |
| JPWO2020261574A5 true JPWO2020261574A5 (https=) | 2022-03-17 |
| JP7265624B2 JP7265624B2 (ja) | 2023-04-26 |
Family
ID=74060202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021527309A Active JP7265624B2 (ja) | 2019-06-28 | 2019-06-28 | 半導体膜 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7265624B2 (https=) |
| WO (1) | WO2020261574A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202235664A (zh) * | 2021-03-12 | 2022-09-16 | 日商信越化學工業股份有限公司 | 氧化物半導體膜及其成膜方法、半導體裝置 |
| JPWO2024122463A1 (https=) | 2022-12-06 | 2024-06-13 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6478103B2 (ja) * | 2015-01-29 | 2019-03-06 | 株式会社Flosfia | 成膜装置および成膜方法 |
| JP6876895B2 (ja) * | 2015-02-25 | 2021-05-26 | 株式会社Flosfia | 結晶性酸化物半導体膜、半導体装置 |
| JP6422159B2 (ja) | 2015-02-25 | 2018-11-14 | 国立研究開発法人物質・材料研究機構 | α−Ｇａ２Ｏ３単結晶、α−Ｇａ２Ｏ３の製造方法、および、それを用いた半導体素子 |
-
2019
- 2019-06-28 JP JP2021527309A patent/JP7265624B2/ja active Active
- 2019-06-28 WO PCT/JP2019/025963 patent/WO2020261574A1/ja not_active Ceased
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