JPWO2020245962A1 - - Google Patents

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Publication number
JPWO2020245962A1
JPWO2020245962A1 JP2021524585A JP2021524585A JPWO2020245962A1 JP WO2020245962 A1 JPWO2020245962 A1 JP WO2020245962A1 JP 2021524585 A JP2021524585 A JP 2021524585A JP 2021524585 A JP2021524585 A JP 2021524585A JP WO2020245962 A1 JPWO2020245962 A1 JP WO2020245962A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021524585A
Other versions
JPWO2020245962A5 (ja
JP7155425B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2020245962A1 publication Critical patent/JPWO2020245962A1/ja
Publication of JPWO2020245962A5 publication Critical patent/JPWO2020245962A5/ja
Application granted granted Critical
Publication of JP7155425B2 publication Critical patent/JP7155425B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/20—Metals
    • G01N33/204—Structure thereof, e.g. crystal structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/607—Specific applications or type of materials strain
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/624—Specific applications or type of materials steel, castings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24557—Spin polarisation (particles)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Measuring Magnetic Variables (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2021524585A 2019-06-06 2019-06-06 走査電子顕微鏡 Active JP7155425B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/022452 WO2020245962A1 (ja) 2019-06-06 2019-06-06 走査電子顕微鏡

Publications (3)

Publication Number Publication Date
JPWO2020245962A1 true JPWO2020245962A1 (ja) 2020-12-10
JPWO2020245962A5 JPWO2020245962A5 (ja) 2022-02-21
JP7155425B2 JP7155425B2 (ja) 2022-10-18

Family

ID=73653050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021524585A Active JP7155425B2 (ja) 2019-06-06 2019-06-06 走査電子顕微鏡

Country Status (3)

Country Link
US (1) US11756763B2 (ja)
JP (1) JP7155425B2 (ja)
WO (1) WO2020245962A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11756763B2 (en) * 2019-06-06 2023-09-12 Hitachi High-Tech Corporation Scanning electron microscope

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1020044A (ja) * 1996-07-09 1998-01-23 Kagaku Gijutsu Shinko Jigyodan 電子スピン偏極度の計測方法及びその装置
JP2008269967A (ja) * 2007-04-20 2008-11-06 Apco:Kk 電子線スピン検出器
JP2010151455A (ja) * 2008-12-24 2010-07-08 Toyota Central R&D Labs Inc 磁性試料の観察方法、観察装置およびその観察用治具
JP2011059057A (ja) * 2009-09-14 2011-03-24 Fujitsu Ltd 電子スピン分析器及び表面観察装置
JP2011095150A (ja) * 2009-10-30 2011-05-12 Fujitsu Ltd スピン検出器、表面分析装置及びターゲット
WO2011122171A1 (ja) * 2010-03-29 2011-10-06 国立大学法人名古屋大学 電子顕微鏡
WO2019186736A1 (ja) * 2018-03-27 2019-10-03 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及び２次電子スピン偏極度を解析する方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4786331B2 (ja) * 2005-12-21 2011-10-05 株式会社東芝 磁気抵抗効果素子の製造方法
JP2007225363A (ja) * 2006-02-22 2007-09-06 Hitachi Ltd 磁気試料検査装置
US7985952B2 (en) * 2007-03-05 2011-07-26 Hitachi, Ltd. Charged particle spin polarimeter, microscope, and photoelectron spectroscope
JP5222712B2 (ja) * 2008-12-22 2013-06-26 株式会社日立製作所 電子スピン検出器並びにそれを用いたスピン偏極走査電子顕微鏡及びスピン分解光電子分光装置
WO2016056425A1 (ja) * 2014-10-09 2016-04-14 国立大学法人名古屋大学 スピン偏極電子線のコヒーレンス測定装置と、その利用方法
JP6469222B2 (ja) * 2015-06-23 2019-02-13 株式会社日立製作所 荷電粒子装置、荷電粒子の照射方法、および分析装置
JP6568646B2 (ja) * 2016-03-29 2019-08-28 株式会社日立ハイテクノロジーズ 電子顕微鏡
US11756763B2 (en) * 2019-06-06 2023-09-12 Hitachi High-Tech Corporation Scanning electron microscope

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1020044A (ja) * 1996-07-09 1998-01-23 Kagaku Gijutsu Shinko Jigyodan 電子スピン偏極度の計測方法及びその装置
JP2008269967A (ja) * 2007-04-20 2008-11-06 Apco:Kk 電子線スピン検出器
JP2010151455A (ja) * 2008-12-24 2010-07-08 Toyota Central R&D Labs Inc 磁性試料の観察方法、観察装置およびその観察用治具
JP2011059057A (ja) * 2009-09-14 2011-03-24 Fujitsu Ltd 電子スピン分析器及び表面観察装置
JP2011095150A (ja) * 2009-10-30 2011-05-12 Fujitsu Ltd スピン検出器、表面分析装置及びターゲット
WO2011122171A1 (ja) * 2010-03-29 2011-10-06 国立大学法人名古屋大学 電子顕微鏡
WO2019186736A1 (ja) * 2018-03-27 2019-10-03 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及び２次電子スピン偏極度を解析する方法

Also Published As

Publication number Publication date
JP7155425B2 (ja) 2022-10-18
US11756763B2 (en) 2023-09-12
US20220246393A1 (en) 2022-08-04
WO2020245962A1 (ja) 2020-12-10

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