JPWO2020234987A5 - - Google Patents
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- Publication number
- JPWO2020234987A5 JPWO2020234987A5 JP2021519929A JP2021519929A JPWO2020234987A5 JP WO2020234987 A5 JPWO2020234987 A5 JP WO2020234987A5 JP 2021519929 A JP2021519929 A JP 2021519929A JP 2021519929 A JP2021519929 A JP 2021519929A JP WO2020234987 A5 JPWO2020234987 A5 JP WO2020234987A5
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- JP
- Japan
- Prior art keywords
- light
- intensity
- sample
- particle beam
- charged particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 claims description 42
- 238000010521 absorption reaction Methods 0.000 claims description 22
- 230000003287 optical effect Effects 0.000 claims description 10
- 230000010287 polarization Effects 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 3
- 238000001514 detection method Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000005281 excited state Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Images
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/020065 WO2020234987A1 (ja) | 2019-05-21 | 2019-05-21 | 荷電粒子線装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020234987A1 JPWO2020234987A1 (https=) | 2020-11-26 |
| JPWO2020234987A5 true JPWO2020234987A5 (https=) | 2022-01-18 |
| JP7108788B2 JP7108788B2 (ja) | 2022-07-28 |
Family
ID=73459313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021519929A Active JP7108788B2 (ja) | 2019-05-21 | 2019-05-21 | 荷電粒子線装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20220216032A1 (https=) |
| JP (1) | JP7108788B2 (https=) |
| KR (1) | KR102640025B1 (https=) |
| DE (1) | DE112019007206B4 (https=) |
| TW (1) | TWI748404B (https=) |
| WO (1) | WO2020234987A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023145015A1 (ja) * | 2022-01-28 | 2023-08-03 | 株式会社日立ハイテク | 検査装置および膜質検査方法 |
| WO2024069737A1 (ja) * | 2022-09-27 | 2024-04-04 | 株式会社日立ハイテク | 検査方法および荷電粒子線装置 |
| KR20250090336A (ko) * | 2022-12-20 | 2025-06-19 | 주식회사 히타치하이테크 | 시료의 특징량 도출 방법, 신호 처리 시스템을 조정하는 조정 방법 및 계측 시스템 |
| JP2024173322A (ja) * | 2023-06-02 | 2024-12-12 | 国立研究開発法人産業技術総合研究所 | 観察装置及び観察方法 |
| WO2025069195A1 (ja) * | 2023-09-26 | 2025-04-03 | 株式会社日立ハイテク | 荷電粒子ビーム装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3805565B2 (ja) * | 1999-06-11 | 2006-08-02 | 株式会社日立製作所 | 電子線画像に基づく検査または計測方法およびその装置 |
| JP2003151483A (ja) * | 2001-11-19 | 2003-05-23 | Hitachi Ltd | 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法 |
| JP2007531876A (ja) * | 2004-04-02 | 2007-11-08 | カリフォルニア インスティテュート オブ テクノロジー | 超高速光電子顕微鏡のための方法およびシステム |
| JP2006352026A (ja) * | 2005-06-20 | 2006-12-28 | Sony Corp | 半導体レーザ装置及び半導体レーザ装置の製造方法 |
| DE102007041496B3 (de) | 2007-08-31 | 2009-02-26 | Johnson Controls Gmbh | Kopfstütze für ein Fahrzeug |
| JP5770434B2 (ja) * | 2010-06-24 | 2015-08-26 | 株式会社堀場製作所 | 電子顕微鏡装置 |
| JP5744629B2 (ja) * | 2011-06-03 | 2015-07-08 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡及び電子線を用いた撮像方法 |
| JP6289339B2 (ja) * | 2014-10-28 | 2018-03-07 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び情報処理装置 |
| WO2016143450A1 (ja) * | 2015-03-10 | 2016-09-15 | 株式会社荏原製作所 | 検査装置 |
| CN108603851B (zh) * | 2016-03-16 | 2021-01-01 | 株式会社日立高新技术 | 缺陷检查装置 |
| JP6957641B2 (ja) * | 2017-11-27 | 2021-11-02 | 株式会社日立ハイテク | 荷電粒子線装置およびそれを用いた試料観察方法 |
| US11393657B2 (en) * | 2018-09-11 | 2022-07-19 | Hitachi High-Tech Corporation | Electron beam device |
| JP7105368B2 (ja) * | 2019-03-27 | 2022-07-22 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7189103B2 (ja) * | 2019-08-30 | 2022-12-13 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7148467B2 (ja) * | 2019-08-30 | 2022-10-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
| US12609274B2 (en) * | 2020-09-28 | 2026-04-21 | Hitachi High-Tech Corporation | Charged particle beam device |
| US12196802B2 (en) * | 2020-09-29 | 2025-01-14 | Hitachi High-Tech Corporation | Semiconductor inspection device and method for inspecting semiconductor sample |
-
2019
- 2019-05-21 WO PCT/JP2019/020065 patent/WO2020234987A1/ja not_active Ceased
- 2019-05-21 KR KR1020217034096A patent/KR102640025B1/ko active Active
- 2019-05-21 DE DE112019007206.4T patent/DE112019007206B4/de active Active
- 2019-05-21 US US17/610,908 patent/US20220216032A1/en not_active Abandoned
- 2019-05-21 JP JP2021519929A patent/JP7108788B2/ja active Active
-
2020
- 2020-04-10 TW TW109112246A patent/TWI748404B/zh active
-
2024
- 2024-07-12 US US18/771,126 patent/US20240363306A1/en active Pending
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