JPWO2020084890A1 - X線分析装置及びx線発生ユニット - Google Patents
X線分析装置及びx線発生ユニット Download PDFInfo
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- 238000010894 electron beam technology Methods 0.000 claims abstract description 33
- 230000003287 optical effect Effects 0.000 claims description 16
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 238000004904 shortening Methods 0.000 abstract description 2
- 210000001736 capillary Anatomy 0.000 description 16
- 238000003384 imaging method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000013507 mapping Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 230000005461 Bremsstrahlung Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
- H01J35/116—Transmissive anodes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/20—Sources of radiation
- G01N2223/204—Sources of radiation source created from radiated target
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/316—Accessories, mechanical or electrical features collimators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/10—Drive means for anode (target) substrate
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
11 電子線制御部
12 エネルギフィルタ
13 ミラー
14 光学系収容部
15 試料収容部
16 X線透過窓
17 ステージ
20 X線検出部
30 撮像部
40 PC
41 制御部
42 演算部
43 表示部
50 X線発生ユニット
51 ターゲット
52 ターゲットプレート
53 駆動部
54 キャピラリプレート
55 フレネルゾーンプレート
S 試料
Claims (5)
- X線発生ユニットを備え、
前記X線発生ユニットは、
電子線源から電子線が照射されてX線を発生するターゲットを有するターゲットプレートと、
前記ターゲットプレートの動きに連動し、前記ターゲットから発生するX線を集光するX線集光素子と、
前記電子線源に対して前記ターゲットプレート又は前記X線集光素子の位置を変える駆動部と、
前記X線発生ユニットで発生したX線が照射される被照射体が載置されるステージと、
前記被照射体から放出される蛍光X線を検出するX線検出部と
を備えるX線分析装置。 - 前記駆動部が前記ターゲットプレートを回転駆動して、前記X線集光素子が集光したX線が、X線の方向に直行する平面上を縦方向及び横方向に走査する請求項1に記載のX線分析装置。
- 前記ターゲットプレートとX線集光素子との間に前記ターゲットから発生するX線を平行化するX線光学素子を備える請求項1又は請求項2に記載のX線分析装置。
- 前記X線集光素子は、フレネルゾーンプレートである請求項1から請求項3のいずれか一項に記載のX線分析装置。
- 電子線源から電子線が照射されてX線を発生するターゲットを有するターゲットプレートと、
前記ターゲットプレートの動きに連動し、前記ターゲットから発生するX線を集光するX線集光素子と、
前記電子線源に対して前記ターゲットプレート又は前記X線集光素子の位置を変える駆動部と
を備えるX線発生ユニット。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2018201221 | 2018-10-25 | ||
JP2018201221 | 2018-10-25 | ||
PCT/JP2019/033399 WO2020084890A1 (ja) | 2018-10-25 | 2019-08-27 | X線分析装置及びx線発生ユニット |
Publications (2)
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JPWO2020084890A1 true JPWO2020084890A1 (ja) | 2021-09-16 |
JP7270637B2 JP7270637B2 (ja) | 2023-05-10 |
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JP2020552563A Active JP7270637B2 (ja) | 2018-10-25 | 2019-08-27 | X線分析装置及びx線発生ユニット |
Country Status (4)
Country | Link |
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US (1) | US11467107B2 (ja) |
JP (1) | JP7270637B2 (ja) |
DE (1) | DE112019005321T5 (ja) |
WO (1) | WO2020084890A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN113764246A (zh) * | 2020-06-03 | 2021-12-07 | 聚束科技(北京)有限公司 | 一种显微镜 |
WO2023145101A1 (ja) | 2022-01-31 | 2023-08-03 | キヤノンアネルバ株式会社 | 検査装置および検査方法 |
Citations (14)
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JPH05273400A (ja) * | 1992-03-25 | 1993-10-22 | Nikon Corp | X線走査装置 |
JPH08247971A (ja) * | 1995-03-13 | 1996-09-27 | Shimadzu Corp | 蛍光x線分析装置 |
JP2002071586A (ja) * | 2000-09-01 | 2002-03-08 | Horiba Ltd | 二次元走査x線分析装置 |
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2019
- 2019-08-27 WO PCT/JP2019/033399 patent/WO2020084890A1/ja active Application Filing
- 2019-08-27 JP JP2020552563A patent/JP7270637B2/ja active Active
- 2019-08-27 DE DE112019005321.3T patent/DE112019005321T5/de active Pending
- 2019-08-27 US US17/287,696 patent/US11467107B2/en active Active
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JPH05273400A (ja) * | 1992-03-25 | 1993-10-22 | Nikon Corp | X線走査装置 |
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Publication number | Publication date |
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DE112019005321T5 (de) | 2021-08-05 |
US11467107B2 (en) | 2022-10-11 |
WO2020084890A1 (ja) | 2020-04-30 |
JP7270637B2 (ja) | 2023-05-10 |
US20210389262A1 (en) | 2021-12-16 |
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