JPWO2020061241A5 - - Google Patents

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Publication number
JPWO2020061241A5
JPWO2020061241A5 JP2021515109A JP2021515109A JPWO2020061241A5 JP WO2020061241 A5 JPWO2020061241 A5 JP WO2020061241A5 JP 2021515109 A JP2021515109 A JP 2021515109A JP 2021515109 A JP2021515109 A JP 2021515109A JP WO2020061241 A5 JPWO2020061241 A5 JP WO2020061241A5
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JP
Japan
Prior art keywords
photomask
detected
defects
defect
charged particle
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JP2021515109A
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English (en)
Japanese (ja)
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JP2022502839A5 (https=
JP7270034B2 (ja
JP2022502839A (ja
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Priority claimed from US16/563,763 external-priority patent/US10866197B2/en
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Publication of JP2022502839A5 publication Critical patent/JP2022502839A5/ja
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JP2021515109A 2018-09-20 2019-09-19 極紫外線フォトマスク上で検出される欠陥の処理 Active JP7270034B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862733961P 2018-09-20 2018-09-20
US62/733,961 2018-09-20
US16/563,763 2019-09-06
US16/563,763 US10866197B2 (en) 2018-09-20 2019-09-06 Dispositioning defects detected on extreme ultraviolet photomasks
PCT/US2019/051805 WO2020061241A1 (en) 2018-09-20 2019-09-19 Dispositioning defects detected on extreme ultraviolet photomasks

Publications (4)

Publication Number Publication Date
JP2022502839A JP2022502839A (ja) 2022-01-11
JPWO2020061241A5 true JPWO2020061241A5 (https=) 2022-09-26
JP2022502839A5 JP2022502839A5 (https=) 2022-09-26
JP7270034B2 JP7270034B2 (ja) 2023-05-09

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JP2021515109A Active JP7270034B2 (ja) 2018-09-20 2019-09-19 極紫外線フォトマスク上で検出される欠陥の処理

Country Status (7)

Country Link
US (1) US10866197B2 (https=)
JP (1) JP7270034B2 (https=)
KR (1) KR102557180B1 (https=)
CN (2) CN112714891A (https=)
IL (1) IL281403B2 (https=)
TW (1) TWI797382B (https=)
WO (1) WO2020061241A1 (https=)

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