JPWO2020005929A5 - - Google Patents

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Publication number
JPWO2020005929A5
JPWO2020005929A5 JP2020572801A JP2020572801A JPWO2020005929A5 JP WO2020005929 A5 JPWO2020005929 A5 JP WO2020005929A5 JP 2020572801 A JP2020572801 A JP 2020572801A JP 2020572801 A JP2020572801 A JP 2020572801A JP WO2020005929 A5 JPWO2020005929 A5 JP WO2020005929A5
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JP
Japan
Prior art keywords
dispensing operation
moving part
piezoelectric device
voltage waveform
needle
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JP2020572801A
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English (en)
Japanese (ja)
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JP2021528242A (ja
JP2021528242A5 (https=
JP7481271B2 (ja
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Priority claimed from PCT/US2019/038968 external-priority patent/WO2020005929A2/en
Publication of JP2021528242A publication Critical patent/JP2021528242A/ja
Publication of JPWO2020005929A5 publication Critical patent/JPWO2020005929A5/ja
Publication of JP2021528242A5 publication Critical patent/JP2021528242A5/ja
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JP2020572801A 2018-06-25 2019-06-25 噴出ディスペンサの位置的制御システム及び方法 Active JP7481271B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862689694P 2018-06-25 2018-06-25
US62/689,694 2018-06-25
PCT/US2019/038968 WO2020005929A2 (en) 2018-06-25 2019-06-25 System and method for jetting dispenser positional control

Publications (4)

Publication Number Publication Date
JP2021528242A JP2021528242A (ja) 2021-10-21
JPWO2020005929A5 true JPWO2020005929A5 (https=) 2022-07-05
JP2021528242A5 JP2021528242A5 (https=) 2022-07-05
JP7481271B2 JP7481271B2 (ja) 2024-05-10

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JP2020572801A Active JP7481271B2 (ja) 2018-06-25 2019-06-25 噴出ディスペンサの位置的制御システム及び方法

Country Status (6)

Country Link
US (1) US12145161B2 (https=)
EP (1) EP3810336A2 (https=)
JP (1) JP7481271B2 (https=)
KR (1) KR102663958B1 (https=)
CN (1) CN112334237B (https=)
WO (1) WO2020005929A2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113811397A (zh) * 2019-05-12 2021-12-17 诺信公司 具有机械放大器的分配系统
WO2021151971A1 (en) 2020-01-28 2021-08-05 Mycronic AB Jetting devices with flexible jetting nozzle
JP7560849B2 (ja) * 2020-06-25 2024-10-03 武蔵エンジニアリング株式会社 液体材料吐出装置
DE102021114302A1 (de) * 2021-06-02 2022-12-08 Vermes Microdispensing GmbH Dosiersystem
TWI837657B (zh) * 2022-05-06 2024-04-01 庫力索法高科股份有限公司 具二段式校正機構的噴射閥
KR20240105606A (ko) 2022-12-28 2024-07-08 주식회사 지엔테크 위치기반 정밀도포 시스템
CN116764903A (zh) * 2023-06-30 2023-09-19 深圳市捷特精密技术有限公司 一种高精密压电喷射阀

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5490015A (en) 1993-03-04 1996-02-06 Olympus Optical Co., Ltd. Actuator apparatus
DE10248214A1 (de) * 2002-10-16 2004-05-13 Siemens Ag Schaltung mit mindestens einem Piezoaktor
US8271141B2 (en) * 2008-06-09 2012-09-18 Ross Operating Valve Company Control valve system with cycle monitoring, diagnostics and degradation prediction
DE102011075732B4 (de) * 2011-05-12 2021-02-11 Vitesco Technologies GmbH Regelverfahren für ein Einspritzventil und Einspritzsystem
US9243626B2 (en) * 2012-11-19 2016-01-26 Nordson Corporation Adhesive dispensing system and method including a pump with integrated diagnostics
JP6412025B2 (ja) * 2013-03-13 2018-10-24 マイクロニック アーベーＭｙｃｒｏｎｉｃ Ａｂ 液滴噴射方法及び液滴噴射装置
DE102013226849B3 (de) * 2013-12-20 2015-04-30 Continental Automotive Gmbh Verfahren zum Betreiben eines Einspritzventils
KR101614312B1 (ko) * 2014-11-18 2016-04-22 주식회사 프로텍 압전 디스펜서 및 압전 디스펜서의 작동 스트로크 보정방법
CN105983506B (zh) * 2015-01-29 2018-05-18 北京派和科技股份有限公司 压电喷射阀及喷射装置
US10022744B2 (en) * 2015-05-22 2018-07-17 Nordson Corporation Piezoelectric jetting system with quick release jetting valve
WO2017040648A1 (en) * 2015-08-31 2017-03-09 Nordson Corporation Automatic piezo stroke adjustment
JP6623846B2 (ja) * 2016-03-03 2019-12-25 セイコーエプソン株式会社 流体噴射装置
WO2017202985A1 (en) * 2016-05-26 2017-11-30 Mycronic AB Method and apparatus for controlling jet dispensing by displacement measurement
CN106583166A (zh) * 2017-01-22 2017-04-26 山东大学 一种压电驱动的喷射式点胶装置

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