JPWO2015056318A1 - 炭化珪素半導体装置 - Google Patents
炭化珪素半導体装置 Download PDFInfo
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- JPWO2015056318A1 JPWO2015056318A1 JP2015542445A JP2015542445A JPWO2015056318A1 JP WO2015056318 A1 JPWO2015056318 A1 JP WO2015056318A1 JP 2015542445 A JP2015542445 A JP 2015542445A JP 2015542445 A JP2015542445 A JP 2015542445A JP WO2015056318 A1 JPWO2015056318 A1 JP WO2015056318A1
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 110
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 108
- 239000004065 semiconductor Substances 0.000 title claims abstract description 101
- 239000010410 layer Substances 0.000 claims description 223
- 239000012535 impurity Substances 0.000 claims description 66
- 239000002344 surface layer Substances 0.000 claims description 45
- 230000015572 biosynthetic process Effects 0.000 claims description 41
- 239000000758 substrate Substances 0.000 claims description 27
- 229910021332 silicide Inorganic materials 0.000 description 23
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 23
- 230000005684 electric field Effects 0.000 description 17
- 238000010586 diagram Methods 0.000 description 11
- 239000011229 interlayer Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 8
- 229910005883 NiSi Inorganic materials 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000004770 chalcogenides Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- -1 zinc halide Chemical class 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 description 1
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Abstract
Description
<構成>
図1は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。図1は特に、炭化珪素半導体装置の電流が流れる領域(活性領域)の2つのユニットセルを示したものである。実際の炭化珪素半導体装置では、図1に示されたユニットセルが横方向に複数繰り返して配置され、並列に接続された構造となっている。また、活性領域の周辺部には終端領域の電界を緩和する構造(終端構造)が設けられているが、ここでは図示が省略されている。
図11〜図15は、実施形態に関する炭化珪素半導体装置の製造工程を示す図である。以下、これらの図を参照しつつ、実施形態に関する炭化珪素半導体装置の製造方法を説明する。
本実施形態によれば、炭化珪素半導体装置が、第1導電型(例えばn型。以下同じ)のエピタキシャル層2と、トレンチ3と、第2導電型(例えばp型。以下同じ)のウェル層4と、第1導電型のソース領域5と、ゲート絶縁膜としてのゲート酸化膜7と、ゲート電極8と、ソース電極12と、ドレイン電極6とを備える。
図2は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。以降では、活性領域の1つのユニットセルが図示された図を用いて説明する。なお、図1に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、ウェル層4の一端が、エピタキシャル層2表層のトレンチ3が形成されていないトレンチ非形成領域に至って形成され、ゲート絶縁膜としてのゲート酸化膜7が、トレンチ非形成領域のウェル層4上においても形成されている。
図3は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図1に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、トレンチ3aの側面が、エピタキシャル層2表面と直交する方向に形成されている。
図4は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図3に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、炭化珪素半導体装置が、第1導電型の表層不純物層13aを備える。表層不純物層13aは、トレンチ非形成領域のウェル層4a表層からエピタキシャル層2表層に至って形成されている。表層不純物層13aは、エピタキシャル層2よりも高い不純物濃度を有する。
図5は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図1に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、ウェル層4の一端が、エピタキシャル層2表層のトレンチ3が形成されていないトレンチ非形成領域に至って形成され、ゲート絶縁膜としてのゲート酸化膜7bが、トレンチ非形成領域のウェル層4上においても形成されている。
図6は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図5に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、炭化珪素半導体装置が、第1導電型の表層不純物層13を備える。表層不純物層13は、トレンチ非形成領域のウェル層4表層からエピタキシャル層2表層に至って形成されている。表層不純物層13は、エピタキシャル層2よりも高い不純物濃度を有する。
図7は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図5に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、ゲート電極8bが、トレンチ非形成領域におけるウェル層4が形成されていないエピタキシャル層2上においては形成されていない。
図8は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図7に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、炭化珪素半導体装置が、第1導電型の表層不純物層13を備える。表層不純物層13は、トレンチ非形成領域のウェル層4表層からエピタキシャル層2表層に至って形成されている。表層不純物層13は、エピタキシャル層2よりも高い不純物濃度を有する。
図9は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図1に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、ウェル層4の一端が、エピタキシャル層2表層のトレンチ3が形成されていないトレンチ非形成領域に至って形成され、ゲート絶縁膜としてのゲート酸化膜7が、トレンチ非形成領域のウェル層4上においても形成されている。
図10は、本発明の本実施形態に関する炭化珪素半導体装置の断面構造を示す図である。なお、図9に示された構成と同様の構成については同様の符号を付し、当該構成についての詳細な説明は省略する。
本実施形態によれば、炭化珪素半導体装置が、第1導電型の表層不純物層13を備える。表層不純物層13は、トレンチ非形成領域のウェル層4表層から上層不純物層14表層に至って形成されている。表層不純物層13は、エピタキシャル層2よりも高い不純物濃度を有する。
本発明の他の態様に関する炭化珪素半導体装置は、第1導電型の炭化珪素半導体基板上に形成された、第1導電型のエピタキシャル層と、前記エピタキシャル層表層に部分的に形成されたトレンチと、前記トレンチの側面および底面に沿って形成された、第2導電型のウェル層と、前記トレンチの底面における前記ウェル層表層に形成された、第1導電型のソース領域と、前記トレンチの側面に沿って形成され、かつ、一端が前記ソース領域に至って形成されたゲート絶縁膜と、前記トレンチの側面に沿って形成され、かつ、前記ゲート絶縁膜上に形成されたゲート電極と、前記ソース領域上に形成されたソース電極と、前記炭化珪素半導体基板裏面に形成されたドレイン電極とを備え、前記ウェル層の一端が、前記エピタキシャル層表層の前記トレンチが形成されていないトレンチ非形成領域に至って形成され、前記ゲート絶縁膜が、前記トレンチ非形成領域の前記ウェル層上においても形成され、前記トレンチの側面および前記トレンチ非形成領域における前記エピタキシャル層上層に形成された、第1導電型の上層不純物層をさらに備え、前記上層不純物層が、前記エピタキシャル層よりも高い不純物濃度を有し、かつ、前記ウェル層よりも厚く形成されていることを特徴とする。
Claims (7)
- 第1導電型の炭化珪素半導体基板上に形成された、第1導電型のエピタキシャル層と、
前記エピタキシャル層表層に部分的に形成されたトレンチと、
前記トレンチの側面および底面に沿って形成された、第2導電型のウェル層と、
前記トレンチの底面における前記ウェル層表層に形成された、第1導電型のソース領域と、
前記トレンチの側面に沿って形成され、かつ、一端が前記ソース領域に至って形成されたゲート絶縁膜と、
前記トレンチの側面に沿って形成され、かつ、前記ゲート絶縁膜上に形成されたゲート電極と、
前記ソース領域上に形成されたソース電極と、
前記炭化珪素半導体基板裏面に形成されたドレイン電極とを備えることを特徴とする、
炭化珪素半導体装置。 - 前記ウェル層の一端が、前記エピタキシャル層表層の前記トレンチが形成されていないトレンチ非形成領域に至って形成され、
前記ゲート絶縁膜が、前記トレンチ非形成領域の前記ウェル層上においても形成され、
前記トレンチ非形成領域の前記ウェル層表層から前記エピタキシャル層表層に至って形成された、第1導電型の表層不純物層をさらに備え、
前記表層不純物層が、前記エピタキシャル層よりも高い不純物濃度を有することを特徴とする、
請求項1に記載の炭化珪素半導体装置。 - 前記ウェル層の一端が、前記エピタキシャル層表層の前記トレンチが形成されていないトレンチ非形成領域に至って形成され、
前記ゲート絶縁膜が、前記トレンチ非形成領域の前記ウェル層上においても形成され、
前記ゲート絶縁膜の厚さが、前記トレンチの側面に沿って形成された部分よりも、前記トレンチ非形成領域の前記ウェル層上に形成された部分のほうが厚いことを特徴とする、
請求項1または2に記載の炭化珪素半導体装置。 - 前記ウェル層の一端が、前記エピタキシャル層表層の前記トレンチが形成されていないトレンチ非形成領域に至って形成され、
前記ゲート絶縁膜が、前記トレンチ非形成領域の前記ウェル層上においても形成され、
前記トレンチの側面および前記トレンチ非形成領域における前記エピタキシャル層上層に形成された、第1導電型の上層不純物層をさらに備え、
前記上層不純物層が、前記エピタキシャル層よりも高い不純物濃度を有し、かつ、前記ウェル層よりも厚く形成されていることを特徴とする、
請求項1または2に記載の炭化珪素半導体装置。 - 前記トレンチの側面が、前記エピタキシャル層表面と直交する方向に形成されていることを特徴とする、
請求項1または2に記載の炭化珪素半導体装置。 - 前記ゲート電極が、前記エピタキシャル層表層の前記トレンチが形成されていないトレンチ非形成領域の前記ウェル層上においても形成されていることを特徴とする、
請求項1または2に記載の炭化珪素半導体装置。 - 前記ゲート電極が、前記エピタキシャル層表層の前記トレンチが形成されていないトレンチ非形成領域における、前記ウェル層が形成されていない前記エピタキシャル層上においては形成されていないことを特徴とする、
請求項1または2に記載の炭化珪素半導体装置。
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