JPWO2014156317A1 - 基板処理装置及び基板処理装置用連結部材 - Google Patents
基板処理装置及び基板処理装置用連結部材 Download PDFInfo
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- JPWO2014156317A1 JPWO2014156317A1 JP2015508145A JP2015508145A JPWO2014156317A1 JP WO2014156317 A1 JPWO2014156317 A1 JP WO2014156317A1 JP 2015508145 A JP2015508145 A JP 2015508145A JP 2015508145 A JP2015508145 A JP 2015508145A JP WO2014156317 A1 JPWO2014156317 A1 JP WO2014156317A1
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- 238000012545 processing Methods 0.000 title claims abstract description 108
- 239000000758 substrate Substances 0.000 title claims abstract description 72
- 238000012546 transfer Methods 0.000 claims abstract description 167
- 239000002184 metal Substances 0.000 claims abstract description 24
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical group O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 16
- 229910001220 stainless steel Inorganic materials 0.000 claims description 11
- 239000010935 stainless steel Substances 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 22
- 238000011109 contamination Methods 0.000 abstract description 5
- 235000012431 wafers Nutrition 0.000 description 39
- 229920005989 resin Polymers 0.000 description 28
- 239000011347 resin Substances 0.000 description 28
- 239000004697 Polyetherimide Substances 0.000 description 25
- 229920001601 polyetherimide Polymers 0.000 description 25
- 239000000463 material Substances 0.000 description 9
- 238000012986 modification Methods 0.000 description 9
- 230000004048 modification Effects 0.000 description 9
- 230000005855 radiation Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 229920006015 heat resistant resin Polymers 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910000669 Chrome steel Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012636 effector Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
- Plasma & Fusion (AREA)
Abstract
Description
11 トランスファモジュール
11a トランスファモジュール筐体部
12 プロセスモジュール
12a 真空チャンバ
14 ロードロックモジュール
16 ゲートバルブ
16a ゲートバルブ筐体部
17 第1搬送装置
27,28 Oリング
29 切り欠き
30,30A,30B,30C,30D 連結部材
31 フレーム部材
31a 主面部
31b 鍔部
31c 側面部
32 球状部材(ジルコニア製ボール)
33 リテーナ
55 板金部材
Claims (12)
- 真空雰囲気に保持されて基板を処理する処理室と、真空雰囲気に保持されて前記処理室に対して基板を搬入出する搬送室と、前記処理室と前記搬送室とを連結する連結部材とを備える基板処理装置であって、
前記連結部材は、
前記処理室の筐体部と前記搬送室の筐体部とに挟持され、前記搬送室内部の真空雰囲気と前記基板処理装置外部の大気雰囲気とを隔離する金属製のフレーム部材と、
金属又はセラミックスからなり、前記フレーム部材の内部に前記フレーム部材の内面と当接するように配置される複数の球状部材とを有することを特徴とする基板処理装置。 - 前記処理室は、常温よりも高温であることを特徴とする請求項1記載の基板処理装置。
- 前記フレーム部材は、板厚が0.5mm〜1mmのステンレス鋼からなることを特徴とする請求項1又は2記載の基板処理装置。
- 前記球状部材は、ジルコニアボール又はステンレスボールであることを特徴とする請求項1乃至3のいずれか1項に記載の基板処理装置。
- 前記フレーム部材において、前記搬送室内部の真空雰囲気に晒される面は鏡面であることを特徴とする請求項1乃至4のいずれか1項に記載の基板処理装置。
- 前記連結部材では、前記球状部材が前記搬送室内部の真空雰囲気に晒されていることを特徴とする請求項1乃至5のいずれか1項に記載の基板処理装置。
- 前記連結部材では、前記球状部材が前記基板処理装置外部の大気雰囲気に晒されていることを特徴とする請求項1乃至5のいずれか1項に記載の基板処理装置。
- 前記連結部材は、前記球状部材を内包するように前記フレーム部材に取り付けられる蓋部材を有し、
前記フレーム部材は、前記球状部材を内包する空間の排気を行うための排気口を有し、
前記球状部材を内包する空間が所定の真空度に維持されることを特徴とする請求項1乃至5のいずれか1項に記載の基板処理装置。 - 前記フレーム部材は、前記処理室及び前記搬送室にボルトによって固定される鍔部を有することを特徴とする請求項1乃至8のいずれか1項に記載の基板処理装置。
- 真空雰囲気に保持されて基板を処理する処理室と、真空雰囲気に保持されて前記処理室に対して基板を搬入出する搬送室とを備える基板処理装置において前記処理室と前記搬送室とを連結する基板処理装置用連結部材であって、
前記処理室の筐体部と前記搬送室の筐体部とに挟持され、前記搬送室内部の真空雰囲気と前記基板処理装置外部の大気雰囲気とを隔離する金属製のフレーム部材と、
前記フレーム部材の内部に前記フレーム部材の内面と当接するように配置される複数の球状部材とを有することを特徴とする基板処理装置用連結部材。 - 前記フレーム部材は、板厚が0.5mm〜1mmのステンレス鋼からなることを特徴とする請求項10記載の基板処理装置用連結部材。
- 前記球状部材は、ジルコニアボール又はステンレスボールであることを特徴とする請求項10又は11記載の基板処理装置用連結部材。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013066104 | 2013-03-27 | ||
JP2013066104 | 2013-03-27 | ||
PCT/JP2014/052815 WO2014156317A1 (ja) | 2013-03-27 | 2014-01-31 | 基板処理装置及び基板処理装置用連結部材 |
Publications (2)
Publication Number | Publication Date |
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JP5947975B2 JP5947975B2 (ja) | 2016-07-06 |
JPWO2014156317A1 true JPWO2014156317A1 (ja) | 2017-02-16 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015508145A Expired - Fee Related JP5947975B2 (ja) | 2013-03-27 | 2014-01-31 | 基板処理装置及び基板処理装置用連結部材 |
Country Status (4)
Country | Link |
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US (1) | US20160035604A1 (ja) |
JP (1) | JP5947975B2 (ja) |
KR (1) | KR20150135290A (ja) |
WO (1) | WO2014156317A1 (ja) |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3043848B2 (ja) * | 1990-07-20 | 2000-05-22 | 東京エレクトロン株式会社 | 処理装置 |
US5338362A (en) * | 1992-08-29 | 1994-08-16 | Tokyo Electron Limited | Apparatus for processing semiconductor wafer comprising continuously rotating wafer table and plural chamber compartments |
US6230501B1 (en) * | 1994-04-14 | 2001-05-15 | Promxd Technology, Inc. | Ergonomic systems and methods providing intelligent adaptive surfaces and temperature control |
US7842599B2 (en) * | 1997-05-27 | 2010-11-30 | Wstp, Llc | Bumping electronic components using transfer substrates |
JP2000306978A (ja) * | 1999-02-15 | 2000-11-02 | Kokusai Electric Co Ltd | 基板処理装置、基板搬送装置、および基板処理方法 |
JP2003203963A (ja) * | 2002-01-08 | 2003-07-18 | Tokyo Electron Ltd | 搬送機構、処理システム及び搬送方法 |
US7323772B2 (en) * | 2002-08-28 | 2008-01-29 | Micron Technology, Inc. | Ball grid array structures and tape-based method of manufacturing same |
FR2874744B1 (fr) * | 2004-08-30 | 2006-11-24 | Cit Alcatel | Interface sous vide entre une boite de mini-environnement et un equipement |
US7845618B2 (en) * | 2006-06-28 | 2010-12-07 | Applied Materials, Inc. | Valve door with ball coupling |
JP4327206B2 (ja) * | 2007-01-30 | 2009-09-09 | 東京エレクトロン株式会社 | 縦型熱処理装置及び縦型熱処理方法 |
JP2010212644A (ja) * | 2009-02-12 | 2010-09-24 | Tokyo Electron Ltd | 蓋体開閉システム、蓋体開閉装置、搬送容器及び蓋体開放方法 |
JP5527075B2 (ja) * | 2010-02-12 | 2014-06-18 | 東京エレクトロン株式会社 | 搬送機構 |
JP2012021556A (ja) * | 2010-07-13 | 2012-02-02 | Iguchi Kiko Seisakusho:Kk | フリーボールベアリングおよびベアリングユニット |
US8921994B2 (en) * | 2012-09-14 | 2014-12-30 | Freescale Semiconductor, Inc. | Thermally enhanced package with lid heat spreader |
-
2014
- 2014-01-31 KR KR1020157026126A patent/KR20150135290A/ko not_active Application Discontinuation
- 2014-01-31 US US14/775,753 patent/US20160035604A1/en not_active Abandoned
- 2014-01-31 WO PCT/JP2014/052815 patent/WO2014156317A1/ja active Application Filing
- 2014-01-31 JP JP2015508145A patent/JP5947975B2/ja not_active Expired - Fee Related
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Publication number | Publication date |
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US20160035604A1 (en) | 2016-02-04 |
KR20150135290A (ko) | 2015-12-02 |
JP5947975B2 (ja) | 2016-07-06 |
WO2014156317A1 (ja) | 2014-10-02 |
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