JPWO2014058011A1 - 殺菌装置 - Google Patents
殺菌装置 Download PDFInfo
- Publication number
- JPWO2014058011A1 JPWO2014058011A1 JP2014540889A JP2014540889A JPWO2014058011A1 JP WO2014058011 A1 JPWO2014058011 A1 JP WO2014058011A1 JP 2014540889 A JP2014540889 A JP 2014540889A JP 2014540889 A JP2014540889 A JP 2014540889A JP WO2014058011 A1 JPWO2014058011 A1 JP WO2014058011A1
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- cylindrical
- cylindrical flow
- channel
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012530 fluid Substances 0.000 claims abstract description 51
- 230000001954 sterilising effect Effects 0.000 claims abstract description 40
- 238000004659 sterilization and disinfection Methods 0.000 claims abstract description 36
- 230000001678 irradiating effect Effects 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 36
- 238000000746 purification Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000005192 partition Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000008213 purified water Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/91—Bacteria; Microorganisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/804—UV light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
- C02F1/003—Processes for the treatment of water whereby the filtration technique is of importance using household-type filters for producing potable water, e.g. pitchers, bottles, faucet mounted devices
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
- C02F2201/006—Cartridges
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3222—Units using UV-light emitting diodes [LED]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3228—Units having reflectors, e.g. coatings, baffles, plates, mirrors
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/328—Having flow diverters (baffles)
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/02—Fluid flow conditions
- C02F2301/026—Spiral, helicoidal, radial
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2307/00—Location of water treatment or water treatment device
- C02F2307/04—Location of water treatment or water treatment device as part of a pitcher or jug
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2307/00—Location of water treatment or water treatment device
- C02F2307/10—Location of water treatment or water treatment device as part of a potable water dispenser, e.g. for use in homes or offices
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Physical Water Treatments (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012225257 | 2012-10-10 | ||
| JP2012225257 | 2012-10-10 | ||
| PCT/JP2013/077588 WO2014058011A1 (fr) | 2012-10-10 | 2013-10-10 | Dispositif de désinfection |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2014058011A1 true JPWO2014058011A1 (ja) | 2016-09-05 |
Family
ID=50477477
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014540889A Pending JPWO2014058011A1 (ja) | 2012-10-10 | 2013-10-10 | 殺菌装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2014058011A1 (fr) |
| WO (1) | WO2014058011A1 (fr) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9938165B2 (en) | 2013-10-28 | 2018-04-10 | The University Of British Columbia | UV-LED collimated radiation photoreactor |
| JP6606703B2 (ja) * | 2015-08-03 | 2019-11-20 | 株式会社アクアバンク | 飲料殺菌ユニット、およびこの飲料殺菌ユニットを備えたウォータサーバ |
| JP6571460B2 (ja) * | 2015-09-07 | 2019-09-04 | 日機装株式会社 | 殺菌装置 |
| CN110104723A (zh) * | 2015-09-25 | 2019-08-09 | 首尔伟傲世有限公司 | 杀菌模块、净水装置及包括净水装置的系统 |
| JP6080937B1 (ja) * | 2015-12-08 | 2017-02-15 | 日機装株式会社 | 流体殺菌装置 |
| JP6188969B1 (ja) * | 2016-01-07 | 2017-08-30 | 三菱電機株式会社 | 紫外線殺菌装置およびそれを用いた空気調和機 |
| US10829394B2 (en) * | 2016-01-19 | 2020-11-10 | The University Of British Columbia | Heat dissipation apparatus and methods for UV-LED photoreactors |
| CN109152854B (zh) * | 2016-05-24 | 2022-02-25 | 昕诺飞控股有限公司 | 消费者设备内的uv模块 |
| JP6698496B2 (ja) * | 2016-10-19 | 2020-05-27 | 日機装株式会社 | 紫外光照射装置 |
| JP6825904B2 (ja) * | 2016-12-28 | 2021-02-03 | オルガノ株式会社 | 採水ディスペンサー、アダプター及び純水製造装置 |
| JP7029892B2 (ja) * | 2017-06-27 | 2022-03-04 | 日機装株式会社 | 流体殺菌装置 |
| JP6963956B2 (ja) * | 2017-09-28 | 2021-11-10 | 株式会社エンプラス | 紫外線殺菌装置および紫外線照射装置 |
| JP2019176985A (ja) * | 2018-03-30 | 2019-10-17 | 旭化成株式会社 | 殺菌装置 |
| JP7136576B2 (ja) * | 2018-03-30 | 2022-09-13 | 旭化成株式会社 | 流体殺菌モジュール及びシート状部材 |
| JP7322614B2 (ja) * | 2019-09-10 | 2023-08-08 | 三菱電機株式会社 | 除菌装置、給湯装置及び食器洗い機 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007502200A (ja) * | 2003-08-04 | 2007-02-08 | アトランティウム レイザーズ リミテッド | 光放射による液体及びガスの直列処理 |
| JP2010264238A (ja) * | 2009-05-18 | 2010-11-25 | Dental Equipment Llc Dba Pelton & Crane | 消毒反応器を備えた歯科用ハンドツール |
-
2013
- 2013-10-10 JP JP2014540889A patent/JPWO2014058011A1/ja active Pending
- 2013-10-10 WO PCT/JP2013/077588 patent/WO2014058011A1/fr active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007502200A (ja) * | 2003-08-04 | 2007-02-08 | アトランティウム レイザーズ リミテッド | 光放射による液体及びガスの直列処理 |
| JP2010264238A (ja) * | 2009-05-18 | 2010-11-25 | Dental Equipment Llc Dba Pelton & Crane | 消毒反応器を備えた歯科用ハンドツール |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014058011A1 (fr) | 2014-04-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161122 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20170606 |