JPWO2007091532A1 - スイッチング素子、書き換え可能な論理集積回路、およびメモリ素子 - Google Patents
スイッチング素子、書き換え可能な論理集積回路、およびメモリ素子 Download PDFInfo
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- JPWO2007091532A1 JPWO2007091532A1 JP2007557835A JP2007557835A JPWO2007091532A1 JP WO2007091532 A1 JPWO2007091532 A1 JP WO2007091532A1 JP 2007557835 A JP2007557835 A JP 2007557835A JP 2007557835 A JP2007557835 A JP 2007557835A JP WO2007091532 A1 JPWO2007091532 A1 JP WO2007091532A1
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- electrode
- switching element
- ion conductive
- conductive layer
- switching
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- 150000002500 ions Chemical class 0.000 claims abstract description 74
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 43
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 26
- 239000010949 copper Substances 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 19
- 229910052802 copper Inorganic materials 0.000 claims description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
- 239000004408 titanium dioxide Substances 0.000 claims description 4
- 230000001376 precipitating effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 74
- 210000004027 cell Anatomy 0.000 description 20
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 230000006870 function Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 9
- 229910001431 copper ion Inorganic materials 0.000 description 9
- 210000001787 dendrite Anatomy 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229910052814 silicon oxide Inorganic materials 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- -1 silver halides Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 3
- 238000000608 laser ablation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052798 chalcogen Inorganic materials 0.000 description 2
- 150000004770 chalcogenides Chemical class 0.000 description 2
- 150000001787 chalcogens Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002226 superionic conductor Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910052946 acanthite Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000010416 ion conductor Substances 0.000 description 1
- 238000007562 laser obscuration time method Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical group [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- IRPLSAGFWHCJIQ-UHFFFAOYSA-N selanylidenecopper Chemical compound [Se]=[Cu] IRPLSAGFWHCJIQ-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 description 1
- 229940056910 silver sulfide Drugs 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/173—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using elementary logic circuits as components
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0007—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
- G11C13/0011—RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/02—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/08—Modifications for protecting switching circuit against overcurrent or overvoltage
- H03K17/081—Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit
- H03K17/0812—Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit by measures taken in the control circuit
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/011—Manufacture or treatment of multistable switching devices
- H10N70/021—Formation of switching materials, e.g. deposition of layers
- H10N70/026—Formation of switching materials, e.g. deposition of layers by physical vapor deposition, e.g. sputtering
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/011—Manufacture or treatment of multistable switching devices
- H10N70/061—Shaping switching materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/24—Multistable switching devices, e.g. memristors based on migration or redistribution of ionic species, e.g. anions, vacancies
- H10N70/245—Multistable switching devices, e.g. memristors based on migration or redistribution of ionic species, e.g. anions, vacancies the species being metal cations, e.g. programmable metallization cells
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
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- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
- H10N70/8416—Electrodes adapted for supplying ionic species
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- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/883—Oxides or nitrides
- H10N70/8833—Binary metal oxides, e.g. TaOx
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
- G11C2013/0071—Write using write potential applied to access device gate
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/10—Resistive cells; Technology aspects
- G11C2213/11—Metal ion trapping, i.e. using memory material including cavities, pores or spaces in form of tunnels or channels wherein metal ions can be trapped but do not react and form an electro-deposit creating filaments or dendrites
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
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- G11C2213/15—Current-voltage curve
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/30—Resistive cell, memory material aspects
- G11C2213/32—Material having simple binary metal oxide structure
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/30—Resistive cell, memory material aspects
- G11C2213/34—Material includes an oxide or a nitride
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/50—Resistive cell structure aspects
- G11C2213/52—Structure characterized by the electrode material, shape, etc.
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/79—Array wherein the access device being a transistor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/30—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
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- Design And Manufacture Of Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
n)材料として用いられており、高プロセス耐性や高信頼性を備え、本発明のスイッチング素子をLSI中へ容易に導入できるという利点がある。
Claims (7)
- 1層以上のイオン伝導層を介して積層された第1電極と第2電極とを有し、前記第2電極、又は、前記第2電極と前記イオン伝導層の間に設けられたイオン供給層から前記イオン伝導層に供給された金属イオンをイオン伝導層中に金属として析出させることによって両電極間を電気的に導通させ、前記析出した金属を前記イオン伝導層に溶解させることによって両電極間の電気的導通を解除するスイッチング素子であって、前記イオン伝導層が酸化チタンを含むスイッチング素子。
- 酸化チタンが2酸化1チタンの化学量論的組成を有する請求項1記載のスイッチング素子。
- 第2電極の材料が銅であり、第1電極の材料が前記イオン伝導層に金属イオンを供給しない材料である請求項1又は請求項2記載のスイッチング素子。
- 第1電極と第2電極との間に電圧が印加された際に、両電極間に流れる電流を制限するための回路を有する請求項1乃至請求項3のいずれかに記載のスイッチング素子。
- ロジックセル間の接続・非接続を切り替えるスイッチとして、請求項1乃至請求項4のいずれかに記載のスイッチング素子を用いた書き換え可能な論理集積回路。
- 請求項1乃至請求項4のいずれかに記載のスイッチング素子と、該スイッチング素子がオン状態またはオフ状態のいずれの状態であるかを検出するためのトランジスタ素子と、を有するメモリ素子。
- スイッチング素子の第1電極がトランジスタ素子のドレインに、第2電極がビット線にそれぞれ接続され、前記トランジスタ素子のソースが前記ビット線とは異なる他のビット線に、ゲートがワード線にそれぞれ接続されている請求項6記載のメモリ素子。
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JP2007557835A JP5417709B2 (ja) | 2006-02-09 | 2007-02-06 | スイッチング素子、書き換え可能な論理集積回路、およびメモリ素子 |
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JP2007557835A JP5417709B2 (ja) | 2006-02-09 | 2007-02-06 | スイッチング素子、書き換え可能な論理集積回路、およびメモリ素子 |
PCT/JP2007/051960 WO2007091532A1 (ja) | 2006-02-09 | 2007-02-06 | スイッチング素子、書き換え可能な論理集積回路、およびメモリ素子 |
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JPWO2007091532A1 true JPWO2007091532A1 (ja) | 2009-07-02 |
JP5417709B2 JP5417709B2 (ja) | 2014-02-19 |
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US (1) | US8035096B2 (ja) |
EP (1) | EP1986246B1 (ja) |
JP (1) | JP5417709B2 (ja) |
CN (1) | CN101385154B (ja) |
WO (1) | WO2007091532A1 (ja) |
Cited By (1)
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CN109888094A (zh) * | 2019-03-06 | 2019-06-14 | 天津理工大学 | 一种基于掺杂型氧化钛的选通管器件及其制备方法 |
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JP5194640B2 (ja) * | 2007-08-22 | 2013-05-08 | ソニー株式会社 | 記憶素子および記憶装置 |
US7977722B2 (en) * | 2008-05-20 | 2011-07-12 | Seagate Technology Llc | Non-volatile memory with programmable capacitance |
WO2010079816A1 (ja) * | 2009-01-09 | 2010-07-15 | 日本電気株式会社 | 半導体装置及びその製造方法 |
US9401472B1 (en) * | 2010-09-23 | 2016-07-26 | Adesto Technologies Corporation | Programmable impedance elements and devices that include such elements |
FR2998708B1 (fr) * | 2012-11-27 | 2016-01-01 | Commissariat Energie Atomique | Dispositif electronique de type memoire |
CN103855164A (zh) * | 2012-12-07 | 2014-06-11 | 旺宏电子股份有限公司 | 半导体装置及其制造方法与操作方法 |
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JPH0628841A (ja) | 1992-07-08 | 1994-02-04 | Makoto Yano | 化学反応を利用した記憶素子 |
US5761115A (en) | 1996-05-30 | 1998-06-02 | Axon Technologies Corporation | Programmable metallization cell structure and method of making same |
JP2001525606A (ja) * | 1997-12-04 | 2001-12-11 | アクソン テクノロジーズ コーポレイション | プログラム可能なサブサーフェス集合メタライゼーション構造およびその作製方法 |
CA2362283A1 (en) * | 1999-02-11 | 2000-08-17 | Arizona Board Of Regents | Programmable microelectronic devices and methods of forming and programming same |
EP1434232B1 (en) * | 2001-08-13 | 2007-09-19 | Advanced Micro Devices, Inc. | Memory cell |
JP3593582B2 (ja) | 2001-09-19 | 2004-11-24 | 彰 土井 | 銀イオン含有イオン伝導体の電界誘導黒化現象を利用した記憶素子 |
WO2003028124A1 (fr) | 2001-09-25 | 2003-04-03 | Japan Science And Technology Agency | Dispositif electrique comprenant un electrolyte solide |
EP1501124B1 (en) * | 2002-04-30 | 2011-06-08 | Japan Science and Technology Agency | Solid electrolyte switching devices, fpga and memory devices using the same, and method of manufacturing the same |
US6972427B2 (en) * | 2004-04-29 | 2005-12-06 | Infineon Technologies Ag | Switching device for reconfigurable interconnect and method for making the same |
DE102004024610B3 (de) * | 2004-05-18 | 2005-12-29 | Infineon Technologies Ag | Festkörperelektrolytschaltelement |
DE102004026003B3 (de) * | 2004-05-27 | 2006-01-19 | Infineon Technologies Ag | Resistive Speicherzellen-Anordnung |
JP5066918B2 (ja) * | 2004-12-28 | 2012-11-07 | 日本電気株式会社 | スイッチング素子、書き換え可能な論理集積回路、およびメモリ素子 |
US20070007579A1 (en) * | 2005-07-11 | 2007-01-11 | Matrix Semiconductor, Inc. | Memory cell comprising a thin film three-terminal switching device having a metal source and /or drain region |
-
2007
- 2007-02-06 WO PCT/JP2007/051960 patent/WO2007091532A1/ja active Application Filing
- 2007-02-06 EP EP07708078.6A patent/EP1986246B1/en not_active Expired - Fee Related
- 2007-02-06 US US12/278,611 patent/US8035096B2/en active Active
- 2007-02-06 CN CN2007800050615A patent/CN101385154B/zh not_active Expired - Fee Related
- 2007-02-06 JP JP2007557835A patent/JP5417709B2/ja active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109888094A (zh) * | 2019-03-06 | 2019-06-14 | 天津理工大学 | 一种基于掺杂型氧化钛的选通管器件及其制备方法 |
Also Published As
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US20090034318A1 (en) | 2009-02-05 |
US8035096B2 (en) | 2011-10-11 |
JP5417709B2 (ja) | 2014-02-19 |
CN101385154A (zh) | 2009-03-11 |
WO2007091532A1 (ja) | 2007-08-16 |
EP1986246B1 (en) | 2013-10-09 |
EP1986246A4 (en) | 2011-07-13 |
CN101385154B (zh) | 2010-06-23 |
EP1986246A1 (en) | 2008-10-29 |
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