JPWO2006067836A1 - Deposition mask and mask assembly jig - Google Patents

Abstract

Provided is a film-forming mask that is capable of cleaning and removing a deposition film without damaging the mask base material and having excellent cleaning workability. The film formation mask 11 of the present invention covers a mask body 2 in which an opening 20 that is disposed facing the film formation surface of the substrate W and restricts the film formation area is formed, and a predetermined area on the surface of the mask body 2. The cover member 3 includes a plurality of cover division pieces 3 </ b> A to 3 </ b> C that are detachably attached to the mask main body 2. By covering a predetermined region on the surface of the mask body 2 with the cover member 3, adhesion of the deposition film to the mask body 2 is suppressed, and damage to the mask base material during mask cleaning is prevented. Removal of the deposition film adhering to the cover member 3 is performed in a state of being divided into individual cover division pieces 3A to 3C, so that the cleaning operation can be simplified and the mask can be easily increased in size. become.

Description

  The present invention relates to a film formation mask that is used in a film formation apparatus such as a sputtering apparatus and restricts a film formation region by being opposed to a film formation surface of a substrate, and more specifically, has excellent quality and durability, The present invention relates to a film forming mask that can cope with an increase in size of the mask and an assembly jig for the mask.

  Conventionally, in a film forming process of a semiconductor substrate, a glass substrate, or the like, as shown in FIGS. 9A and 9B, a film forming mask M in which an opening P for limiting a film forming region on the substrate W is formed has been widely used. It is used. As the film formation mask M, for example, a metal single layer mask such as aluminum, titanium, stainless steel or the like is used.

  Since this type of mask is used so as to face the substrate film formation surface so that a part of the substrate surface is not formed, the film forming material adheres to the mask surface during film formation. Conventionally, used masks have been reused after the deposited film-forming material (deposition film) has been removed by chemical etching.

  In Patent Document 1 below, a frame-shaped mask body is formed by arranging a plurality of mask bodies in a ring shape, and the position of each mask body can be independently changed with respect to the substrate. A configuration is disclosed.

Japanese Patent Laid-Open No. 10-60624

  As described above, in the past, the deposition film attached to the deposition mask was removed by chemical etching, so the damage to the mask itself was great, and the mask quality (accuracy) was deteriorated or the durability was degraded. It was.

  In addition, when the deposition film is an aluminum alloy, the mask is washed with, for example, an alkaline etching solution. However, if the mask is made of aluminum, the mask base material is inevitably damaged. It was uneconomical.

  On the other hand, there has been a problem that the cleaning operation becomes difficult as the mask becomes larger, such as a mask for forming a display substrate. In particular, when an aluminum mask cannot be used due to the film-forming material, a large-scale mask will be composed of another metal mask such as titanium or stainless steel. In this case, handling becomes worse due to the increased weight of the mask. In addition, there is a problem that it becomes expensive.

  In the configuration disclosed in Patent Document 1, since the mask is divided into a plurality of mask bodies, the cleaning workability and the like are superior to those of a single-structured mask. However, since the deposition film adheres directly to these individual mask bodies, the mask is damaged by repeated cleaning, and there is a limitation on the mask constituent material in relation to the film forming material. In this respect, it has the same problem as described above.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a film-formation mask capable of cleaning and removing a deposition film without damaging the mask base material and having excellent cleaning workability. .

  In solving the above-described problems, the film formation mask of the present invention includes a mask body that is disposed opposite to the film formation surface of the substrate and has an opening that restricts the film formation area, and a predetermined area on the surface of the mask body. The cover member is configured by an assembly of a plurality of divided cover pieces that are detachably attached to the mask main body.

  By covering a predetermined area on the surface of the mask body with a cover member, adhesion of the deposition film to the mask body is suppressed. As a result, damage to the mask base material during mask cleaning can be prevented, and mask accuracy can be degraded and durability can be improved. For each cover split piece constituting the cover member, for example, a punched material or the like can be used, and it can be manufactured inexpensively and simply.

  Removal of the deposition film adhering to the cover member can be performed in a state where the cover member is divided into individual cover division pieces, so that the cleaning operation is simplified and the mask can be easily increased in size. It becomes like this.

  For example, a screw or a member such as a bolt and a nut can be used to attach the cover split piece to the mask body. In this case, since the deposition film adheres to the front surface side of the cover split piece, the holding work (for example, a nut) that holds the mounting state of the cover split piece is arranged on the back side of the mask body, so that the detachment work is easy. Become.

  The cover member is attached to a region where the film forming material is relatively easily attached, and specifically, is attached to at least the peripheral region of the opening of the mask body. In this case, each of the cover divided pieces attached to the peripheral area of the opening is attached to be inclined toward the film formation surface of the substrate, or the thickness of the end facing the opening is gradually reduced. By forming the mask, the mask accuracy can be improved.

  In addition, from the viewpoint of mask accuracy, it is necessary to improve the mounting accuracy and alignment accuracy of the cover split pieces in the peripheral area of the opening, but in order to ensure the mounting workability and assembly accuracy of these cover split pieces, Each of the pieces may be integrated in units of sides of the opening.

  In the film-formation mask having the above-described configuration, the cover member is attached to the mask main body through a mask installation portion in which the mask main body is installed, and a cover that passes through the opening of the mask main body and is attached to the peripheral region of the opening. It is possible to use a mask mounting jig that includes a positioning convex portion that abuts the end portion of the split piece and positions the cover split piece with respect to the opening, thereby enabling easy and high-precision mask assembly. .

  As described above, according to the film forming mask of the present invention, the mask main body and the cover member formed of an aggregate of a plurality of cover division pieces covering a predetermined surface area of the mask main body are provided. Therefore, it is only necessary to clean and remove the deposition film only on the cover member, whereby the mask body can be protected, and the mask accuracy can be maintained and the durability can be improved.

  In addition, since the cover member is configured as an assembly of a plurality of cover division pieces, the cleaning and removal of the deposition film can be performed in units of the cover division pieces, eliminating the need for cleaning equipment for large masks and simplifying the cleaning process. Can be achieved.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the structure of the film-forming mask 11 by the 1st Embodiment of this invention, A is a top view, B is the [B]-[B] line direction sectional drawing in A. FIG. While it is a principal part sectional drawing which shows the attachment form of the cover member 3 with respect to the mask main body 2, the various structural examples of the peripheral area | region of the opening part 20 are shown. It is a figure which shows the structure of the film-forming mask 12 by the 2nd Embodiment of this invention, A is a top view, B is the [B]-[B] line direction sectional drawing in A. FIG. It is a figure which shows the structure of the film-forming mask 13 by the 3rd Embodiment of this invention, A is a top view, B is the [B]-[B] line direction sectional drawing in A. FIG. It is principal part sectional drawing which shows the 5th Embodiment of this invention. It is principal part sectional drawing which shows the modification of the structure of FIG. 3 is a plan view showing a schematic configuration of a mask assembly jig 40. FIG. 5 is a side sectional view for explaining a mask assembly process using the mask assembly jig 40. FIG. It is a figure which shows the structure of the conventional film-forming mask M, A is a top view, B is the [B]-[B] line direction sectional drawing in A. FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 2 Mask main body 3 Cover member 3A, 3B, 3C Cover division | segmentation piece 5 Attaching tool 6 Shaft member 7 Holding member 10 Recess 11, 12, 13 Film-forming mask 20 Opening part 21 Opening peripheral part of mask main body 31 Cover division | segmentation piece 32 on the side facing the opening part 32 engaging convex part 33 engaging concave part 34 raised part 35 inclined part 40 mask assembly jig 41 mask installation part 42 positioning convex part 43 annular concave part W substrate

  Embodiments of the present invention will be described below with reference to the drawings.

(First embodiment)
FIG. 1 is a schematic configuration diagram of a film formation mask 11 according to a first embodiment of the present invention, where A is a plan view and B is a cross-sectional view. The film formation mask 11 has a two-layer structure of a mask body 2 and a cover member 3 that covers the entire surface of the mask body 2.

  The mask body 2 is made of, for example, a metal material such as aluminum, titanium, or stainless steel, and a rectangular opening 20 is formed at a substantially central portion thereof. The mask body 2 is disposed to face the upper surface (film formation surface) of the substrate W, and the opening 20 limits the film formation region of the substrate W.

Here, the peripheral portion 21 of the opening 20 of the mask body 2 is a tapered surface, and is formed so that the thickness (height) gradually decreases. Thereby, the influence which it has on the film-forming of the peripheral part of the opening part 20 can be made small, and high film-forming precision can be ensured.
In addition, the shape of the peripheral part 21 is not restricted to a taper shape, It is good also as a step shape as shown in FIG. 5 or FIG. 6 mentioned later.

The cover member 3 is composed of an assembly of a plurality of cover division pieces 3A, 3B, 3C,. Among these cover divided pieces, 3A is a square-shaped divided piece attached to the peripheral portion 21 of the opening 20 of the mask main body 2, and 3B is a square-shaped divided piece attached to the flat portion of the surface of the mask main body 2. is there. 3C is attached to the four corner positions of the opening 20 of the mask body 2, and is formed by bending a pair of right-angled isosceles triangular division pieces or quadrangular division pieces by a predetermined angle at diagonal positions.
In addition, the cover division | segmentation piece 3A attached to this opening part peripheral part 21 is shaded in the figure.

  Each of the cover division pieces 3 </ b> A is attached to the tapered peripheral edge 21 of the opening 20 of the mask body 2, so that the cover division pieces 3 </ b> A are inclined toward the film formation surface of the substrate W. Further, the end portion 31 on the side facing the opening 20 of the cover split piece 3A is formed in a tapered shape, for example, so that the thickness thereof gradually decreases.

Each of the cover division pieces 3A, 3B, 3C constituting the cover member 3 can be applied to a metal plate such as aluminum, titanium, stainless steel, nickel, as well as a ceramic plate, a plastic plate, etc. It is appropriately selected according to other film forming conditions.
For example, when an aluminum alloy film is formed, an aluminum cover member (cover divided piece) is used. Similarly, when a chromium film is formed, a titanium cover member, molybdenum or tungsten is formed. A cover member made of a nickel alloy can be applied to.
In addition, as for each cover division | segmentation piece which comprises the cover member 3, the thing of a different material may be combined as well as the thing of the same material is used.

Here, the cover member 3 is preferably formed of a material having a thermal expansion coefficient closer to that of the film forming material than the mask body 2. This is because the deposition film is difficult to peel off from the cover member 3, and the generation of particles during film formation can be suppressed, and at the same time, the maintenance cycle can be prolonged.
For the same reason, the cover member 3 is preferably formed of a material having better adhesion to the film forming material than the mask body 2. In order to improve adhesion, it is also effective to roughen the surface of the cover member 3 by, for example, blasting, or to form a concavo-convex shape provided with raised portions 34 as shown in FIG.

The size of the cover division pieces 3A to 3C varies depending on the number of divisions of the cover member 3, but is divided into, for example, a size of 5 cm to 50 cm on a side. Further, the thickness of the cover division pieces 3A to 3C is not particularly limited, and is, for example, about 0.3 mm.
The shape, size, and thickness of the cover divided pieces 3A to 3C are not limited to being uniform, and the cover member 3 may be formed as an aggregate of cover divided pieces having different shapes and sizes.

  The cover member 3 is detachably attached to the mask body 2. FIG. 2A is a cross-sectional view of a main part for explaining the attachment form of the mask main body 2 and the cover member 3 (cover divided pieces 3A to 3C).

The cover division pieces 3 </ b> A to 3 </ b> C (only 3 </ b> A and 3 </ b> B are shown in the drawing) are respectively attached to the surface of the mask main body 2 with the fixture 5, whereby the cover member 3 is formed on the surface of the mask main body 2. .
The fixture 5 is a bolt-shaped shaft member 6 that penetrates the cover divided pieces 3 </ b> A to 3 </ b> C and the mask main body 2 and has a screw thread formed in the shaft portion, and is screwed into the shaft portion of the shaft member 6 to the mask body 2. It is comprised with the nut-shaped holding member 7 which hold | maintains the mounting state of cover division | segmentation piece 3A-3C. These attachments 5 are attached at one place to four places or more per cover division piece, and the number of attachment parts 5 is determined by the size of the cover division piece.

  It should be noted that screw loosening prevention parts such as washers and spring washers may be appropriately interposed. Further, by forming a hole through which the shaft member 6 penetrates in either one of the mask body 2 and the cover split pieces 3A to 3B, the variation in the mounting accuracy due to the processing accuracy of the cover split pieces is reduced. Or the relative position of the cover split piece with respect to the mask main body can be changed.

  Here, the holding member 7 of the fixture 5 is disposed in a recess 10 that is appropriately formed on the back side of the mask body 2. Thereby, it becomes possible to easily remove the cover split pieces 3A to 3C having the deposition film attached to the surface from the mask body 2 and to ensure workability.

  As shown in FIG. 2A, the end portion 31 of the cover split piece 3 </ b> A attached to the opening peripheral portion 21 of the mask body 2 is aligned with the end portion of the opening peripheral portion 21 of the mask body 2. . The cover division piece 3A covers the peripheral edge 21 of the opening of the mask body 2 and at the same time, the end 31 is in contact with or close to the film formation surface of the substrate W to partition the film formation region and the non-film formation region. A mask boundary 20P to be formed is formed. Since the end portion 31 of the cover split piece 3A is formed in a tapered shape with a gradually decreasing thickness as described above, high film formation accuracy at the mask boundary portion 20P can be maintained.

As described above, the cover split piece 3A attached to the opening peripheral portion 21 of the mask main body 2 forms the mask boundary portion 20P. Therefore, the opening peripheral portion 21 of the mask main body 2 is shown in FIGS. It can also be configured as follows.
The configuration example of FIG. 2B shows an example in which the opening 20 side end portion of the cover division piece 3A protrudes inward (opening 20) side from the opening peripheral edge portion 21 of the mask main body 2.
In the configuration example of FIG. 2C, the opening peripheral edge portion 21 of the mask body 2 is not made thin, and the end portion on the opening 20 side of the cover dividing piece 3A attached thereto is directed toward the film formation surface of the substrate W. In this example, the mask opening 20P is formed by being bent so as to be inclined.

The film formation mask 11 of the present embodiment configured as described above is used in a state where a plurality of cover division pieces 3 </ b> A to 3 </ b> C are attached to the entire surface of the mask body 2. Then, the mask 11 is disposed opposite to the film formation surface of the substrate W installed in the film formation chamber such as a sputtering chamber, and the film formation process of the substrate W is performed through the mask 11. Thereby, a thin film made of a predetermined film forming material is formed on the film forming region of the substrate W exposed through the opening 20 of the mask main body 2.
The mask 11 may be directly placed on the film formation surface of the substrate W, or may be placed on a mask support (not shown) separately provided around the substrate W.

  In the cleaning process of the mask 11, the cover divided pieces 3 </ b> A to 3 </ b> C are all removed from the mask body 2 after the mask 11 is taken out from the film forming chamber. Here, since the holding member 7 of the fixture 5 is disposed on the back side of the mask main body 2, the cover split pieces 3 </ b> A to 3 </ b> C can be easily detached from the mask main body 2 regardless of the deposition amount of the deposition film. .

  According to the present embodiment, the entire surface of the mask body 2 is covered with the cover member 3 that is an aggregate of a plurality of cover division pieces 3A, 3B, and 3C. It is possible to prevent the deposition film from adhering directly, and the mask body 2 can be cleaned or unnecessary. As a result, damage to the mask main body 2 can be suppressed and the life can be extended, and mask accuracy (opening shape) can be maintained and durability can be improved.

  Moreover, according to this Embodiment, the constituent material of the mask main body 2 can be selected irrespective of the film-forming material. For example, even when the mask body 2 is made of a lightweight aluminum-based alloy, the cover member 3 can be attached to be used for an aluminum metal film forming process.

  In this case, when an aluminum plate is used as the cover member 3, the cover member 3 is separated into individual cover divided pieces 3 </ b> A to 3 </ b> C and can be used as recycled material as Al scrap. Further, when a stainless steel plate is used as the cover member 3, it is separated into individual cover division pieces 3A to 3C, and the Al deposition film is washed and removed with an alkaline solution or the like and then reused. be able to.

  Furthermore, according to the present embodiment, since the cover member 3 is configured as an assembly of the plurality of cover division pieces 3A to 3C, the cleaning process of the cover member 3 can be performed in units of individual division pieces. As a result, the cleaning equipment can be simplified and the cleaning cost can be reduced by reducing the size of the cleaning tank and reducing the cleaning liquid.

(Second Embodiment)
3A and 3B show a second embodiment of the present invention. In the figure, portions corresponding to those of the first embodiment described above are denoted by the same reference numerals, and detailed description thereof is omitted.

  The film-forming mask 12 of the present embodiment is composed of a mask body 2 and a cover member 3, and the cover member 3 is composed of an assembly of a plurality of cover division pieces 3 </ b> A to 3 </ b> C as described above. The configuration is the same as that of the first embodiment. However, in the present embodiment, the area of the surface of the mask main body 2 covered with the cover member 3 is different from that of the first embodiment.

  That is, in the film forming mask 12 of the present embodiment, the cover member 3 is installed in a portion where the deposition amount of the deposition film is relatively large. More specifically, when the deposition amount of the deposition film is larger in the inner peripheral portion including the peripheral edge of the opening 20 than in the outer peripheral portion of the mask body 2, the mask including the peripheral edge of the opening 20. The cover member 3 having the above-described configuration is installed only on the inner peripheral portion of the main body 2.

  According to the present embodiment, since the number of cover dividing pieces 3A to 3C can be reduced by the amount of the covering area by the cover member 3, the number of attaching and removing operations of the cover member 3 can be reduced, and the production can be reduced. It becomes possible to improve the performance.

(Third embodiment)
4A and 4B show a third embodiment of the present invention. In the figure, portions corresponding to those of the first embodiment described above are denoted by the same reference numerals, and detailed description thereof is omitted.

  The film formation mask 13 of the present embodiment includes a mask main body 2 and a cover member 3 that covers the entire surface thereof, and the cover member 3 is configured by an assembly of a plurality of cover division pieces 3A to 3C. In this respect, it has the same configuration as that of the first embodiment described above. However, in the present embodiment, among the cover divided pieces forming the cover member 3, each of the cover divided pieces 3 </ b> A attached to the peripheral edge 21 of the opening of the mask body 2 is integrated in units of sides of the opening 20. This is different from the first embodiment described above.

  As described above, the opening-side end portion 31 of the cover split piece 3A forms the mask boundary portion 20P that partitions the film formation region of the substrate W. However, if each of the cover division pieces 3A is individually independent, the positional accuracy of the mask boundary portion 20P is likely to vary due to the accuracy of attachment to the mask body 2.

  Therefore, in the present embodiment, the cover divided pieces 3A are integrated in units of one side of the opening 20 in accordance with the opening shape of the opening 20, so that the mounting accuracy with respect to the mask body 2 is reduced.

  According to the present embodiment, it is possible to improve the positional accuracy of the mask boundary portion 20P by the cover member 3, and it is possible to increase the mask accuracy. In addition, it is possible to reduce the man-hours for attaching and removing the cover split piece 3A to the peripheral edge portion 21 of the opening, thereby improving workability.

(Fourth embodiment)
In each of the above-described embodiments, the plurality of cover division pieces 3 </ b> A to 3 </ b> C forming the cover member 3 are arranged on the surface of the mask body 2 without any gaps, thereby preventing deposition film from adhering to the mask body 2. It was. However, it may be difficult to arrange them without a gap due to the processing accuracy of the cover divided pieces.

  Therefore, in the present embodiment, as shown in FIG. 5, an engagement convex portion 32 and an engagement concave portion 33 in which adjacent divided pieces engage with each other are provided at the side end portions of the cover divided pieces 3A and 3B, respectively. These divided pieces are partially overlapped to cover the mask body 2. The engagement convex portion 32 and the engagement concave portion 33 constitute the “overlap portion” of the present invention, and the amount of engagement is not particularly limited, and the engagement convex portion 32 and the engagement concave portion 33 can be mounted on the mask main body 2 with a relatively high degree of play. May be.

  Thus, according to the present embodiment, it becomes possible to cover the predetermined area of the mask body 2 without any gap without being affected by the processing accuracy or dimensional accuracy of the cover split pieces 3A and 3B. 2 can be protected, the mounting accuracy of each divided piece can be relaxed, and workability can be improved.

  Further, in the embodiment in which the raised portion 34 is formed on at least a part of the surface of the cover divided piece to make it difficult to peel the deposited film deposited and reduce the generation factor of the particles, the gap formed by the overlap portion The function of making the surface of the cover member 3 uneven is obtained by G1 and G2, like the raised portion. Thereby, according to this Embodiment, compared with single formation of the protruding part 34, the film thickness quantity which can prevent peeling of a deposition film can be enlarged, and a maintenance cycle can be lengthened now.

  With the same concept, for example, as shown in FIG. 6, the same effect as described above can be obtained even if the overlap portion of the cover split pieces 3 </ b> A and 3 </ b> B is configured by the inclined portion 35. The overlapping amount of the cover divided pieces 3A and 3B can be adjusted as appropriate depending on the forming angle of the inclined portion 35, the plate thickness of the cover divided pieces, the arrangement interval, and the like. Further, the inclined portion 35 is not limited to the tapered shape shown in the figure, and may be a stepped shape.

(Fifth embodiment)
As described above, the cover division piece 3 </ b> A attached to the peripheral region of the opening 20 of the mask body 2 forms the mask boundary 20 </ b> P that partitions the film formation region of the substrate W. The mask boundary portion 20P is directly connected to the mask accuracy of the film forming mask, and greatly depends on the mounting accuracy of the cover division piece 3A with respect to the mask main body 2. Therefore, in the present embodiment, the cover division piece 3A is assembled to the mask body 2 with high accuracy using the mask assembly jig 40 shown in FIGS.

  The mask assembly jig 40 includes a mask installation portion 41 on which the mask main body 2 is installed, a positioning projection 42 formed on the inner side of the mask installation portion 41, the mask installation portion 41 and the positioning projection 42. And an annular recess 43 formed therebetween.

  The mask installation part 41 has substantially the same outer shape as the mask main body 2. The mask installation portion 41 may be provided with a positioning mechanism (not shown) that maintains a relative positional relationship with the mask main body 2.

  The positioning convex portion 42 has a height that penetrates the opening 20 of the mask main body 2 when the mask main body 2 is installed on the mask installation portion 41, and the planar shape thereof corresponds to the film formation region of the substrate W. Match. Then, when attaching the cover split piece 3A to the peripheral edge region of the opening of the mask main body 2 installed in the mask installation portion 41, the end of the cover split piece 3A is brought into contact with the side peripheral portion of the positioning convex portion 42, Positioning with respect to the mask body 2 is performed.

  By assembling the film forming mask of the present invention using the mask assembling jig 40 configured as described above, it is possible to ensure the desired mounting accuracy of the cover split piece 3A attached to the peripheral area of the opening. And a high-quality mask can be easily manufactured.

  As mentioned above, although each embodiment of this invention was described, of course, this invention is not limited to these, A various deformation | transformation is possible based on the technical idea of this invention.

  For example, in the above embodiment, the shape of the opening 20 of the mask main body 2 is a square shape. However, the shape is not limited to this, and may have another geometric shape. Moreover, the opening part 20 is not restricted to single, and two or more may be formed.

  Further, the film formation chamber is not limited to the sputtering chamber, and other film formation apparatuses such as a CVD apparatus can be applied. The present invention can also be applied to other uses other than film formation that requires a mask, for example, vacuum processing such as ion implantation and dry etching.

Furthermore, in the above embodiment, the fixture 5 is used for mounting the cover split pieces 3A to 3C to the mask body 2, but the configuration of this fixture can be variously changed. In addition, a magnet or the like can be used for an integrated mechanism of the mask body and the cover split piece as long as the vacuum processing such as film formation is not affected.

Claims (12)

A mask body disposed opposite to the film formation surface of the substrate and having an opening for limiting the film formation region;
A cover member covering a predetermined area of the surface of the mask body,
The film forming mask according to claim 1, wherein the cover member is an aggregate of a plurality of cover division pieces that are detachably attached to the mask main body.   The film-forming mask according to claim 1, wherein a holding member that holds the mounting state of the cover divided pieces with respect to the mask main body is disposed on the back side of the mask main body.   The film-forming mask according to claim 1, wherein the cover member is attached at least to a peripheral region of the opening of the mask body.   2. The film formation mask according to claim 1, wherein each of the cover division pieces attached to the peripheral region of the opening is attached to be inclined toward the film formation surface of the substrate.   2. The component according to claim 1, wherein each of the cover divided pieces attached to the peripheral region of the opening is formed so that the thickness of the end facing the opening is gradually reduced. Mask for membrane.   2. The film forming mask according to claim 1, wherein the peripheral edge region of the opening of the mask body is formed so that the thickness gradually decreases.   Each of the cover division pieces attached to the peripheral area of the opening portion has an end portion facing the opening portion protruding inward from the opening peripheral edge of the mask body. The film-forming mask described in 1.   2. The film formation mask according to claim 1, wherein each of the cover division pieces attached to the peripheral area of the opening is integrated in units of sides of the opening.   2. The film formation mask according to claim 1, wherein each of the cover divided pieces has an overlap portion where adjacent cover divided pieces overlap each other.   The film-forming mask according to claim 1, wherein the cover member is formed of a material having a thermal expansion coefficient closer to that of the film-forming material than the mask body.   The film-forming mask according to claim 1, wherein the cover member is formed of a material having better adhesion to the film-forming material than the mask body. A set of a plurality of cover division pieces covering at least the peripheral region of the opening on the surface of the mask body, with respect to the mask body that is disposed opposite the film formation surface of the substrate and has an opening that restricts the film formation area. A mask assembly jig for attaching a cover member made of a body,
A mask installation part in which the mask body is installed;
A positioning projection that penetrates through the opening of the mask body and abuts against an end of a cover split piece attached to a peripheral area of the opening and positions the cover split piece with respect to the opening; Characteristic mask assembly jig.

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