JPWO2004108283A1 - 光触媒部材 - Google Patents
光触媒部材 Download PDFInfo
- Publication number
- JPWO2004108283A1 JPWO2004108283A1 JP2005506824A JP2005506824A JPWO2004108283A1 JP WO2004108283 A1 JPWO2004108283 A1 JP WO2004108283A1 JP 2005506824 A JP2005506824 A JP 2005506824A JP 2005506824 A JP2005506824 A JP 2005506824A JP WO2004108283 A1 JPWO2004108283 A1 JP WO2004108283A1
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- JP
- Japan
- Prior art keywords
- layer
- photocatalyst
- member according
- heat
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011941 photocatalyst Substances 0.000 title claims abstract description 70
- 239000000758 substrate Substances 0.000 claims abstract description 51
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 28
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims abstract description 18
- 150000003755 zirconium compounds Chemical class 0.000 claims abstract description 8
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000010408 film Substances 0.000 claims description 69
- 230000001699 photocatalysis Effects 0.000 claims description 40
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 32
- 229910052709 silver Inorganic materials 0.000 claims description 32
- 239000004332 silver Substances 0.000 claims description 32
- 239000010409 thin film Substances 0.000 claims description 25
- 239000011521 glass Substances 0.000 claims description 23
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 13
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 13
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 6
- 239000012071 phase Substances 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 239000002131 composite material Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 239000012808 vapor phase Substances 0.000 claims description 2
- 150000003609 titanium compounds Chemical class 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 description 26
- 239000002585 base Substances 0.000 description 19
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000012298 atmosphere Substances 0.000 description 11
- 230000002265 prevention Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 239000011787 zinc oxide Substances 0.000 description 8
- 229910010413 TiO 2 Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000005361 soda-lime glass Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 230000003373 anti-fouling effect Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000010955 niobium Substances 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 238000003980 solgel method Methods 0.000 description 5
- 229910052726 zirconium Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 229910052758 niobium Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000005546 reactive sputtering Methods 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- 239000011135 tin Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000012300 argon atmosphere Substances 0.000 description 3
- -1 biochip Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- OBOYOXRQUWVUFU-UHFFFAOYSA-N [O-2].[Ti+4].[Nb+5] Chemical compound [O-2].[Ti+4].[Nb+5] OBOYOXRQUWVUFU-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000005328 architectural glass Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010339 medical test Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/066—Zirconium or hafnium; Oxides or hydroxides thereof
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- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
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- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Ceramic Engineering (AREA)
- Catalysts (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
上記積層膜を形成するに当たり、後の工程で生じるプラズマから銀層を保護するために、銀層の成膜直後にZn,Ti,Sn,Nbなどからなる犠牲層を設けてもよい。
[図2]本発明に係る光触媒部材の具体例の断面図
[図3]本発明に係る光触媒部材の具体例の断面図
この光触媒基板は、電磁遮蔽機能を有する防汚フィルムとして用いることができる。
この光触媒基板は、バイオケミカルチップとして用いることができる。
酸化ジルコニウム層を形成しなかった以外は、実施例1と同じ条件にて各膜の成膜を行なった。得られた物品は、可視光透過率が73%と高く優れていたが、一方で酸化チタン層の光触媒活性の評価は「×」となった。
比較例1の物品を、大気中にて400℃で30分間加熱し、酸化チタン膜の熱処理を行なった。この熱処理後、光触媒活性の評価は「○」となったが、熱線反射膜の銀が凝集して可視光透過率が低下した(加熱前73%から、加熱後54%に低下)。
酸化ジルコニウム層を形成しなかった以外は、実施例2と同じ条件にて各膜の成膜を行なった。得られた物品の酸化チタン層の光触媒活性を評価した結果、評価は「×」であった。
比較例3の物品を、大気中にて350℃で30分間加熱し、酸化チタン膜の熱処理を行なった。この熱処理後、光触媒活性の評価は「○」となったが、基板のアクリル樹脂が黄変して可視光透過率が低下した(加熱前92%から、加熱後75%に低下)。
酸化ジルコニウム層を形成しなかった以外は、実施例4と同じ条件にて各膜の成膜を行なった。得られた物品の酸化チタン層の光触媒活性を評価した結果、評価は「×」となった。
比較例5の物品を、大気中にて600℃で30分間加熱し、酸化チタン膜の熱処理を行なった。この熱処理後、光触媒活性の評価は「○」となったが、基板が大きく変形してしまい商品として使用できないことがわかった。
Claims (18)
- 基材表面に下地層を介して光触媒層が形成され、前記下地層は結晶性ジルコニウム化合物を主成分とし、前記光触媒層は結晶相から構成され、且つ前記基材は耐熱性の低い要素を含むことを特徴とする光触媒部材。
- 前記結晶性ジルコニウム化合物は単斜晶系酸化ジルコニウム結晶を含むことを特徴とする請求項1に記載の光触媒部材。
- 前記基材は、耐熱性の低いガラスであることを特徴とする請求項1又は2に記載の光触媒部材。
- 前記基材は、樹脂基体であることを特徴とする請求項1又は2に記載の光触媒部材。
- 前記基材は、樹脂フィルムであることを特徴とする請求項1又は2に記載の光触媒部材。
- 前記基材は、有機無機複合体基体であることを特徴とする請求項1又は2に記載の光触媒部材。
- 前記基材は、耐熱性の低い金属であることを特徴とする請求項1又は2に記載の光触媒部材。
- 前記基材は非耐熱性薄膜を含むことを特徴とする請求項1乃至7のいずれか1項に記載の光触媒部材。
- 前記非耐熱性薄膜は、銀を使用した熱線反射膜であることを特徴とする請求項8に記載の光触媒部材。
- 前記非耐熱性薄膜は、誘電体層/銀層/誘電体層の積層膜を使用した熱線反射膜であることを特徴とする請求項9に記載の光触媒部材。
- 前記非耐熱性薄膜は、誘電体層/銀層/誘電体層/銀層/誘電体の積層膜を使用した熱線反射膜であることを特徴とする請求項9に記載の光触媒部材。
- 前記基材は、耐熱温度が700℃以下であることを特徴とする請求項1乃至11のいずれか1項に記載の光触媒部材。
- 前記基材は、耐熱温度が500℃以下であることを特徴とする請求項1乃至11のいずれか1項に記載の光触媒部材。
- 前記光触媒層はチタン化合物を主成分とすることを特徴とする請求項1乃至13のいずれか1項に記載の光触媒部材。
- 前記チタン化合物は正方晶系酸化チタンであることを特徴とする請求項14に記載の光触媒部材。
- 前記チタン化合物はアナターゼ型酸化チタンであることを特徴とする請求項14又は15に記載の光触媒部材。
- 前記非耐熱性薄膜と下地層と光触媒層とが気相法にて形成されることを特徴とする請求項1乃至16のいずれか1項に記載の光触媒部材。
- 前記気相法はスパッタリング法であることを特徴とする請求項17に記載の光触媒部材。
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JP2003164129 | 2003-06-09 | ||
JP2003164129 | 2003-06-09 | ||
PCT/JP2004/008022 WO2004108283A1 (ja) | 2003-06-09 | 2004-06-09 | 光触媒部材 |
Publications (2)
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JPWO2004108283A1 true JPWO2004108283A1 (ja) | 2006-07-20 |
JP4460537B2 JP4460537B2 (ja) | 2010-05-12 |
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JP2005506824A Expired - Lifetime JP4460537B2 (ja) | 2003-06-09 | 2004-06-09 | 光触媒部材 |
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US (1) | US20070082205A1 (ja) |
EP (1) | EP1637225A4 (ja) |
JP (1) | JP4460537B2 (ja) |
CN (1) | CN100482346C (ja) |
WO (1) | WO2004108283A1 (ja) |
Families Citing this family (30)
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US7612015B2 (en) * | 2001-12-21 | 2009-11-03 | Nippon Sheet Glass Company, Limited | Member having photocatalytic function and method for manufacture thereof |
EP1640149A4 (en) * | 2003-06-20 | 2009-09-16 | Nippon Sheet Glass Co Ltd | LINK WITH PHOTOCATALYTIC ACTIVITY AND MULTILAYER GLASS |
FR2861386B1 (fr) * | 2003-10-23 | 2006-02-17 | Saint Gobain | Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice. |
GB0423085D0 (en) * | 2004-10-18 | 2004-11-17 | Pilkington Automotive Ltd | Solar control glazing |
CN101072735B (zh) * | 2004-12-06 | 2011-08-10 | 日本板硝子株式会社 | 具有光催化剂功能和红外线反射功能的玻璃构件以及使用该玻璃构件的多层玻璃 |
JP2006307623A (ja) * | 2005-03-31 | 2006-11-09 | Mitsubishi Materials Corp | 環境機能建材及びその製造方法 |
US8097340B2 (en) * | 2006-02-08 | 2012-01-17 | Ppg Industries Ohio, Inc. | Coated substrates having undercoating layers that exhibit improved photocatalytic activity |
EP2007694B2 (de) * | 2006-04-07 | 2024-02-14 | INTERPANE Entwicklungs-und Beratungsgesellschaft mbH | Witterungsbeständiges schichtsystem |
US7892662B2 (en) | 2006-04-27 | 2011-02-22 | Guardian Industries Corp. | Window with anti-bacterial and/or anti-fungal feature and method of making same |
US7846492B2 (en) * | 2006-04-27 | 2010-12-07 | Guardian Industries Corp. | Photocatalytic window and method of making same |
US7632761B2 (en) * | 2006-06-01 | 2009-12-15 | Wayne State University | Method of making thin film anatase titanium dioxide |
US20100015193A1 (en) * | 2006-10-16 | 2010-01-21 | Nippon Sheet Glass Company, Limited | Antibacterial Substrate and Method of Manufacturing the Same |
US20110076202A1 (en) * | 2008-05-29 | 2011-03-31 | Mitsui Mining & Smelting Co., Ltd | Particulate combustion catalyst, particulate filter and exhaust gas purifying apparatus |
JP5680537B2 (ja) * | 2009-08-17 | 2015-03-04 | 日本板硝子株式会社 | 光触媒膜を備えたガラス物品 |
US8946112B2 (en) * | 2009-10-30 | 2015-02-03 | Empire Technology Development Llc | Photocatalytic material for splitting oxides of carbon |
FR2963343B1 (fr) * | 2010-07-28 | 2012-07-27 | Saint Gobain | Vitrage pourvu d'un revetement contre la condensation |
JP5720879B2 (ja) * | 2010-12-08 | 2015-05-20 | 株式会社リコー | 電気−機械変換膜とその作製方法、電気−機械変換素子、液体吐出ヘッドおよび液体吐出装置 |
JP2014071292A (ja) * | 2012-09-28 | 2014-04-21 | Dainippon Printing Co Ltd | 反射防止物品 |
MX366270B (es) * | 2012-12-04 | 2019-07-04 | Genannt Wersborg Ingo Stork | Sistema de monitoreo de tratamiento termico. |
EP3017080A2 (en) | 2013-07-05 | 2016-05-11 | Nitto Denko Corporation | Transparent photocatalyst coating and methods of manufacturing the same |
JP6291823B2 (ja) * | 2013-12-10 | 2018-03-14 | 大日本印刷株式会社 | 光触媒機能材料の製造方法 |
WO2018190408A1 (ja) * | 2017-04-14 | 2018-10-18 | Hoya株式会社 | 光学素子及び光学薄膜 |
US10611679B2 (en) | 2017-10-26 | 2020-04-07 | Guardian Glass, LLC | Coated article including noble metal and polymeric hydrogenated diamond like carbon composite material having antibacterial and photocatalytic properties, and/or methods of making the same |
US20190295391A1 (en) * | 2018-03-20 | 2019-09-26 | Canon Kabushiki Kaisha | Transparent member, imaging apparatus, and method of producing transparent member |
JP7422450B2 (ja) * | 2018-03-20 | 2024-01-26 | キヤノン株式会社 | 透明部材、撮像装置、透明部材の製造方法および部材 |
US10759693B2 (en) | 2018-07-16 | 2020-09-01 | Guardian Glass, LLC | Low-E matchable coated articles having absorber film and corresponding methods |
US10752541B2 (en) | 2018-07-16 | 2020-08-25 | Guardian Glass, LLC | Low-E matchable coated articles having doped seed layer under silver, and corresponding methods |
US10787385B2 (en) * | 2018-07-16 | 2020-09-29 | Guardian Glass, LLC | Low-E matchable coated articles having absorber film and corresponding methods |
US10301215B1 (en) | 2018-07-16 | 2019-05-28 | Guardian Glass, LLC | Low-E matchable coated articles having doped seed layer under silver, and corresponding methods |
KR102692564B1 (ko) | 2018-09-21 | 2024-08-06 | 삼성전자주식회사 | 다층 박막 구조물 및 이를 이용한 위상 변환 소자 |
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WO1997007069A1 (en) * | 1995-08-18 | 1997-02-27 | Adam Heller | Self-cleaning glass and method of making thereof |
FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
JP3518240B2 (ja) * | 1997-04-08 | 2004-04-12 | 旭硝子株式会社 | 積層体の製造方法 |
JP4174862B2 (ja) * | 1998-08-04 | 2008-11-05 | ソニー株式会社 | 薄膜トランジスタの製造方法および半導体装置の製造方法 |
JP4701447B2 (ja) * | 2000-07-14 | 2011-06-15 | 独立行政法人 日本原子力研究開発機構 | アナターゼ型結晶構造の酸化チタン単結晶薄膜の作製法 |
US6677063B2 (en) * | 2000-08-31 | 2004-01-13 | Ppg Industries Ohio, Inc. | Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby |
-
2004
- 2004-06-09 WO PCT/JP2004/008022 patent/WO2004108283A1/ja active Application Filing
- 2004-06-09 CN CNB2004800225921A patent/CN100482346C/zh not_active Expired - Fee Related
- 2004-06-09 EP EP04745697A patent/EP1637225A4/en not_active Withdrawn
- 2004-06-09 US US10/560,053 patent/US20070082205A1/en not_active Abandoned
- 2004-06-09 JP JP2005506824A patent/JP4460537B2/ja not_active Expired - Lifetime
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EP1637225A4 (en) | 2007-12-19 |
EP1637225A1 (en) | 2006-03-22 |
JP4460537B2 (ja) | 2010-05-12 |
CN100482346C (zh) | 2009-04-29 |
WO2004108283A1 (ja) | 2004-12-16 |
CN1832804A (zh) | 2006-09-13 |
US20070082205A1 (en) | 2007-04-12 |
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