JPS649652U

JPS649652U -

Info

Publication number: JPS649652U
Application number: JP10297087U
Authority: JP
Priority date: 1987-07-03
Filing date: 1987-07-03
Publication date: 1989-01-19

Description

[Brief explanation of the drawing]

第１図はこの考案の構成を示す回路図、第２図
はこの考案に係る血漿処理装置の血漿処理時の状
態を示す回路図、第３図ないし第６図は同実施例
の動作を示す簡略化した回路図である。１……血漿処理器、２……血漿ポンプ、３……
ドレンポンプ、４……チヤンバー、５……第１の
バルブ、６……第２のバルブ、７……第１の空気
検知器、８……第２の空気検知器、９……流量検
知器、１３……血漿流路、１５……血漿回収手段
、１６……補液回収手段、１７……回収終了手段
。 Fig. 1 is a circuit diagram showing the configuration of this invention, Fig. 2 is a circuit diagram showing the state of the plasma processing device according to this invention during plasma processing, and Figs. 3 to 6 show the operation of the same embodiment. It is a simplified circuit diagram. 1...Plasma processor, 2...Plasma pump, 3...
Drain pump, 4...Chamber, 5...First valve, 6...Second valve, 7...First air detector, 8...Second air detector, 9...Flow rate detector , 13... Plasma flow path, 15... Plasma collection means, 16... Replacement fluid collection means, 17... Collection termination means.

Claims

[Scope of utility model registration request]

The plasma supplied to the plasma processing device 1 by the plasma pump 2 is separated into high molecular weight components and low molecular weight components, and the separated low molecular weight components are supplied with a replacement fluid in an amount equal to the high molecular weight components to be discarded. a first valve 5 for introducing air connected to a branch provided at the end of the plasma flow path upstream of the plasma pump 2; A second valve 6 provided at the end of the plasma flow path downstream of the processor 1, and a second valve provided upstream of the second valve 6 to detect air introduced into the plasma flow path. 2
an air detector 8, a first air detector 7 provided downstream of the plasma pump 2 to detect air introduced into the plasma flow path, and a flow rate detector 7 to detect the flow rate of the plasma pump 2. a detector 9; a plasma collection means 15 that opens the first valve 5 and the second valve 6 to drive the plasma pump 2 upon receiving a plasma collection start signal from the outside; and the first air detector. receives the air detection signal from 7 and integrates the flow rate of the plasma pump,
When the flow rate of the plasma pump reaches a predetermined value, the replacement fluid recovery means 16 drives the drain pump 3 at high speed, and in response to the air detection signal from the second air detector 8, the second valve 6 is activated. A plasma processing apparatus comprising a collection termination means 17 that closes the plasma pump 2 and stops driving the plasma pump 2 and the drain pump 3.